Compositions are provided which may comprise a plurality of organic additive particles, the particles comprising a polymerization product of reactants comprising a dioxane/dioxolane monomer and a vinyl co-monomer, wherein the dioxane/dioxolane monomer is an ester of (meth)acrylic acid with an alcohol comprising a dioxane moiety, an ester of (meth)acrylic acid with an alcohol comprising a dioxolane moiety, or both. Toner and additive manufacturing compositions comprising the organic additive particles are also provided.

The present invention is a resist material containing a base polymer and an acid generator, where the resist material contains, as the acid generator, a sulfonium salt or iodonium salt of a sulfonic acid bonded to a maleimide group. In a chemically amplified resist material in which an acid is used as a catalyst, it is desired to develop an acid generator that makes it possible to reduce LWR of line patterns and critical dimension uniformity (CDU) of hole patterns, and to improve sensitivity. For this purpose, it is necessary to reduce image blurs due to acid diffusion considerably. An object of the present invention is to provide: a resist material having high sensitivity and low CDU in both a positive resist material and a negative resist material; and a patterning process using the same.

The present invention relates to a process for preparing an aqueous dispersion of multiphase occluded polymer particles comprising the steps of a) contacting, under emulsion polymerization conditions, first monomers and a chain transfer agent to form an aqueous dispersion of first polymer particles having a T.sub.g in the range of from −30° C. to 30° C.; then b) contacting the aqueous dispersion of first polymer particles with a second monomer under emulsion polymerization conditions to form an aqueous dispersion of second polymer particles occluded within the first polymer particles, wherein the first monomers a phosphorus acid monomer or a salt thereof; and the second monomer comprises at least 90 weight percent methyl methacrylate. The aqueous dispersion of occluded polymer particles arising from the process of the present invention is useful in a formulation that can be used to prepare a water-resistant blister free LASD coating.

Latexes are provided which may comprise water and resin particles comprising a polymerization product of reactants comprising a dioxane/dioxolane monomer and an additional monomer, wherein the dioxane/dioxolane monomer is an ester of (meth)acrylic acid with an alcohol comprising a dioxane moiety, an ester of (meth)acrylic acid with an alcohol comprising a dioxolane moiety, or both.

The present disclosure relates to a hard coating film capable of providing excellent durability, elastic recovery rate, and abrasion resistance, by including a base layer; a first hard coating layer formed on at least one surface of the base layer and including a fluorine-based UV-curable functional group-containing compound; and a second hard coating layer formed between the base layer and the first hard coating layer and including inorganic particles; and an image display device including the hard coating film.

The present disclosure relates to a hard coating film capable of providing excellent durability, elastic recovery rate, and abrasion resistance, by including a base layer; a first hard coating layer formed on at least one surface of the base layer and including a fluorine-based UV-curable functional group-containing compound; and a second hard coating layer formed between the base layer and the first hard coating layer and including inorganic particles; and an image display device including the hard coating film.

The invention concerns coating composition comprising hydrophobic polymer for use as a photoreactive basecoat for a medical device or implant comprising a polymer made from monomers comprising: (a) 1 to 12 mol % of at least one photoactive monomer that is a hydrogen atom abstracter and (b) 99 to 88 mol % of one or more of acrylamides, methacrylamides, acrylates, methacrylates, and N-vinylpyrrolidone; wherein the polymer has a glass transition temperature (Tg) of less than 40° C.

Provided is a resin composition including at least one (meth)acrylate monomer, a urethane (meth)acrylate oligomer, and at least one photo initiator. The urethane (meth)acrylate oligomer includes a phosphate ester group and is represented by Formula 1. Accordingly, the resin composition may exhibit satisfactory compatibility before curing and may exhibit excellent adhesion after curing. ##STR00001##

A photocurable composition which can be used to manufacture a three-dimensional object that is formed by stacking a plurality of layers on top of each other, from which the three-dimensional object having excellent transparency, a high glass transition temperature, and a high hardness can be formed, and which exhibits a high curing rate. The photocurable composition is a photocurable composition used to manufacture a three-dimensional object that is formed by stacking a plurality of layers on top of each other. The photocurable composition contains a monofunctional monomer having a polycyclic aliphatic group, a polyfunctional monomer, an alcohol, and an acylphosphine oxide photopolymerization initiator.

The invention relates to the use of low levels of glycols and short chain diols to control air void formation in any polymerization reaction having carbonyl-containing monomers, and preferably carboxylic acid ester monomers, at a level of at least 10% of total monomer, where the monomer has a peak polymerization exotherm temperature of greater than the boiling point of the monomer. The glycols and short chain diols are used in the polymization mixture at levels of 0.5 to 10 weight percent, based on the carboxylic acid ester-containing monomer. It is believed the glycols and short chain diols hydrogen bond with the —(C═O)O— containing monomer to increase the monomer boiling point, and decrease or even eliminate the formation of air voids due to monomer boiling. The invention is especially useful in polymerization of methyl methacrylate polymers and copolymers, either neat, or as a polymer composite system.