The invention relates to polymer compositions with improved manageability, The invention also relates to a polymer composition obtainable by radical polymerisation of A) 95-40 wt. % of a monomer mixture comprising Ai) 65-98 wt. % of at least alkyl (meth)acrylate having a linear C.sub.16-C.sub.40 alkyl radical and Aii) 2-35 wt. % of at least one comonomer selected from (meth)acrylates and (meth)acrylamides, which supports an optionally substituted aromatic radical bonded via an alkylene, alkenylene, oxyalkylene or polyoxyalkylene group to the ester group of the (meth)acrylate or to the amide group of the (meth)acrylamide, in the presence of B) 5-60% by weight % of at least one ethylene copolymer. The invention further relates to a method for the preparation and use thereof as flow improvers for paraffin-containing hydrocarbon oils.

The invention relates to polymer compositions with improved manageability, The invention also relates to a polymer composition obtainable by radical polymerisation of A) 95-40 wt. % of a monomer mixture comprising Ai) 65-98 wt. % of at least alkyl (meth)acrylate having a linear C.sub.16-C.sub.40 alkyl radical and Aii) 2-35 wt. % of at least one comonomer selected from (meth)acrylates and (meth)acrylamides, which supports an optionally substituted aromatic radical bonded via an alkylene, alkenylene, oxyalkylene or polyoxyalkylene group to the ester group of the (meth)acrylate or to the amide group of the (meth)acrylamide, in the presence of B) 5-60% by weight % of at least one ethylene copolymer. The invention further relates to a method for the preparation and use thereof as flow improvers for paraffin-containing hydrocarbon oils.

The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.

The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.

The present invention is directed to a rubber composition comprising an elastomer, a filler, and a block-copolymer. According to the invention, the block-copolymer comprises (i) an elastomer block and (ii) a thermoplastic block comprising a poly alkylacrylate, wherein the alkylacrylate comprises a polycyclic substituent at its single bonded oxygen atom. Moreover, the present invention is directed to a block-copolymer.

A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.

A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.

A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A.sup.1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring. ##STR00001##

A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A.sup.1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring. ##STR00001##

A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of N-carbonylsulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.