C08F220/18

Air void control composition for carbonyl-containing monomer polymerization

The invention relates to the use of low levels of glycols and short chain diols to control air void formation in any polymerization reaction having carbonyl-containing monomers, and preferably carboxylic acid ester monomers, at a level of at least 10% of total monomer, where the monomer has a peak polymerization exotherm temperature of greater than the boiling point of the monomer. The glycols and short chain diols are used in the polymization mixture at levels of 0.5 to 10 weight percent, based on the carboxylic acid ester-containing monomer. It is believed the glycols and short chain diols hydrogen bond with the —(C═O)O— containing monomer to increase the monomer boiling point, and decrease or even eliminate the formation of air voids due to monomer boiling. The invention is especially useful in polymerization of methyl methacrylate polymers and copolymers, either neat, or as a polymer composite system.

Polymeric additives made using base addition and related methods

A method for assessing polymeric additive content A in a polymeric particle mixture may comprise determining a concentration B of a metal cation in a polymeric particle mixture comprising parent polymeric particles and polymeric additive particles, wherein the metal cation is selected from alkali earth metals and alkali metals, other than sodium (Na), and the metal cation is capable of forming a water-soluble base; determining a concentration C of the metal cation in the parent polymeric particles; determining a concentration D of the metal cation in the polymeric additive particles; and calculating a polymeric additive content A using formula A=(B−C)/D.

Polymeric additives made using base addition and related methods

A method for assessing polymeric additive content A in a polymeric particle mixture may comprise determining a concentration B of a metal cation in a polymeric particle mixture comprising parent polymeric particles and polymeric additive particles, wherein the metal cation is selected from alkali earth metals and alkali metals, other than sodium (Na), and the metal cation is capable of forming a water-soluble base; determining a concentration C of the metal cation in the parent polymeric particles; determining a concentration D of the metal cation in the polymeric additive particles; and calculating a polymeric additive content A using formula A=(B−C)/D.

Positive resist composition and patterning process

A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.

Curable compositions for pressure-sensitive adhesives

Curable compositions, cured compositions, articles containing the curable or cured compositions, and methods of making the articles are provided. More particularly, the curable compositions contain a (meth)acrylate-based polymer having pendant (meth)acryloyl groups, at least one monomer having a single ethylenically unsaturated group, a photoinitiator that includes an acyl phosphine oxide, and a thixotropic agent. The curable compositions can be printed or dispensed, if desired, and the cured compositions are pressure-sensitive adhesives.

Curable compositions for pressure-sensitive adhesives

Curable compositions, cured compositions, articles containing the curable or cured compositions, and methods of making the articles are provided. More particularly, the curable compositions contain a (meth)acrylate-based polymer having pendant (meth)acryloyl groups, at least one monomer having a single ethylenically unsaturated group, a photoinitiator that includes an acyl phosphine oxide, and a thixotropic agent. The curable compositions can be printed or dispensed, if desired, and the cured compositions are pressure-sensitive adhesives.

Ammonia-based, imide-containing resin cuts of styrene-maleic resins

A process of preparing an aqueous solution of a cycloimide-containing polymer includes heating an aqueous solution of a cycloanhydride-containing polymer with a first neutralizing agent at a ratio of cycloanhydride to neutralizing agent of about 1:1 to about 1:1.5 at a temperature and for a time sufficient to form the aqueous solution of the cycloimide-containing polymer having a cycloimide to acid group ratio of about 1:2 to about 1.5:2.

METHOD FOR PRODUCING A REMOVABLE PRESSURE-SENSITIVE ADHESIVE (PSA) AND PRESSURE-SENSITIVE ADHESIVE THUS PRODUCED

The present invention refers to a method for producing polymeric compositions, preferably dispersions (i.e. emulsions or latices), which are particularly useful as or in adhesives, especially pressure-sensitive adhesives, particularly pressure-sensitive adhesives removable under neutral or basic (alkaline) conditions, as well as to the polymeric compositions thus produced and to their various applications.

SILOXANE EXCHANGE CHEMISTRY FOR VITRIMERS

A vitrimer composition includes a first plurality of polymer backbones cross-linked with cross-linkers that include at least one siloxane moiety having formula 1:

##STR00001##

wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are each independently H or C.sub.1-6 alkyl. A catalyst that accelerates siloxane exchange is dispersed within the first plurality of polymer backbones.

SILOXANE EXCHANGE CHEMISTRY FOR VITRIMERS

A vitrimer composition includes a first plurality of polymer backbones cross-linked with cross-linkers that include at least one siloxane moiety having formula 1:

##STR00001##

wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are each independently H or C.sub.1-6 alkyl. A catalyst that accelerates siloxane exchange is dispersed within the first plurality of polymer backbones.