C11D1/345

Cleaning liquid composition and cleaning method using same

The present disclosure relates to a cleaning liquid composition and a cleaning method using the same. A polishing slurry composition according to an embodiment of the present disclosure includes: a chelating agent containing an organic salt; and an anionic surfactant.

Aqueous formulations with good storage capabilities
10961485 · 2021-03-30 · ·

Aqueous formulations comprising (A) at least one organic complexing agent selected from (A1) alkali metal salts of aminopolycarboxylic acids and (A2) polymers bearing at least two CH.sub.2N(CH.sub.2COOH)-units per molecule, partially or fully neutralized with alkali, (B) at least one salt of at least one of the following acids: nitric acid, sulphuric acid, sulphamic acid, methanesulfonic acid, C.sub.1-C.sub.2-carboxylic acids, C.sub.2-C.sub.4-hydroxymonocarboxylic acids, C.sub.2-C.sub.7-dicarboxylic acids, unsubstituted or substituted with hydroxyl, and C.sub.4-C.sub.6-tricarboxylic acids, each unsubstituted or substituted with hydroxyl, (C) at least one compound selected from (C1) phosphoric acid C.sub.2-C.sub.10-monoalkyl esters, (C2) a C.sub.3-C.sub.10-alkynol, optionally alkoxylated with one to 10 alkoxide groups per hydroxyl group, and (C3) a C.sub.4-C.sub.10-alkynediol, optionally alkoxylated with one to 10 alkoxide groups per hydroxyl group, said aqueous formulations having pH values in the range of from 7.5 to 10.

Surfactant composition
10941369 · 2021-03-09 · ·

The present invention provides a surfactant composition which includes a surfactant at a high concentration, while having fluidity over a wide concentration range. A surfactant composition according to the present invention contains the components A, B, C and D described below, and is configured such that: the total content of the components A, B and C is from 30% by mass to 80% by mass (inclusive); the mass ratio of the total content of the components A and B to the content of the component C, namely (A+B)/C is from 20/80 to 80/20; and the mass ratio of the content of the component A to the content of the component B, namely A/B is from 98/2 to 45/55. A: an internal olefin sulfonic acid and/or a salt thereof; B: an anionic surfactant other than the component A; C: a nonionic surfactant; D: water.

Composition for surface treatment, and method for surface treatment using the same
10876073 · 2020-12-29 · ·

The present invention is to provide a means with which foreign matters remaining on a surface of a polished object to be polished can be sufficiently removed. The present invention relates to a composition for surface treatment for a polished object to be polished, including: a (co)polymer containing a structural unit A having a phosphonic acid group and a divalent (poly)oxyhydrocarbon group or a salt thereof; and water, wherein a content of the structural units A exceeds 50% by mole relative to the total structural units forming the (co)polymer.

CONCENTRATED SOLID HARD SURFACE CLEANER
20200283701 · 2020-09-10 ·

A solid hard surface cleaning composition suitable for replacing liquid formulations while providing at least equivalent or enhanced cleaning performance, including at lower concentrations, is provided. The solid hard surface cleaning compositions include alkali metal carbonate alkalinity source(s), aminocarboxylic acid chelant(s), amphoteric surfactant(s), polyacrylate polymer(s) and anionic surfactant(s). The solid hard surface cleaning compositions can include additional functional ingredients, such as corrosion inhibitors. The solid hard surface cleaning compositions do not include hydroxide alkalinity and beneficially provide stable ready-to-use formulations that are safe for contact without the use of personal protective equipment (PPE) and are compatible with soft metals.

CLEANING LIQUID, CLEANING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER

A cleaning liquid containing at least one surfactant (A) selected from the group consisting of a polyoxyalkylene alkyl ether phosphoric acid, a polyoxyalkylene alkyl ether acetic acid and a polyoxyalkylene alkyl ether sulfonic acid and a chelating agent (C), which has a pH of 8 or more, and a cleaning liquid containing an oxidizing agent (B) and a chelating agent (C), which has a pH of 8 or more.

Cold-water laundry detergents

Laundry detergents and their use for cold-water cleaning are disclosed. The detergents comprise a lipase and a mid-chain headgroup surfactant or an alkylene-bridged surfactant. The mid-chain headgroup surfactants have a C.sub.14-C.sub.30 alkyl chain and a polar group bonded to a central zone carbon of the C.sub.14-C.sub.30 alkyl chain. The alkylene-bridged surfactants comprise a C.sub.12-C.sub.18 alkyl chain, a polar group, and a C.sub.1-C.sub.2 alkylene group bonded to the polar group and a central zone carbon of the C.sub.12-C.sub.18 alkyl chain. Surprisingly, when combined with lipases, detergents formulated with the mid-chain headgroup or alkylene-bridged surfactants effectively liquefy greasy soils at low temperature and provide outstanding cold-water performance in removing greasy stains such as bacon grease, butter, cooked beef fat, or beef tallow from soiled articles.

Gemini-Like and Oligomeric-like Surfactant Compositions
20200048580 · 2020-02-13 ·

A surfactant composition comprising a nonionic surfactant and a supra-amphiphile comprising one or more gemini-like and/or oligomeric-like surfactants, and a method of producing such.

Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning method

Provided is a treatment composition for chemical mechanical polishing, for treating an object to be treated including a wiring layer containing a metal, the treatment composition for chemical mechanical polishing containing: (A) a nitrogen-containing compound; (B) at least one kind of compound selected from the group consisting of a surfactant and polyacrylic acid; and (D) a pH adjusting agent, in which in terms of electrode charge transfer resistance value obtained by AC impedance measurement using the metal for an electrode, a sum of electrode charge transfer resistance values RA+RB in aqueous solutions each containing the component (A) or (B) and the component (D), and an electrode charge transfer resistance value RC in an aqueous solution containing the components (A), (B), and (D) have a relationship of RC/(RA+RB)>1.

DETERGENTS FOR COLD-WATER CLEANING
20190359915 · 2019-11-28 ·

Detergents useful for cold-water cleaning and mid-chain headgroup and alkylene-bridged surfactants useful therein are disclosed. The mid-chain headgroup surfactant has a C.sub.14-C.sub.30 alkyl chain and a polar group bonded to a central zone carbon of the alkyl chain. The alkylene-bridged surfactant has a C.sub.12-C.sub.18 alkyl chain, a polar group, and a C.sub.1-C.sub.2 alkylene group bonded to the polar group and a central zone carbon of the C.sub.12-C.sub.18 alkyl chain. Preferred surfactants in these classes are alcohol sulfates, alcohol ethoxylates, ether sulfates, sulfonates, arylsulfonates, alcohol phosphates, amine oxides, quaterniums, betaines, and sulfobetaines. Surprisingly, detergents formulated with the surfactants provide outstanding cold-water performance in removing greasy stains such as bacon grease, butter, cooked beef fat, or beef tallow from soiled articles.