The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

A stabilizer mixture comprising a sterically hindered amine light stabilizer, a triazine UV absorber and a benzophenone UV absorber.

A stabilizer mixture comprising a sterically hindered amine light stabilizer, a triazine UV absorber and a benzophenone UV absorber.

A stabilizer mixture comprising a sterically hindered amine light stabilizer, a triazine UV absorber and a benzophenone UV absorber.

The present invention provides a flame retardant composition having a high flame retarding effect and exceptional bleed-out suppression when added to a resin, and a flame-retardant thermoplastic resin composition that uses the same. This flame retardant composition includes a phosphoramidate compound (component (A)) having a specific structure, and a hindered amine compound (component (B)). This flame retardant composition furthermore includes, as needed, a compound (component (C)) having a 1,3,5-triazine structure or a 1,3,5-triazine fused ring structure. This flame-retardant thermoplastic resin composition includes the above component (A), the above component (B), and a thermoplastic resin (component (D)), and furthermore includes, as needed, the above component (C).

It would be helpful to provide a styrene-based resin molded body that has excellent dielectric constant, dielectric loss tangent, and color tone, and with little degradation in properties due to usage environment. The present disclosure is a styrene-based resin composition containing a styrene-based resin (A1) having styrene-based monomer units as repeating units. The styrene-based resin composition includes 6 μg or less of a catechol derivative contained in the styrene-based resin (A1) per gram of the styrene-based resin (A1), and the total amount of dimers of the styrene-based monomer units and trimers of the styrene-based monomer units contained in the styrene-based resin (A1) is 5000 μg or less per gram of the styrene-based resin (A1). The styrene-based resin composition has a dielectric constant of 3 or less and a dielectric loss tangent of 0.02 or less.

It would be helpful to provide a styrene-based resin molded body that has excellent dielectric constant, dielectric loss tangent, and color tone, and with little degradation in properties due to usage environment. The present disclosure is a styrene-based resin composition containing a styrene-based resin (A1) having styrene-based monomer units as repeating units. The styrene-based resin composition includes 6 μg or less of a catechol derivative contained in the styrene-based resin (A1) per gram of the styrene-based resin (A1), and the total amount of dimers of the styrene-based monomer units and trimers of the styrene-based monomer units contained in the styrene-based resin (A1) is 5000 μg or less per gram of the styrene-based resin (A1). The styrene-based resin composition has a dielectric constant of 3 or less and a dielectric loss tangent of 0.02 or less.

A resin composition includes 100 parts by weight of a vinyl-containing polyphenylene ether resin; 2 parts by weight to 50 parts by weight of any compound having a structure of Formula (1) or a combination thereof; and 20 parts by weight to 80 parts by weight of a polyolefin resin; the polyolefin resin includes styrene-butadiene-divinylbenzene terpolymer, styrene-butadiene-maleic anhydride terpolymer, styrene-butadiene copolymer, hydrogenated styrene-butadiene copolymer, polybutadiene, maleic anhydride-butadiene copolymer or a combination thereof. Moreover, an article may be made from the resin composition, including a prepreg, a resin film, a laminate or a printed circuit board. ##STR00001##

Use of a coating composition on a chromium free tinplate substrate, the coating composition comprising: a polyester material, and benzoguanamine or a derivative thereof, wherein the coating composition is substantially free of bisphenol A (BPA), bisphenol F (BPF), bisphenol A diglycidyl ether (BADGE) and bisphenol F diglycidyl ether (BFDGE).