Embodiments provide an etchant composition including (A) a copper ion source, (B) a source of an organic acid ion having one or more carboxyl groups in a molecule, (C) a fluoride ion source, (D) an etching controller, a surface oxidizing power enhancer or a combination thereof as a first additive, and (E) a surfactant as a second additive; a method for etching a multilayered film; and a method for preparing a display device.

A method for manufacturing a ruthenium wiring including (i) treating a metal surface including ruthenium using a first chemical solution including a compound having a functional group capable of coordinating to a ruthenium atom, and (ii) carrying out an etching treatment on the metal surface including ruthenium treated with the first chemical solution, using a second chemical solution.

A method for manufacturing a ruthenium wiring including (i) treating a metal surface including ruthenium using a first chemical solution including a compound having a functional group capable of coordinating to a ruthenium atom, and (ii) carrying out an etching treatment on the metal surface including ruthenium treated with the first chemical solution, using a second chemical solution.

An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same.

An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same.

Metal powder particles for use in additive manufacturing are made by removing material from the surface of the particles using wet chemical etching to create a nanoscale texturing of the surface, increasing absorptivity by the metal powder particles of incident laser light and maintaining flowability. The nanoscale texturing has sub-wavelength features at laser wavelengths in the range 800-1100 nm. The particles are substantially spherical and have mean diameters in the range 10-70 μm.

A surface-treated metallic workpiece of titanium and/or titanium alloys with titanium as the main constituent and/or nickel-titanium alloys and also nitinol, wherein on the treated surface the metal is free from inclusions, precipitates of other metals, accumulations of alkali metals, alkaline earth metals and/or aluminium, intermetallic phases, and/or mechanically highly defect-rich regions, and the surface has a first roughness and a second roughness, wherein the first roughness is provided by depressions in the form of pores, the pores having a diameter in the range between 0.5 and 50 μm—being open in the direction of the surface and closed in the direction of the workpiece, and at least some of the pores having an undercut, and the second roughness is provided by randomly distributed elevations and depressions in the range of 100 nm and less. The invention also relates to a production process for a surface-treated workpiece.

A surface-treated metallic workpiece of titanium and/or titanium alloys with titanium as the main constituent and/or nickel-titanium alloys and also nitinol, wherein on the treated surface the metal is free from inclusions, precipitates of other metals, accumulations of alkali metals, alkaline earth metals and/or aluminium, intermetallic phases, and/or mechanically highly defect-rich regions, and the surface has a first roughness and a second roughness, wherein the first roughness is provided by depressions in the form of pores, the pores having a diameter in the range between 0.5 and 50 μm—being open in the direction of the surface and closed in the direction of the workpiece, and at least some of the pores having an undercut, and the second roughness is provided by randomly distributed elevations and depressions in the range of 100 nm and less. The invention also relates to a production process for a surface-treated workpiece.

The present invention relates to a HEA foam prepared by selective dissolution of a second phase within a two-phase separating alloy comprising the HEA and a manufacturing method thereof. The manufacturing method of the HEA foam of the present invention has the effect of preparing a novel HEA foam, which was not available in the past, by leaving only a first phase after manufacturing a two-phase separating alloy comprising a first phase by HEA, wherein at least 3 metal elements act as a common solvent.

Furthermore, the HEA foam of the present invention has a structure, wherein pores are distributed inside the HEA, in which at least 3 metal elements act as a common solvent. By adding a functional characteristic of low heat conductivity, etc., to the existing high strength characteristic of HEA, the HEA foam of the present invention can exhibit a complex effect by the combination of the two particular effects, thereby being capable of exhibiting excellent physical characteristics.

Aspects of the present disclosure involve a system and method for suppressing a Poisson spot. A Poisson spot is a bright spot in the geometrical shadow of circular/spherical shapes. A broad class of telescopes that involve simultaneous transmit and receive require suppression of the reflected light from the secondary mirror on the detector. In one embodiment, coronagraphy petal-shaped masks are fabricated using photolithography and wire-EDM for the suppression of the Poisson spot. The petal-shaped masks can be designed and fabricated to operate at varying Fresnel numbers and petal tip radius-of-curvature (ROC).