Patent classifications
C08F220/1808
PHOTOPOLYMERIZATION INITIATOR
The present application provides a photopolymerization initiator having one or more ethylenic unsaturated bonds and one or more photopolymerization initiating functional groups in the molecule has been found. One or more kinds selected from an acrylamide group, an acrylate group, a vinyl group, an allyl group, a maleimide group, and the like can be suitably used as the ethylenic unsaturated bond, and a benzophenone compound having a specific structure can be suitably used as the photopolymerization initiating functional group.
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
An actinic ray-sensitive or radiation-sensitive resin composition includes a salt including a sulfonium cation having an aryl group substituted with an acid-decomposable group-containing group and having at least three fluorine atoms; and a resin having a polarity that increases through decomposition by an action of an acid, in which the acid-decomposable group-containing group includes a group having a polarity that increases through decomposition by an action of an acid, and the acid-decomposable group-containing group includes no fluorine atom.
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
An actinic ray-sensitive or radiation-sensitive resin composition includes a salt including a sulfonium cation having an aryl group substituted with an acid-decomposable group-containing group and having at least three fluorine atoms; and a resin having a polarity that increases through decomposition by an action of an acid, in which the acid-decomposable group-containing group includes a group having a polarity that increases through decomposition by an action of an acid, and the acid-decomposable group-containing group includes no fluorine atom.
MULTI-PHASE SILICONE ACRYLIC HYBRID VISCO-ELASTIC COMPOSITIONS AND METHODS OF MAKING SAME
A multi-phase silicone acrylic hybrid visco-elastic composition prepared by polymerizing an ethylenically unsaturated monomer and a silicon-containing pressure sensitive adhesive composition comprising acrylate or methacrylate functionality in a first solvent in the presence of an initiator, removing the first solvent, and adding a second solvent to form the multi-phase silicone acrylic hybrid visco-elastic composition. Alternatively, a multi-phase silicone acrylic hybrid visco-elastic composition prepared by polymerizing an ethylenically unsaturated monomer and a silicon-containing pressure sensitive adhesive composition comprising acrylate or methacrylate functionality in a first solvent in the presence of an initiator, adding a processing solvent having a higher boiling point than the first solvent, applying heat to selectively remove a majority of the first solvent, removing the processing solvent, and adding a second solvent to form the multi-phase silicone acrylic hybrid visco-elastic composition. The phase arrangement of the multi-phase silicone acrylic hybrid visco-elastic compositions is selectively controlled by selection of the second solvent.
MULTI-PHASE SILICONE ACRYLIC HYBRID VISCO-ELASTIC COMPOSITIONS AND METHODS OF MAKING SAME
A multi-phase silicone acrylic hybrid visco-elastic composition prepared by polymerizing an ethylenically unsaturated monomer and a silicon-containing pressure sensitive adhesive composition comprising acrylate or methacrylate functionality in a first solvent in the presence of an initiator, removing the first solvent, and adding a second solvent to form the multi-phase silicone acrylic hybrid visco-elastic composition. Alternatively, a multi-phase silicone acrylic hybrid visco-elastic composition prepared by polymerizing an ethylenically unsaturated monomer and a silicon-containing pressure sensitive adhesive composition comprising acrylate or methacrylate functionality in a first solvent in the presence of an initiator, adding a processing solvent having a higher boiling point than the first solvent, applying heat to selectively remove a majority of the first solvent, removing the processing solvent, and adding a second solvent to form the multi-phase silicone acrylic hybrid visco-elastic composition. The phase arrangement of the multi-phase silicone acrylic hybrid visco-elastic compositions is selectively controlled by selection of the second solvent.
WATERBORNE WET LOOK COATING COMPOSITION
A water-based coating composition is described herein. The composition includes an aqueous dispersion derived from an ethylenically unsaturated monomer and one or more organic solvents. The composition when applied to a substrate and allowed to dry provides a wet look to the substrate.
WATERBORNE WET LOOK COATING COMPOSITION
A water-based coating composition is described herein. The composition includes an aqueous dispersion derived from an ethylenically unsaturated monomer and one or more organic solvents. The composition when applied to a substrate and allowed to dry provides a wet look to the substrate.
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOSITION FOR FORMING UPPER LAYER FILM
A pattern forming method includes: applying an actinic ray-sensitive or radiation- sensitive resin composition onto a substrate to form a resist film; forming an upper layer film on the resist film, using a composition for forming an upper layer film; exposing the resist film having the upper layer film formed thereon; and developing the exposed resist film using a developer including an organic solvent to form a pattern. The composition for forming an upper layer film contains a resin having a repeating unit (a) with a ClogP value of 2.85 or more and a compound (b) with a ClogP of 1.30 or less, and the receding contact angle of the upper layer film with water is 70 degrees or more, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method.
Positive resist composition and pattern forming process
A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.
Positive resist composition and pattern forming process
A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.