A method for improving sudsing profile of laundry detergent compositions with a cationic polymer. Related liquid detergent compositions having a cationic polymer. The cationic polymer may be characterized by having a weight average molecular weight (Mw) ranging from 1,000 to 300,000 Daltons and by containing: (i) from 35 mol % to 85 mol % of a first, nonionic structural unit derived from (meth)acrylamide (AAm); (ii) from 10 mol % to 65 mol % of a second, cationic structural unit; and (iii) from 0.1 mol % to 35 mol % of a third, anionic structural unit derived from (meth)acrylic acid (AA) or anhydride thereof, while the total mol % of (i)-(iii) adds up to 100 mol %, and the molar ratio of (ii) to (iii) is greater than 1.

An object of the present invention is to provide a cleaning liquid for semiconductor substrates with a change in the pH of the cleaning liquid caused by dilution being suppressed. A cleaning liquid of the invention is a cleaning liquid for semiconductor substrates that contains a chelating agent, and an acidity constant (pKa) of the chelating agent and a pH of the cleaning liquid satisfy a condition defined by Formula (A):

pKa−1<pH<pKa+1  (A)

The purpose of the present invention is to provide means for sufficiently removing residues on a surface of an object which has been polished including silicon nitride, silicon oxide, or polysilicon. Provided is a composition for surface treatment including an anionic surfactant having a molecular weight of 1,000 or less and water, the composition having a pH of less than 7, wherein a ratio of a molecular weight of a hydrophilic moiety to a molecular weight of a hydrophobic moiety (the molecular weight of the hydrophilic moiety/the molecular weight of the hydrophobic moiety) of the anionic surfactant is 0.4 or more (in which the hydrophobic moiety is a hydrocarbon group having 4 or more carbon atoms and the hydrophilic moiety is a part excluding the hydrophobic moiety and a counterion), and the composition for surface treatment is used for surface treatment of an object which has been polished including at least one selected from the group consisting of silicon nitride, silicon oxide, and polysilicon.

Fused and unfused bicyclic rings are a convenient scaffold for synthesizing various compounds. Amphiphilic compounds constructed upon a fused or unfused bicyclic ring scaffold may exhibit surfactant properties differing from those of more conventional classes of surfactants. Such amphiphilic compounds may have a structure of formula (I), wherein A is an aromatic ring, a heteroaromatic ring, or a cycloaliphatic ring, each ring being defined by 5 to 10 ring atoms, B is an aromatic ring or a heteroaromatic ring, each ring being defined by 5 to 6 ring atoms, wherein at least one G is a hydrophobic moiety and at least one G is a hydrophilic moiety, and z is 0 or a positive integer ranging up to the number of ring atoms in each of A and B; and wherein the hydrophobic moiety comprises branched or unbranched C.sub.6 to C.sub.30 alkyl or alkenyl group, and the hydrophilic moiety comprises a polar functional group selected from the group consisting of quaternary ammonium, sulfonate, sulfate, carboxylate, phosphate, and ethoxylated.

##STR00001##

The present disclosure provides an alkoxylate compound containing aromatic groups in the hydrophobe allowing the compound to exhibit unique functionality, high performance and low cost, but without the toxicity and/or skin and eye irritation problems associated with conventional alkylphenol and mono-, di- and tristyrylphenol compounds.

The present invention provides a surface treatment agent which is capable of efficiently removing oily substances from the surface of a metal material, while removing scales and fumes therefrom at the same time.

A surface treatment agent which contains a chelating agent, a nonionic surfactant and an anionic surfactant, and which is configured such that the anionic surfactant is composed of at least one surfactant that is selected from the group consisting of phosphoric acid ester surfactants, carboxylic acid surfactants, sulfonic acid surfactants and sulfuric acid ester surfactants.

A cleaning composition that comprises a nonionic sorbitan alkyl polyglucoside crosspolymer, at least one functionalized alkyl polyglucoside, a water conditioning agent, water, and an acid source.

A cleaning liquid containing at least one surfactant (A) selected from the group consisting of a polyoxyalkylene alkyl ether phosphoric acid, a polyoxyalkylene alkyl ether acetic acid and a polyoxyalkylene alkyl ether sulfonic acid and a chelating agent (C), which has a pH of 8 or more, and a cleaning liquid containing an oxidizing agent (B) and a chelating agent (C), which has a pH of 8 or more.

The invention relates to an emulsion containing or consisting of (A) 40.00 to 97.98 wt. % of at least one hydrocarbon, (B) 2.00 to 59.98 wt. % of water or an aqueous solution of a salt which does not fall under the following definition according to (C) and (C) 0.02 to 8.00 wt. % of a salt of an amino amide of a fatty acid, containing at least one primary, secondary or tertiary amino group, and an acid component of general formula (I) ##STR00001## in which R.sup.1 is a linear or branched, saturated or mono-unsaturated or poly-unsaturated hydrocarbon radical with 1 to 40 C atoms, R.sup.2 is an alkylene radical or arylalkylene radical with 2 to 20 C atoms and X is a radical which contains at least one acid group, m=0 or 1, n=1 to 30, wherein the weight proportions of components (A), (B) and (C) relate to the sum of the masses of these components and this is 100 wt. %. The invention also relates to a method for the production of the emulsion, to an oil-based drilling mud and to a method for creating and stabilizing a drill hole.

The purpose of the present invention is to provide means for sufficiently removing residues on a surface of an object which has been polished including silicon nitride, silicon oxide, or polysilicon.

Provided is a composition for surface treatment including an anionic surfactant having a molecular weight of 1,000 or less and water, the composition having a pH of less than 7, wherein a ratio of a molecular weight of a hydrophilic moiety to a molecular weight of a hydrophobic moiety (the molecular weight of the hydrophilic moiety/the molecular weight of the hydrophobic moiety) of the anionic surfactant is 0.4 or more (in which the hydrophobic moiety is a hydrocarbon group having 4 or more carbon atoms and the hydrophilic moiety is a part excluding the hydrophobic moiety and a counterion), and the composition for surface treatment is used for surface treatment of an object which has been polished including at least one selected from the group consisting of silicon nitride, silicon oxide, and polysilicon.