A system for chemical transformation of 3D state materials is disclosed wherein, a reaction group having a main body arranged to shape a reaction chamber in which a component configured to support a sample of 3D state arranged to be chemically transform is expected. The system further includes an oven arranged to heat the reaction chamber and a GAS supply group arranged to release a first gas in the reaction chamber and/or a casing component, inside the main body, which has a chemical agent suitable for releasing a second gas into the reaction chamber. The main body has at least two turbines arranged to converge into the reaction chamber, the first and/or the second gas on the samples. The invention relates also to a method for chemical transformation of 3D state materials.

A thermochemical treatment installation includes a reaction chamber, at least one gas inlet, and a gas preheater chamber situated between the gas inlet and the reaction chamber. The preheater chamber has a plurality of perforated distribution trays held spaced apart one above another. The preheater chamber also includes, between at least the facing distribution trays, a plurality of walls defining flow paths for a gas stream between said trays.

A thermochemical treatment installation includes a reaction chamber, at least one gas inlet, and a gas preheater chamber situated between the gas inlet and the reaction chamber. The preheater chamber has a plurality of perforated distribution trays held spaced apart one above another. The preheater chamber also includes, between at least the facing distribution trays, a plurality of walls defining flow paths for a gas stream between said trays.

Provided is a heat treatment container for a vacuum heat treatment apparatus. The heat treatment container includes a bottom and a sidewall. An exhaust passage is defined in an upper portion of the sidewall.

Provided is a heat treatment container for a vacuum heat treatment apparatus. The heat treatment container includes a bottom and a sidewall. An exhaust passage is defined in an upper portion of the sidewall.

Systems and methods for improving process uniformity in a millisecond anneal system are provided. In some implementations, a process for thermally treating a substrate in a millisecond anneal system can include obtaining data indicative of a temperature profile associated with one or more substrates during processing in a millisecond anneal system. The process can include one or more of (1) changing the pressure inside the processing chamber of the millisecond anneal system; (2) manipulating the irradiation distribution by way of the refracting effect of a water window in the millisecond anneal system; (3) adjusting the angular positioning of the substrate; and/or (4) configuring the shape of the reflectors used in the millisecond anneal system.

A method for heat treatment, a heat treatment apparatus, and a heat treatment system that is capable of performing highly precise and efficient control of heat treatment. A heat treatment furnace has in-furnace structures made of graphite and has a heat-treatment chamber in which heat treatment of materials to be treated is performed. A value of G.sup.0 (standard formation Gibbs energy) is computed with reference to the sensor information from respective sensors, and an Ellingham diagram, a control range, and a status of the heat treatment furnace in operation expressed by G.sup.0 are displayed on a display device. A control unit controls a flow rate of neutral gas or inactive gas as atmosphere gas or a flow velocity of the gas so that G.sup.0 is within the control range.

A method for heat treatment, a heat treatment apparatus, and a heat treatment system that is capable of performing highly precise and efficient control of heat treatment. A heat treatment furnace has in-furnace structures made of graphite and has a heat-treatment chamber in which heat treatment of materials to be treated is performed. A value of G.sup.0 (standard formation Gibbs energy) is computed with reference to the sensor information from respective sensors, and an Ellingham diagram, a control range, and a status of the heat treatment furnace in operation expressed by G.sup.0 are displayed on a display device. A control unit controls a flow rate of neutral gas or inactive gas as atmosphere gas or a flow velocity of the gas so that G.sup.0 is within the control range.

The present application provides an injector mounting apparatus of a furnace, wherein a first injector in the furnace has a main injector pipe. The injector mounting apparatus includes a first mounting component. The first mounting component has an injector mounting hole for the first injector to pass through and be disposed therein, a first edge on a side of the main injector pipe close to the inner side surface of the process tube abuts on a second edge on a side of the injector mounting hole close to the inner side surface of the process tube, and there is a first spacing between the second edge and an outer side face of the first mounting component. A flange is disposed at the bottom of the process tube, and the first mounting component is mounted on the flange by means of a first fixing member.

The present application provides an injector mounting apparatus of a furnace, wherein a first injector in the furnace has a main injector pipe. The injector mounting apparatus includes a first mounting component. The first mounting component has an injector mounting hole for the first injector to pass through and be disposed therein, a first edge on a side of the main injector pipe close to the inner side surface of the process tube abuts on a second edge on a side of the injector mounting hole close to the inner side surface of the process tube, and there is a first spacing between the second edge and an outer side face of the first mounting component. A flange is disposed at the bottom of the process tube, and the first mounting component is mounted on the flange by means of a first fixing member.