A retort for thermally processing sinterable objects including a retort body having an interior cavity configured to receive at least one part for sintering. The retort body includes a retort inlet, a fore volume, an inlet plenum, an outlet plenum and a retort outlet. The retort inlet is configured to be fluidly connected to a process gas inlet tube and receive a flow of process gas. The retort inlet is fluidly connected to the fore volume, the fore volume being configured to receive a cleansing object. The fore volume is fluidly connected to the inlet plenum, which is fluidly connected to the interior cavity, which is in turn fluidly connected to the outlet plenum. The outlet plenum is fluidly connected to the retort outlet which is configured to be fluidly connected to an effluent gas outlet tube via a Peclet sealing element.

A retort for thermally processing sinterable objects including a retort body having an interior cavity configured to receive at least one part for sintering. The retort body includes a retort inlet, a fore volume, an inlet plenum, an outlet plenum and a retort outlet. The retort inlet is configured to be fluidly connected to a process gas inlet tube and receive a flow of process gas. The retort inlet is fluidly connected to the fore volume, the fore volume being configured to receive a cleansing object. The fore volume is fluidly connected to the inlet plenum, which is fluidly connected to the interior cavity, which is in turn fluidly connected to the outlet plenum. The outlet plenum is fluidly connected to the retort outlet which is configured to be fluidly connected to an effluent gas outlet tube via a Peclet sealing element.

To provide a method of forming a positive electrode active material with high productivity. To provide a manufacturing apparatus capable of forming a positive electrode active material with high productivity. Provided is a method of forming a positive electrode active material including lithium, a transition metal, oxygen, and fluorine. An adhesion preventing step is performed during heating of an object. Examples of the adhesion preventing step include stirring by rotating a furnace during the heating, stirring by vibrating a container containing an object during the heating, and crushing performed between the plurality of heating steps. By these manufacturing methods, a positive electrode active material having favorable distribution of an additive at the surface portion can be formed.

An apparatus 1 for processing a plurality of substrates 3 is provided. The apparatus may have a process tube 5 creating a process chamber 7; a heater 9 surrounding the process tube 5; a flange 11 for supporting the process tube; and a door 15 configured to support a wafer boat 17 with a plurality of substrates 3 in the process chamber and to seal the process chamber 7. An exhaust operably connected to the process chamber 7 may be provided to remove gas from the process chamber via a first exhaust duct 19. The apparatus may be provided with an extractor chamber 21 surrounding the first exhaust duct where it connects to the process chamber and connected to a second exhaust duct 23 to remove gas from the extractor chamber.

An apparatus 1 for processing a plurality of substrates 3 is provided. The apparatus may have a process tube 5 creating a process chamber 7; a heater 9 surrounding the process tube 5; a flange 11 for supporting the process tube; and a door 15 configured to support a wafer boat 17 with a plurality of substrates 3 in the process chamber and to seal the process chamber 7. An exhaust operably connected to the process chamber 7 may be provided to remove gas from the process chamber via a first exhaust duct 19. The apparatus may be provided with an extractor chamber 21 surrounding the first exhaust duct where it connects to the process chamber and connected to a second exhaust duct 23 to remove gas from the extractor chamber.

Batch furnace assembly for processing wafers, comprising a process chamber housing defining a process chamber and having a process chamber opening, a wafer boat housing defining a water boat chamber, a door assembly, a differential pressure sensor, and a controller. The door assembly has a closed position in which it closes off the process chamber opening. The door assembly defines in a closed position a door assembly chamber having a purge gas inlet for supplying purge gas to the door assembly chamber for gas sealingly separating the process chamber from the wafer boat chamber. The differential pressure sensor assembly fluidly connects to the door assembly chamber and is configured to determine a pressure difference between a pressure in the door assembly chamber and a reference pressure in a reference pressure chamber. The controller is configured to establish whether the pressure difference is in a desired pressure range.

Batch furnace assembly for processing wafers, comprising a process chamber housing defining a process chamber and having a process chamber opening, a wafer boat housing defining a water boat chamber, a door assembly, a differential pressure sensor, and a controller. The door assembly has a closed position in which it closes off the process chamber opening. The door assembly defines in a closed position a door assembly chamber having a purge gas inlet for supplying purge gas to the door assembly chamber for gas sealingly separating the process chamber from the wafer boat chamber. The differential pressure sensor assembly fluidly connects to the door assembly chamber and is configured to determine a pressure difference between a pressure in the door assembly chamber and a reference pressure in a reference pressure chamber. The controller is configured to establish whether the pressure difference is in a desired pressure range.

An apparatus for processing a substrate includes a reaction tube, a side cover, a heater, a first gas supplier, a second gas supplier and a controller. The reaction tube is configured to receive a substrate boat in which a plurality of the substrate is received to process the substrate. The side cover is configured to receive the reaction tube. The heater lines the interior of the side cover. The first gas supplier is provided to an upper portion of the side cover to supply a cooling gas at a first supplying rate to a space between the side cover and the reaction tube. The second gas supplier is provided to a lower portion of the side cover to supply the cooling gas at a second supplying rate different from the first supplying rate to the space between the side cover and the reaction tube. The controller controls the reaction tube.

An apparatus for processing a substrate includes a reaction tube, a side cover, a heater, a first gas supplier, a second gas supplier and a controller. The reaction tube is configured to receive a substrate boat in which a plurality of the substrate is received to process the substrate. The side cover is configured to receive the reaction tube. The heater lines the interior of the side cover. The first gas supplier is provided to an upper portion of the side cover to supply a cooling gas at a first supplying rate to a space between the side cover and the reaction tube. The second gas supplier is provided to a lower portion of the side cover to supply the cooling gas at a second supplying rate different from the first supplying rate to the space between the side cover and the reaction tube. The controller controls the reaction tube.

A furnace for thermal treatment, in particular for carbonization and/or graphitization, of material, in particular fibers, in particular fibers of oxidized polyacrylonitrile PAN. During the thermal treatment, a pyrolysis gas is released from the material. The furnace includes a housing, a process space, which is located in the interior of the housing and is delimited by a process space housing and through which the material can be fed, a heating system for heating a process space atmosphere prevailing in the process space, and an extraction system for suctioning process space atmosphere laden with pyrolysis gas from the process space. The extraction system has at least one suction device having a suction channel, which is delimited by a channel wall and which is connected to the process space by means of a suction opening. The suction opening is arranged in a region of the process space in which, during operation of the furnace a temperature prevails at which no or only moderate chemical reactions occur between the pyrolysis gas and the process space housing and/or the channel wall.