Patent classifications
C08K5/357
COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT
Polymer compositions for making a stabilized polymeric articles that are resistant to discoloration upon exposure to UV-C light having: (i) an organic polymeric material; and (ii) a hindered phenol, organic phosphite, or a combination thereof, with the provisos that: (a) the OH group on the aromatic ring of the hindered phenol is flanked by two tertiary hydrocarbyl groups, and (b) the organic phosphite does not have any —OAr group linked directly to the P atom of the phosphite, wherein Ar represents an unsubstituted or substituted aryl group, are provided herein. Reduced discoloration is associated with the use of specific hindered phenols and the organic phosphites compared to other hindered phenols and organic phosphites, even in the absence of other polymer additives including UV absorbers, hindered amine light stabilizers (HALS), metal oxides and/or barium salts. Methods of reducing discoloration of an organic polymeric material upon exposure to UV-C light are also provided, wherein such methods include the step of adding to the organic polymeric material a stabilizing amount of hindered phenol, organic phosphite, or a combination thereof.
COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT
Polymer compositions for making a stabilized polymeric articles that are resistant to discoloration upon exposure to UV-C light having: (i) an organic polymeric material; and (ii) a hindered phenol, organic phosphite, or a combination thereof, with the provisos that: (a) the OH group on the aromatic ring of the hindered phenol is flanked by two tertiary hydrocarbyl groups, and (b) the organic phosphite does not have any —OAr group linked directly to the P atom of the phosphite, wherein Ar represents an unsubstituted or substituted aryl group, are provided herein. Reduced discoloration is associated with the use of specific hindered phenols and the organic phosphites compared to other hindered phenols and organic phosphites, even in the absence of other polymer additives including UV absorbers, hindered amine light stabilizers (HALS), metal oxides and/or barium salts. Methods of reducing discoloration of an organic polymeric material upon exposure to UV-C light are also provided, wherein such methods include the step of adding to the organic polymeric material a stabilizing amount of hindered phenol, organic phosphite, or a combination thereof.
DISPERSION LIQUID, INK COMPOSITION FOR INK JET RECORDING, AND DISPERSION RESIN
A dispersion liquid includes water, a coloring material, and a dispersion resin that disperses the coloring material. The dispersion resin has a constituent unit A containing a hydrophobic monomer, and a predetermined constituent unit B.
DISPERSION LIQUID, INK COMPOSITION FOR INK JET RECORDING, AND DISPERSION RESIN
A dispersion liquid includes water, a coloring material, and a dispersion resin that disperses the coloring material. The dispersion resin has a constituent unit A containing a hydrophobic monomer, and a predetermined constituent unit B.
Polyimide precursor solution and polyimide shaped article
A polyimide precursor solution contains a polyimide precursor, wherein in the case where the polyimide precursor is analyzed by gel permeation chromatography, the elution curve of the polyimide precursor has a region A including a higher-molecular-weight peak and a region B including a lower-molecular-weight peak; a weight average molecular weight determined from the region A in terms of polystyrene is approximately 10,000 or more, and a weight average molecular weight determined from the region B in terms of polystyrene is approximately less than 10,000; and when the area of the region A is a and the area of the region B is b, the polyimide precursor satisfies Equation (1)
a/(a+b)=approximately from 0.70 to 0.98. Equation 1:
Polyimide precursor solution and polyimide shaped article
A polyimide precursor solution contains a polyimide precursor, wherein in the case where the polyimide precursor is analyzed by gel permeation chromatography, the elution curve of the polyimide precursor has a region A including a higher-molecular-weight peak and a region B including a lower-molecular-weight peak; a weight average molecular weight determined from the region A in terms of polystyrene is approximately 10,000 or more, and a weight average molecular weight determined from the region B in terms of polystyrene is approximately less than 10,000; and when the area of the region A is a and the area of the region B is b, the polyimide precursor satisfies Equation (1)
a/(a+b)=approximately from 0.70 to 0.98. Equation 1:
RESIN COMPOSITION FOR INFRARED RAY-BLOCKING TRANSPARENT MEMBER, AND MOLDED ARTICLE
The present invention provides a resin composition which has an infrared ray-blocking ability with excellent moist heat resistance while maintaining high transparency. The resin composition of the present invention contains, relative to (A) 100 parts by weight of a polycarbonate resin (component A), (B) 0.0001 to 0.2 part by weight of composite tungsten oxide fine particles (component B) represented by the general formula: MxWyOz (wherein M represents at least one element selected from H, He, an alkali metal, an alkaline earth metal, a rare earth element, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Si, Ge, Sn, Pb, Sb, B, F, P, S, Se, Br, Te, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, and I, W represents tungsten, O represents oxygen, 0.001≤x/y≤1, and 2.2≤z/y≤3.0), (C) 0.0001 to 0.1 part by weight of an epoxy resin (component C), and (D) 0.001 to 0.5 part by weight of a release agent which is a fatty acid ester containing as a main component a full ester of a fatty acid and a polyhydric alcohol (component D).
RESIN COMPOSITION FOR INFRARED RAY-BLOCKING TRANSPARENT MEMBER, AND MOLDED ARTICLE
The present invention provides a resin composition which has an infrared ray-blocking ability with excellent moist heat resistance while maintaining high transparency. The resin composition of the present invention contains, relative to (A) 100 parts by weight of a polycarbonate resin (component A), (B) 0.0001 to 0.2 part by weight of composite tungsten oxide fine particles (component B) represented by the general formula: MxWyOz (wherein M represents at least one element selected from H, He, an alkali metal, an alkaline earth metal, a rare earth element, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Si, Ge, Sn, Pb, Sb, B, F, P, S, Se, Br, Te, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, and I, W represents tungsten, O represents oxygen, 0.001≤x/y≤1, and 2.2≤z/y≤3.0), (C) 0.0001 to 0.1 part by weight of an epoxy resin (component C), and (D) 0.001 to 0.5 part by weight of a release agent which is a fatty acid ester containing as a main component a full ester of a fatty acid and a polyhydric alcohol (component D).
STRUCTURE OF ADJUSTABLE STERIC HINDRANCE WEAK BASIC LIGHT STABILIZER AND PREPARATION METHOD AND APPLICATION THEREOF
The field of new compounds and synthesis methods thereof are related, and particularly to a structure of a steric hindrance adjustable weak base light stabilizer and a preparation method and application thereof. According to the innovative light stabilizer, a steric hindrance thereof is adjusted by establishing substituent generating the steric hindrance around nitrogen atoms; moreover, an electronegativity of the nitrogen atom can be influenced by adjusting a distance of a polar group, so that an alkalinity or a nucleophilicity of the nitrogen atom is adjusted. A desired effect is obtained by adjusting a steric hindrance and a nucleophilic property or an alkalinity where the nitrogen atom is located, so that an application range of the innovative light stabilizer is widened, and the innovative light stabilizer is suitable for PC, polyester, PVC and other slightly acidic or certain electrophilic polymer materials to serve as a light stability protecting aid.
STRUCTURE OF ADJUSTABLE STERIC HINDRANCE WEAK BASIC LIGHT STABILIZER AND PREPARATION METHOD AND APPLICATION THEREOF
The field of new compounds and synthesis methods thereof are related, and particularly to a structure of a steric hindrance adjustable weak base light stabilizer and a preparation method and application thereof. According to the innovative light stabilizer, a steric hindrance thereof is adjusted by establishing substituent generating the steric hindrance around nitrogen atoms; moreover, an electronegativity of the nitrogen atom can be influenced by adjusting a distance of a polar group, so that an alkalinity or a nucleophilicity of the nitrogen atom is adjusted. A desired effect is obtained by adjusting a steric hindrance and a nucleophilic property or an alkalinity where the nitrogen atom is located, so that an application range of the innovative light stabilizer is widened, and the innovative light stabilizer is suitable for PC, polyester, PVC and other slightly acidic or certain electrophilic polymer materials to serve as a light stability protecting aid.