A vacuum pump comprises: a pump rotor portion configured such that multiple rotor blade stages including stacking portions formed in a ring shape and turbine blades radially formed on an outer peripheral side of the stacking portions are stacked on each other; a rotor shaft to which inner peripheral surfaces of the stacking portions of the multiple rotor blade stages stacked on each other are fixed; and a communication path allowing communication between a clearance space between the rotor shaft and each stacking portion and a pump exhaust path in which the turbine blades are arranged and discharging gas in the clearance space through the pump exhaust path.

A vacuum pump includes a housing, a rotatable shaft extending in an axial direction within the housing, a first pumping arrangement including a first stator arrangement and a first rotor arrangement, and a second pumping arrangement including a second stator arrangement and a second rotor arrangement. The vacuum pump further includes a spacer arranged between the first pumping arrangement and the second pumping arrangement. The spacer is coupled between the first stator arrangement and the second stator arrangement and is configured to provide a defined elasticity in the axial direction allowing an elastic deformation of the spacer in the axial direction.

A vacuum pump includes: a rotating portion and a stator portion between which an internal flow path is formed; an exhaust mechanism which sends gas from a suction port toward an outlet port through the internal flow path; and a main sensor for detecting that a deposited material has reached a prescribed thickness at a detection object position of the internal flow path, wherein the main sensor includes at least a pair of electrodes disposed in the internal flow path at an interval corresponding to the prescribed thickness, and a capacitance detection circuit which is connected to the pair of electrodes and which detects a capacitance between the pair of electrodes, and the capacitance detection circuit detects that a deposited material in the internal flow path has reached the prescribed thickness on the basis of a drop in an increase rate of the capacitance.

A turbomolecular pump, vacuum pumping system and method of evacuating a vacuum chamber is disclosed. The turbomolecular pump comprises: a rotor comprising a plurality of rotor blade rows, a stator comprising a plurality of stator blade rows and an outer casing, the rotor being rotatably mounted within the stator; wherein at least a portion of a surface of at least one of the rotor and the stator comprise a non-evaporable getter material.

A vacuum pumping arrangement comprises a first pump which has a first inlet and a first outlet. The first inlet is fluidly connected to a first common pumping line. The first common pumping line includes a plurality of first pumping line inlets each of which is fluidly connectable to a least one process chamber within a group of process chambers that form a semiconductor fabrication tool. The vacuum pumping arrangement also includes a reserve pump which has a reserve inlet and a reserve outlet. The reserve inlet is selectively fluidly connectable to each process chamber within the group of process chambers that form the semiconductor fabrication tool. The vacuum pumping arrangement additionally includes a controller which is configured to selectively fluidly isolate the pump from one or more given process chambers and selectively fluidly connect the reserve pump with the said one or more given process chambers.

A vacuum pump includes a housing, a rotatable shaft extending in an axial direction within the housing, a first pumping arrangement including a first stator arrangement and a first rotor arrangement, and a second pumping arrangement including a second stator arrangement and a second rotor arrangement. The vacuum pump further includes a spacer arranged between the first pumping arrangement and the second pumping arrangement. The spacer is coupled between the first stator arrangement and the second stator arrangement and is configured to provide a defined elasticity in the axial direction allowing an elastic deformation of the spacer in the axial direction.

A vacuum pump system includes a first vacuum pump and a second vacuum pump connected to an exhaust port of the first vacuum pump. The second vacuum pump has a pump portion and a trap portion. The pump portion has a rotor. The trap portion is configured such that a reaction product generated from gas guided to an internal space from the exhaust port of the first vacuum pump by suction by the pump portion is accumulated thereon.

A high and low-pressure integrated air pump includes a single housing including an air inlet and an air outlet. A high-pressure pump is disposed within the housing and in fluid communication with the air inlet, and uses a first outlet passage to discharge to the air outlet. A low-pressure pump is also disposed within the housing and in fluid communication with the air inlet, and uses a second outlet passage to discharge to the air outlet.

A vacuum pumping system comprising: a high pressure getter pump configured to operate from an initial pressure of between 10 and 10.sup.−2 mbar to a second pressure between 10.sup.−3 mbar and 10.sup.−6 mbar and at least one high vacuum pump configured to operate at higher vacuums than the high pressure getter pump, the two pumps being mounted on a same flange, the flange being configured to mount the vacuum pumping system to a vacuum chamber.

A vacuum pump system for evacuating at least five volumes comprising a turbomolecular pump and a forevacuum pump arranged to pump an output of the turbomolecular pump arrangement to atmosphere. The turbomolecular pump has at least five pumping stages separated by rotor blades. Not more than three pumping stages have pumping speeds in excess of ⅓ of the highest pumping speed when under vacuum and/or a pumping port cross section in excess of ⅓ of the highest pumping port cross section, and at least two pumping stages have pumping speeds less than ¼ of the highest pumping speed when under vacuum and/or a pumping port cross section of less than ¼ of the biggest pumping port cross section. The ratio of pressures between the pumping stage with the highest pressure and the pumping stage with the lowest pressure is at least 100000:1 when under vacuum.