Provided are a photosensitive composition including a coloring material A including a pigment, a pigment derivative B, and a dispersant C, in which the pigment derivative B includes a pigment derivative B1 in which a maximum value of a molar absorption coefficient in a wavelength range of 400 to 700 nm is 3000 L.Math.mol.sup.−1.Math.cm.sup.−1 or less, the dispersant C includes a dispersant C1 having an ethylenically unsaturated bond-containing group, and a total content of the coloring material A and the pigment derivative B in a total solid content of the photosensitive composition is 50% by mass or more; a film formed of the photosensitive composition; an optical filter, a solid-state imaging element; and an image display device.

Provided are a method for forming a resist pattern that demonstrates excellent performance in sensitivity, resolution, etc. in an exposure step when a next-generation exposure technique is applied, and a radiation-sensitive resin composition. The method for forming a resist pattern includes step (1) of forming a resist film in which a content of a radiation-sensitive acid generator (C) is 0.1% by mass or less, step (2) of exposing the resist film to EUV or an electron beam (EB), and step (3) of developing the resist film exposed in the step (2).

A photoresist composition, comprising: a polymer comprising: a first repeating unit derived from a first monomer comprising a substituted lactone, wherein the first repeating unit comprises a lactone ring derived from the substituted lactone, and wherein a carbon atom of the lactone ring forms a part of a backbone of the polymer, and a second repeating unit derived from a second monomer comprising an acetal group; a photoacid generator; and a solvent.

A photoresist composition, comprising: a polymer comprising: a first repeating unit derived from a first monomer comprising a substituted lactone, wherein the first repeating unit comprises a lactone ring derived from the substituted lactone, and wherein a carbon atom of the lactone ring forms a part of a backbone of the polymer, and a second repeating unit derived from a second monomer comprising an acetal group; a photoacid generator; and a solvent.

An adhesive film for polarizing plates, a polarizing plate including the same, and an optical display apparatus including the same are provided. An adhesive film for polarizing plates includes: a (meth)acrylic copolymer, a curing agent, a (meth)acrylic oligomer, and an antistatic agent, and has a modulus of about 0.5 MPa or more at about 25° C. and a surface resistance difference ΔSR of about 1.0 log (Ω/□) or less, as calculated by Equation 1 herein.

An adhesive film for polarizing plates, a polarizing plate including the same, and an optical display apparatus including the same are provided. An adhesive film for polarizing plates includes: a (meth)acrylic copolymer, a curing agent, a (meth)acrylic oligomer, and an antistatic agent, and has a modulus of about 0.5 MPa or more at about 25° C. and a surface resistance difference ΔSR of about 1.0 log (Ω/□) or less, as calculated by Equation 1 herein.

A photosensitive resin composition containing a binder polymer, a photopolymerizable compound, a photopolymerization initiator, and an anthracene-based sensitizer, in which the binder polymer contains a polymer (a) having a hydroxyalkyl (meth)acrylate unit and a styrene or styrene derivative unit and having a content of the styrene or styrene derivative unit of 40% by mass or more.

A photosensitive resin composition containing a binder polymer, a photopolymerizable compound, a photopolymerization initiator, and an anthracene-based sensitizer, in which the binder polymer contains a polymer (a) having a hydroxyalkyl (meth)acrylate unit and a styrene or styrene derivative unit and having a content of the styrene or styrene derivative unit of 40% by mass or more.

A resist composition that generates an acid upon exposure is soluble in a developing solution, and is changed by action of an acid. The resist composition contains a resin component having solubility in a developing solution, which is changed by action of an acid, and has a constitutional unit represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1). In General Formula (a01-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Yax.sup.01 represents a single bond or a linking group; Ax represents a sulfonyl group or a sulfoxide group; and Rax.sup.01 represents an alkyl group, an alkoxy group, a halogen atom, or a halogenated alkyl group. In General Formula (a02-1), W represents a polymerizable group-containing group, Wa.sup.x0 represents a cyclic group having an (n.sub.ax0+1)-valent aromaticity, which may have a substituent, Wa.sup.x0 may form a condensed ring with W, and n.sub.ax0 represents an integer of 1 to 3 ##STR00001##

A diketone oxime ester compound shown in formula I and a manufacturing method therefor, and a photo-curable composition using the compound of formula I as a photoinitiator. The composition has extremely high light sensitivity and relatively low yellowing resistance when applied to prepare a color filter for a light resistance device such as a display screen.