Method of forming pattern in photoresist layer includes forming photoresist layer over substrate, selectively exposing photoresist layer to actinic radiation forming latent pattern. Latent pattern is developed by applying developer to form pattern. Photoresist layer includes photoresist composition including polymer: ##STR00001##
A.sub.1, A.sub.2, L are direct bond, C4-C30 aromatic, C4-C30 alkyl, C4-C30 cycloalkyl, C4-C30 hydroxylalkyl, C4-C30 alkoxy, C4-C30 alkoxyl alkyl, C4-C30 acetyl, C4-C30 acetylalkyl, C4-C30 alkyl carboxyl, C4-C30 cycloalkyl carboxyl, C4-C30 hydrocarbon ring, C4-C30 heterocyclic, —COO—, A1 and A2 are not both direct bonds, and are unsubstituted or substituted with a halogen, carbonyl, or hydroxyl; A.sub.3 is C6-C14 aromatic, wherein A.sub.3 is unsubstituted or substituted with halogen, carbonyl, or hydroxyl; R.sub.1 is acid labile group; Ra, Rb are H or C1-C3 alkyl; R.sub.f is direct bond or C1-C5 fluorocarbon; PAG is photoacid generator; 0≤x/(x+y+z)≤1, 0≤y/(x+y+z)≤1, and 0≤z/(x+y+z)≤1.

A compound including two or more constituent units derived from a monomer M having a radical polymerizable group and having a radical polymerizable group A at the terminal, in which the monomer M includes a monomer m having a structure that generates an active species by photoexcitation.

A compound including two or more constituent units derived from a monomer M having a radical polymerizable group and having a radical polymerizable group A at the terminal, in which the monomer M includes a monomer m having a structure that generates an active species by photoexcitation.

A polymeric surfactant for use in chemical enhanced oil recovery, including a terpolymer of a first non-ionic monomer, a second non-ionic monomer, and an ionic monomer, the first non-ionic monomer being a hydrophilic monomer and the second non-ionic monomer being a hydrophobic monomer, the ionic monomer being in a lower proportion than the first and second non-ionic monomers. A method of preparation of polymeric surfactants.

A polymeric surfactant for use in chemical enhanced oil recovery, including a terpolymer of a first non-ionic monomer, a second non-ionic monomer, and an ionic monomer, the first non-ionic monomer being a hydrophilic monomer and the second non-ionic monomer being a hydrophobic monomer, the ionic monomer being in a lower proportion than the first and second non-ionic monomers. A method of preparation of polymeric surfactants.

A monomer has the structure

##STR00001##

wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A monomer has the structure

##STR00001##

wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.

A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.

Disclosed herein is a composite material suitable for inhibiting biofilm growth, the composite material comprising a substrate material and a random copolymeric material covalently bonded to a surface of the substrate material. The random copolymer contains repeating units having at least one functional group bearing a cationic charge and repeating units having at least one functional group bearing an anionic charge, where the repeating units are derived from compatible monomers that belong to different monomer classes having differing polymerisation kinetics. Specifically, the random copolymeric material is poly(AMPTMA-ran-SPM), wherein AMPTMA is (3-acrylamidopropyl) trimethylammonium chloride and SPM is 3-sulfopropyl methacrylate potassium. Also disclosed are methods of manufacturing said material and applications thereof.