Provided is an acrylic emulsion pressure-sensitive adhesive composition, and more particularly, an acrylic emulsion pressure-sensitive adhesive composition which may realize excellent adhesive properties, and may maintain excellent adhesive strength even after aging, in particular, when applied to a curved surface of an adherend, and thus may be usefully applied to labels for bottles, etc.

The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.

The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.

Disclosed is a thermoplastic resin composition having excellent compatibility between a base resin and additives that may prevent aggregation of a metal pigment, and a molded article including the same. Also disclosed is a molded article manufactured using the thermoplastic resin composition, which may reduce flow marks on a metallic surface, and thus appearance and gloss may be excellent, injection quality and antistatic properties may be excellent, and the molded article may be widely used in various fields such as electronics.

A resist composition comprising a base polymer and a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with an iodized phenyl-containing group and a nitro group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with an iodized phenyl-containing group and a nitro group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

An adhesive sheet utilizes an acrylic resin composition without using a separate primer layer, thus providing excellent adhesion, high reliability due to its excellent light resistance under the sunlight exposure, and excellent elastic modulus, and can be easily used as an adhesive material in various fields such as building materials and automobiles.

An infrared cut-off filter, including a cyanine dye and a copolymer. The cyanine dye includes tris(pentafluoroethyl) trifluorophosphate and a cation having a polymethine and a nitrogen-containing heterocycle at each end of the polymethine. The copolymer includes a first repeating unit from a first monomer and a second repeating unit from a second monomer different from the first monomer. The first monomer includes a phenolic hydroxyl group.

An infrared cut-off filter, including a cyanine dye and a copolymer. The cyanine dye includes tris(pentafluoroethyl) trifluorophosphate and a cation having a polymethine and a nitrogen-containing heterocycle at each end of the polymethine. The copolymer includes a first repeating unit from a first monomer and a second repeating unit from a second monomer different from the first monomer. The first monomer includes a phenolic hydroxyl group.

The present disclosure relates to compositions comprising a copolymer derived from a vinyl aromatic monomer, a (meth)acrylate monomer, an acid monomer, and a copolymerizable surfactant and compositions comprising the same. The (meth)acrylate monomer can be selected from a monomer having a theoretical glass transition temperature (Tg) for its corresponding homopolymer of 0° C. or less or a hydrophobic (meth)acrylate monomer. In some embodiments, the copolymer is further derived from an organosilane. The copolymers can have a theoretical glass transition temperature (Tg) from −60° C. to 80° C. and a number average particle size of 250 nm or less. The compositions can be used to prepare compositions such as coatings that have improved water resistance, blush resistance, and/or resistance to hydrostatic pressures. Methods of making the copolymers are also provided.