Patent classifications
C08F220/18
A PHOTOCURABLE RESIN COMPOSITION FOR SURGICAL GUIDE AND SURGICAL GUIDE MADE THEREFROM AND METHOD FOR MANUFACTURING SAME
One aspect of the present invention provides a photocurable resin composition for a surgical guide, which comprises 20 to 50 parts by weight of (meth)acrylate-based urethane copolymer; 40 to 70 parts by weight of a first (meth)acrylate-based monomer; 4 to 9 parts by weight of a second (meth)acrylate-based monomer; 1 to 4 parts by weight of a photoinitiator; and 0.005 to 1 parts by weight of a UV absorber, a surgical guide manufactured therefrom, and a method for manufacturing the same.
POLYMER RESIN, WINDOW MODULE INCLUDING THE SAME, AND DISPLAY APPARATUS INCLUDING THE SAME
A window module including a window, a first print layer, an ink layer, and a protective layer covering the ink layer. The protective layer includes a polymer resin polymerized from monomers including a first monomer which is an acrylic monomer substituted with a hydroxy group, a second monomer having an epoxy group, and at least one of a third monomer having a substituted or unsubstituted phenyl group or a fourth monomer which is an acrylic monomer having a substituted or unsubstituted bicyclic alkyl group, and thus, has excellent durability, chemical resistance, and abrasion resistance.
THERMOSETTING RESIN COMPOSITION, CURED FILM, METHOD FOR FORMING MULTILAYER COATING FILM, ESTER COMPOUND, AND POLYMER
[Problem] To obtain a thermosetting resin composition that has curing performance at a lower temperature and uses transesterification capable of also suitably coping with conversion into an aqueous form as a curing reaction.
[Solution] A thermosetting resin composition containing a resin component (A), which includes a structure (a) represented by the following general formula (1) and a hydroxy group (b), and a transesterification catalyst (B).
##STR00001##
n=0 to 20
R.sub.1 is an alkyl group having 50 or less carbon atoms.
R.sub.3 is hydrogen or an alkyl group having 10 or less carbon atoms.
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which contains a repeating unit (a1) having a specific ring structure, a compound (B) which generates an acid by an irradiation with an actinic ray or a radiation, and a specific compound (C) which is decomposed by an irradiation with an actinic ray or a radiation so that an acid-trapping property is lowered; an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device.
ADHESIVE COMPOSITION, ADHESIVE AGENT, ADHESIVE TAPE, AND AIRTIGHT WATERPROOF ADHESIVE TAPE
An adhesive composition that is excellent in both adhesiveness and a holding force while having high flame retardancy. The adhesive composition contains an acrylic resin (A) containing a (meth)acrylic acid monomer (a1) unit and a hydroxyl group-containing monomer (a2) unit, an epoxy crosslinking agent (b1), an isocyanate crosslinking agent (b2), and a flame retardant (C).
Coated articles demonstrating electromagnetic radiation transparency and method of mitigating contaminant build-up on a substrate
The present invention is directed to coated articles demonstrating a transmission of electromagnetic radiation having a frequency of 22 to 81 GHz in the range of 70% to 100%. The articles comprise substrates coated with curable film-forming compositions comprising a first film-forming polymer prepared from at least one hydrophobic monomer, a second film-forming polymer prepared from at least one hydrophobic monomer, and a curing agent. Upon application of the curable film-forming composition to the substrate to form a coating layer, the first film-forming polymer is distributed throughout the coating layer, and the concentration of the second film-forming polymer is greater at the surface of the coating layer than the concentration of the second film-forming polymer within the bulk of the coating layer. The present invention is also drawn to methods of mitigating contaminant build-up on a substrate using the curable film-forming compositions described above.
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
A radiation-sensitive resin composition includes: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; a radiation-sensitive acid generator; and a compound represented by formula (1). Ar.sup.1 represents a group obtained by removing (a+b+2) hydrogen atoms from an aromatic hydrocarbon ring having 6 to 30 ring atoms; R.sup.1 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms; L.sup.1 represents a divalent linking group; R.sup.2 represents a substituted or unsubstituted monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms; a is an integer of 0 to 10, b is an integer of 1 to 10, wherein a sum of a and b is no greater than 10; and X.sup.+ represents a monovalent radiation-sensitive onium cation.
##STR00001##
Positive resist composition and patterning process
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of an iodized or brominated phenol, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
POLYACRYLATE-BASED GRAFT COPOLYMER
The invention relates to a polyacrylate-based graft copolymer comprising a polyacrylate backbone and polyolefin side chains grafted thereon, wherein the graft copolymer is prepared by reacting a first polymer and a second polymer, wherein the first polymer comprises recurring units having the structure (I) and optionally further recurring units having the structures (II): Formulae (I), (II) wherein R.sup.1, R.sup.3 is H or CH.sub.3 and R.sup.2 is a hydrocarbon moiety comprising 1 to 6 carbon atoms, one of R.sup.4 and R.sup.5 is H and the other one of R.sup.5 and R.sup.4 is COOR.sup.2, C═N, Cl, or an aliphatic or aromatic hydrocarbon moiety optionally containing one or multiple hetero atom functionalities, wherein R.sup.2 in (I) is different from R.sup.2 in (II) and the second polymer is a functionalized polyolefin having one or multiple hydroxyl functional groups, wherein the graft copolymer is formed by transesterification of the COOR.sup.2 group of (1) or (II) with the hydroxyl functional group of the functionalized polyolefin.
MULTISTAGE EMULSION POLYMER AND PROCESS OF PREPARING THE SAME
A multistage emulsion polymer comprising a first polymer and a second polymer comprising structural units of a nitrogen-containing heterocyclic monomer at specific weight ratios of the first polymer to the second polymer and a Tg difference between the first and second polymers; the multistage emulsion polymer suitable for use in coating applications to provide coating films with improved dirt pick-up resistance without compromising film formation properties.