Patent classifications
C08F220/1805
Aqueous thickener blend composition
An aqueous thickener blend composition comprising an aqueous hydrophobically-modified alkali soluble or alkali swellable thickener composition and an acid-suppressible associative thickener composition, affording high thickening efficiency and providing an aqueous coating composition comprising such aqueous thickener blend composition with good heat-age stability and color float stability.
METHOD FOR MANUFACTURING POLYMER
Object: To provide a method for manufacturing a polymer, which is a method for forming a polymer having a homogeneous copolymer composition and a narrow molecular weight distribution.
Resolution Means: A method for manufacturing a polymer using a microreactor including a flow path capable of mixing a plurality of liquids to perform radical polymerization of a monomer component containing two or more types of monomers in the presence of a polymerization initiator; wherein the microreactor includes a first inlet port configured to feed the monomer component and an additional inlet port located downstream of the first inlet port; and the method includes feeding the monomer component through the first inlet port and the additional inlet port.
METHOD FOR MANUFACTURING POLYMER
Object: To provide a method for manufacturing a polymer, which is a method for forming a polymer having a homogeneous copolymer composition and a narrow molecular weight distribution.
Resolution Means: A method for manufacturing a polymer using a microreactor including a flow path capable of mixing a plurality of liquids to perform radical polymerization of a monomer component containing two or more types of monomers in the presence of a polymerization initiator; wherein the microreactor includes a first inlet port configured to feed the monomer component and an additional inlet port located downstream of the first inlet port; and the method includes feeding the monomer component through the first inlet port and the additional inlet port.
Method for manufacturing polymer
Object: To provide a method for manufacturing a polymer, which is a method for forming a polymer having a homogeneous copolymer composition and a narrow molecular weight distribution. Resolution Means: A method for manufacturing a polymer using a microreactor including a flow path capable of mixing a plurality of liquids to perform radical polymerization of a monomer component containing two or more types of monomers in the presence of a polymerization initiator; wherein the microreactor includes a first inlet port configured to feed the monomer component and an additional inlet port located downstream of the first inlet port; and the method includes feeding the monomer component through the first inlet port and the additional inlet port.
Method for manufacturing polymer
Object: To provide a method for manufacturing a polymer, which is a method for forming a polymer having a homogeneous copolymer composition and a narrow molecular weight distribution. Resolution Means: A method for manufacturing a polymer using a microreactor including a flow path capable of mixing a plurality of liquids to perform radical polymerization of a monomer component containing two or more types of monomers in the presence of a polymerization initiator; wherein the microreactor includes a first inlet port configured to feed the monomer component and an additional inlet port located downstream of the first inlet port; and the method includes feeding the monomer component through the first inlet port and the additional inlet port.
Resist composition and patterning process
A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
Resist composition and patterning process
A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
Surface-treated metallic material with easy control of glossiness and manufacturing method therefor
Provided is a surface-treated metallic material with easy control of glossiness and a manufacturing method therefor, the surface-treated metallic material comprising: a metallic material; and a coating layer which is formed on at least one side of the metallic material and on which an ultraviolet curable coating composition is cured, wherein the coating layer consists of a plurality of protrusions, which have a volume of 3 to 16 pico liters and are arranged at a density of 5 to 610 per 1 mm.sup.2 of the metallic material. As such, the surface-treated steel sheet is excellent in adhesion, scratch resistance and corrosion resistance, and has easy control of glossiness.
Surface-treated metallic material with easy control of glossiness and manufacturing method therefor
Provided is a surface-treated metallic material with easy control of glossiness and a manufacturing method therefor, the surface-treated metallic material comprising: a metallic material; and a coating layer which is formed on at least one side of the metallic material and on which an ultraviolet curable coating composition is cured, wherein the coating layer consists of a plurality of protrusions, which have a volume of 3 to 16 pico liters and are arranged at a density of 5 to 610 per 1 mm.sup.2 of the metallic material. As such, the surface-treated steel sheet is excellent in adhesion, scratch resistance and corrosion resistance, and has easy control of glossiness.
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2), R.sup.1 represents a hydrogen atom, or the like; R.sup.2 represents a hydrogen atom or the like; and R.sup.3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Ar.sup.1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R.sup.4 represents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and R.sup.5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like.
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