C08F220/1807

QUANTUM DOT, COMPOSITION FOR PREPARING QUANTUM DOT COMPOSITE, QUANTUM DOT COMPOSITE, AND DISPLAY PANEL

A quantum dot, a quantum dot composite including the quantum dot, a composition for preparing the quantum dot composite, a display panel including the quantum dot composite, and an electronic apparatus including the display panel. The quantum dot includes a semiconductor nanocrystal core including indium and phosphorus, the semiconductor nanocrystal core having an emission peak wavelength from about 600 nm to about 650 nm, or an emission peak wavelength from about 500 nm to about 550 nm, and an area of a peak from about 400° C. to about 500° C. is 0.17 times to 0.5 times relative to an area of a peak from about 200° C. to about 300° C. in a thermogravimetric analysis (TGA) graph as determined with a differential scanning calorimeter (DSC).

PHOTOCURABLE COMPOSITION COMPRISING A FULLERENE
20230021464 · 2023-01-26 ·

A photocurable composition can comprise a polymerizable material, a fullerene or fullerene derivative in an amount of at least 0.2 wt % and not greater than 5.0 wt %, and a photoinitiator and may be adapted for AIP or NIL processing. A photo-cured layer made from the photocurable composition can have an improved thermal stability in comparison to a photo-cured layer made from the same photocurable composition except not containing a fullerene or fullerene derivative.

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
20230229082 · 2023-07-20 · ·

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2). R.sup.1 represents a hydrogen atom, or the like; R.sup.2 represents a hydrogen atom or the like; and R.sup.3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Ar.sup.1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R.sup.4 represents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and R.sup.5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like.

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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
20230229082 · 2023-07-20 · ·

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2). R.sup.1 represents a hydrogen atom, or the like; R.sup.2 represents a hydrogen atom or the like; and R.sup.3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Ar.sup.1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R.sup.4 represents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and R.sup.5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like.

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Pattern forming method

A pattern forming method comprises dispensing a curable composition onto an underlayer of a substrate; bringing the curable composition into contact with a mold; irradiating the curable composition with light to form a cured film; and separating the cured film from the mold. The proportion of the number of carbon atoms relative to the total number of atoms in the underlayer is 80% or more. The dispensing step comprises a first dispensing step of dispensing a curable composition (A1) substantially free of a fluorosurfactant onto the underlayer, and a second dispensing step of dripping a droplet of a curable composition (A2) having a fluorosurfactant concentration in components excluding a solvent of 1.1% by mass or less onto the curable composition (A1) discretely.

Pattern forming method

A pattern forming method comprises dispensing a curable composition onto an underlayer of a substrate; bringing the curable composition into contact with a mold; irradiating the curable composition with light to form a cured film; and separating the cured film from the mold. The proportion of the number of carbon atoms relative to the total number of atoms in the underlayer is 80% or more. The dispensing step comprises a first dispensing step of dispensing a curable composition (A1) substantially free of a fluorosurfactant onto the underlayer, and a second dispensing step of dripping a droplet of a curable composition (A2) having a fluorosurfactant concentration in components excluding a solvent of 1.1% by mass or less onto the curable composition (A1) discretely.

COMPOSITION AND DISPLAY DEVICE

A composition contains quantum dots (A) and a resin (B), wherein the resin (B) contains a polymer (B1) having a sulfide group, a carboxyl group, and an unsaturated double bond.

BINDER FOR NONAQUEOUS SECONDARY BATTERY ELECTRODE AND SLURRY FOR NONAQUEOUS SECONDARY BATTERY ELECTRODE

The present invention provides a binder for a nonaqueous secondary battery electrode capable of greatly improving the peeling strength of an electrode active material layer to a current collector while suppressing the occurrence of cracks in the electrode active material layer formed on the current collector. The binder for a nonaqueous secondary battery electrode includes a copolymer (P) having a structural unit (a) derived from a monomer (A) represented by formula (1), a structural unit (b) derived from a monomer (B) which is at least one kind selected from the group consisting of a (meth)acrylic acid and a salt thereof, and a structural unit (c) derived from a monomer (C) which is an ethylenically unsaturated carboxylic acid ester of an aromatic alcohol.

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BINDER FOR NONAQUEOUS SECONDARY BATTERY ELECTRODE AND SLURRY FOR NONAQUEOUS SECONDARY BATTERY ELECTRODE

The present invention provides a binder for a nonaqueous secondary battery electrode capable of greatly improving the peeling strength of an electrode active material layer to a current collector while suppressing the occurrence of cracks in the electrode active material layer formed on the current collector. The binder for a nonaqueous secondary battery electrode includes a copolymer (P) having a structural unit (a) derived from a monomer (A) represented by formula (1), a structural unit (b) derived from a monomer (B) which is at least one kind selected from the group consisting of a (meth)acrylic acid and a salt thereof, and a structural unit (c) derived from a monomer (C) which is an ethylenically unsaturated carboxylic acid ester of an aromatic alcohol.

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ADHESIVE TAPE, METHOD FOR FIXING ELECTRONIC DEVICE COMPONENT OR ON-BOARD DEVICE COMPONENT, AND METHOD FOR PRODUCING ELECTRONIC DEVICE OR ON-BOARD DEVICE
20230212442 · 2023-07-06 ·

The present invention aims to provide an adhesive tape that is easily peelable while capable of maintaining high adhesion at high temperature. The present invention also aims to provide a method for fixing an electronic device component or an in-vehicle device component using the adhesive tape and a method for producing an electronic device or an in-vehicle device. Provided is an adhesive tape including an adhesive layer containing: an acrylic copolymer; and 0.01 parts by weight or more and 10 parts by weight or less of a compound having a structure represented by the following formula (A) or (B) relative to 100 parts by weight of the acrylic copolymer:

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