The invention relates to an electrolyte for electropolishing metal surfaces, said electrolyte comprising methanesulphonic acid and additionally at least one phosphonic acid, as well as to an electropolishing method for same.

An electrolyte for electropolishing metal surfaces, in particular workpieces, in particular made of titanium or titanium alloys such as nitinol. The electrolyte composition includes methanesulfonic acid and more than one polyhydric alcohol. The content of methanesulfonic acid is less than 15 vol %, the polyhydric alcohols having at least one diol and at least one polyalcohol. The at least one diol accounts for 20 to 65 vol %, and the at least one polyalcohol accounts for 20 to 65 vol %

An electrolyte for electropolishing metal surfaces, in particular workpieces, in particular made of titanium or titanium alloys such as nitinol. The electrolyte composition includes methanesulfonic acid and more than one polyhydric alcohol. The content of methanesulfonic acid is less than 15 vol %, the polyhydric alcohols having at least one diol and at least one polyalcohol. The at least one diol accounts for 20 to 65 vol %, and the at least one polyalcohol accounts for 20 to 65 vol %

The invention relates to a method for the electrochemical polishing of metal surfaces by means of repeating pulse sequences, wherein at least one anodic pulse is provided, the current intensity of which rises continuously in the time curve up to a specifiable value. The invention further relates to the use of said method for components produced in 3-D and to a system therefor.

The invention relates to a method for the electrochemical polishing of metal surfaces by means of repeating pulse sequences, wherein at least one anodic pulse is provided, the current intensity of which rises continuously in the time curve up to a specifiable value. The invention further relates to the use of said method for components produced in 3-D and to a system therefor.

A high current bi-polar pulse system for use in electrochemical metal surface finishing of metallic components. The high current bi-polar pulse system provides a high isolation, high current switching device for providing independently controllable, alternating polarity, variable time duration pulses for electrochemical and mechanical finishing of metallic components in a conducting fluid bath. The high current bi-polar pulse system provides a safe, low-cost solution for implementing the surface finishing of niobium (Nb) SRF accelerating cavities without the use of hydrofluoric acid.

A high current bi-polar pulse system for use in electrochemical metal surface finishing of metallic components. The high current bi-polar pulse system provides a high isolation, high current switching device for providing independently controllable, alternating polarity, variable time duration pulses for electrochemical and mechanical finishing of metallic components in a conducting fluid bath. The high current bi-polar pulse system provides a safe, low-cost solution for implementing the surface finishing of niobium (Nb) SRF accelerating cavities without the use of hydrofluoric acid.

Disclosed is a method of manufacturing an emitter in which the tip of the emitter can be formed into a desired shape even when various materials are used for the emitter. The method includes performing an electrolytic polishing process of polishing a front end of a conductive emitter material so that a diameter of the front end is gradually reduced toward a tip; performing a first etching process by irradiating a processing portion of the emitter material processed by the electrolytic polishing process with a charged particle beam; performing a sputtering process by irradiating the pointed portion formed by the first etching process with a focused ion beam; and performing a secondary etching process of further sharpening the tip by an electric field induced gas etching processing while observing a crystal structure of the tip of the pointed portion processed by the sputtering process using a field ion microscope.

A method of electropolishing an internal passageway of a component, wherein the passageway has an inlet and an outlet; including: providing an electrode assembly including a flexible electrode, a shuttle and a guide cable extending between the flexible electrode and the shuttle; inserting the shuttle into the inlet; causing fluid to flow through the passageway to transport the shuttle through the passageway from the inlet towards the outlet; pulling the guide cable through the passageway to position the electrode in the passageway adjacent to a region of the passageway to be polished; and electropolishing the passageway using the electrode while moving the electrode within the passageway. Also, an electrode assembly for electropolishing an internal passageway of a component, including: a flexible electrode, a shuttle, and a guide cable extending between the flexible electrode and the shuttle.

A rotor for polishing hollow tubes, in which an outer tube is slidable over an inner tube and is provided with at least one window in the wall. At the window on the inner tube, a plate vane is fixed at the base end to an auxiliary shaft arranged perpendicular to the main shaft so as to be able to rotationally move. A link bar is arranged in the main shaft direction to extend between the outer tube and the plate vane. The rotor is able to transition between an initial state (plate vane closed) and an operational state (plate vane open) by the inner tube moving relative to the outer tube. An electrode for electropolishing or a buff for mechanical polishing is fixed to the tip end of the plate vane. This allows for adjustment of the position of the plate vane and control of the polished state.