Patent classifications
C08F220/1803
Pattern forming material, composition for pattern formation, pattern forming method and method of manufacturing semiconductor device
According to one embodiment, a pattern forming material is disclosed. The pattern forming material contains a polymer. The polymer includes a specific first monomer unit. The monomer unit has a structure having ester of a carboxyl group at a terminal of a side chain. In the ester, a carbon atom bonded to an oxygen atom next to a carbonyl group is a primary carbon, a secondary carbon or a tertiary carbon. The pattern forming material is used for manufacturing a composite film as a mask pattern for processing a target film on a substrate. The composite film is formed by a process including, forming an organic film on the target film with the pattern forming material, patterning the organic film, and forming the composite film by infiltering a metal compound into the patterned organic film.
Block copolymer, preparation method thereof, and thin film structure comprising the same
A block copolymer is provided. The block copolymer includes a first block including repeat units represented by formula (I), and a second block connected to the first block and including repeat units represented by formula (II) or (III). The disclosure also provides a method for preparing the block copolymer and a thin film structure including the same.
PRESSURE SENSITIVE COMPOSITIONS BASED ON A MODIFIED RUBBER POLYMER AQUEOUS DISPERSION
The invention relates to an aqueous polymer dispersion which comprises: a) an aqueous polymer dispersion comprising grafted rubber polymeric particles from rubber polymer being selected from natural or synthetic rubber, b) an aqueous polymer dispersion with polymeric particles of a second polymer comprising monomeric units derived from a monomeric composition b) comprising: b1) a (meth)acrylate of a linear or branched alcohol in C.sub.4 to C.sub.10 or a mixture of such (meth)acrylates, said (meth)acrylate having Tg.sub.b1 lower than −30° C., b2) optionally, at least one comonomer having Tg.sub.b2 higher than −30° C.,
with said grafted rubber polymeric particles being grafted in an aqueous dispersion by a part of said monomeric composition b) as defined above. The invention covers also a specific process of preparation of said dispersion, an adhesive composition comprising said dispersion, the use of said dispersion in pressure sensitive adhesives and the resulting adhesive.
PRESSURE SENSITIVE COMPOSITIONS BASED ON A MODIFIED RUBBER POLYMER AQUEOUS DISPERSION
The invention relates to an aqueous polymer dispersion which comprises: a) an aqueous polymer dispersion comprising grafted rubber polymeric particles from rubber polymer being selected from natural or synthetic rubber, b) an aqueous polymer dispersion with polymeric particles of a second polymer comprising monomeric units derived from a monomeric composition b) comprising: b1) a (meth)acrylate of a linear or branched alcohol in C.sub.4 to C.sub.10 or a mixture of such (meth)acrylates, said (meth)acrylate having Tg.sub.b1 lower than −30° C., b2) optionally, at least one comonomer having Tg.sub.b2 higher than −30° C.,
with said grafted rubber polymeric particles being grafted in an aqueous dispersion by a part of said monomeric composition b) as defined above. The invention covers also a specific process of preparation of said dispersion, an adhesive composition comprising said dispersion, the use of said dispersion in pressure sensitive adhesives and the resulting adhesive.
INKJET INK
An inkjet ink includes at least pigment particles, a resin, and water. Dispersed particles in the inkjet ink including the pigment particles have an average particle diameter of at least 90 nm and no greater than 100 nm. The resin has a mass ratio to the pigment particles of at least 0.05 and no greater than 0.10. The resin includes at least a repeating unit represented by formula (1) and a repeating unit represented by formula (2). A molar ratio of the repeating unit represented by the formula (2) to the repeating unit represented by the formula (1) is at least 0.35 and no greater than 0.80. In formula (2), R.sup.1 represents an alkyl group having a carbon number of 3 or 4
##STR00001##
Copolymer and preparation method therefor
The present invention relates to a copolymer including 20 to 65 wt % of units derived from an alkyl styrene-based monomer; 10 to 40 wt % of units derived from a (meth)acrylate-based monomer; and 20 to 40 wt % of units derived from vinyl cyan-based monomer, based on the total weight of the copolymer, wherein the residual monomer content is 780 ppm or less, and a method for preparing the same.
(METH)ACRYLATE ADHESIVE COMPOSITION
The present disclosure relates to a (meth)acrylate adhesive composition comprising a (meth)acrylated polymer, a crosslinking agent and a silane copolymer, wherein the silane copolymer comprises 70 to 95 weight parts of an acrylate monomer containing C.sub.1-C.sub.4 alkyl group and 5 to 30 weight parts of a silane represented by the following formula (I):
X—R.sup.1—SiR.sup.2.sub.3-a(OR.sup.3).sub.a (I)
wherein the weight-average molecular weight of the silane copolymer is ranging from 40,000 to 150,000. The silane copolymer can enhance the initial adhesion strength, rework ability and weather resistance of the (meth)acrylate adhesive composition. Furthermore, the (meth)acrylate adhesive composition can be used in the flexible optical film with a good bending restoring property and adhesion.
EARLY-STRENGTH POLYCARBOXYLATE SUPERPLASTICIZER WITH MOF STRUCTURE AND PREPARATION METHOD THEREOF
An early-strength polycarboxylate superplasticizer with an MOF structure and a preparation method thereof are provided. The preparation method includes the following steps: 1) performing an amidation reaction on amine-containing nanocrystalline MOFs and a halogen acyl halide organic molecule to form the halogen-containing ATRP initiator; 2) performing an ATRP reaction on the obtained ATRP initiator, an unsaturated ester monomer, an unsaturated polyether macromonomer and a transition metal complex to obtain the early-strength polycarboxylate superplasticizer with the MOF structure. The present invention regulates the number and length of branch chains and product performance by controlling the number of amine groups contained in the nanocrystalline MOFs and ATRP, and has the advantages of rapid reaction, high efficiency, non-toxic and non-pollution, and simple operation. The prepared early-strength polycarboxylate superplasticizer with the MOF structure has early-strength performance and stable product performance.
EARLY-STRENGTH POLYCARBOXYLATE SUPERPLASTICIZER WITH MOF STRUCTURE AND PREPARATION METHOD THEREOF
An early-strength polycarboxylate superplasticizer with an MOF structure and a preparation method thereof are provided. The preparation method includes the following steps: 1) performing an amidation reaction on amine-containing nanocrystalline MOFs and a halogen acyl halide organic molecule to form the halogen-containing ATRP initiator; 2) performing an ATRP reaction on the obtained ATRP initiator, an unsaturated ester monomer, an unsaturated polyether macromonomer and a transition metal complex to obtain the early-strength polycarboxylate superplasticizer with the MOF structure. The present invention regulates the number and length of branch chains and product performance by controlling the number of amine groups contained in the nanocrystalline MOFs and ATRP, and has the advantages of rapid reaction, high efficiency, non-toxic and non-pollution, and simple operation. The prepared early-strength polycarboxylate superplasticizer with the MOF structure has early-strength performance and stable product performance.
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Disclosed are a carboxylate represented by formula (I), a carboxylic acid generator, a resin, and a resist composition including the same.
##STR00001##
wherein R.sup.1 and R.sup.2 each represent a hydroxy group, —O—R.sup.10, etc.; R.sup.4, R.sup.5, R.sup.7 and R.sup.8 each represent a halogen atom, a haloalkyl group, etc.; R.sup.10 represents an acid-labile group; A.sup.1 and A.sup.2 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5; X.sup.0 represents a single bond, a hydrocarbon group which may have a substituent; R.sup.bb1 represents a hydrogen atom, a halogen atom, etc.; X.sup.10 represents a single bond, *—O—**, etc.; and L.sup.10 represents a single bond or a hydrocarbon group which may have a substituent.