Disclosed are compositions comprising a) an antimicrobial agent, which is selected from the group consisting of biocides containing halogen atoms and/or containing phenolic moieties, formic acid, chlorine dioxide, chlorine dioxide generating compounds, dialdehydes; components containing an antimicrobial metal such as antimicrobial silver, and b) a polyamine, especially a polyethylenimine. The polyamine is effective as a booster for the antimicrobial agent.

Disclosed are compositions comprising a) an antimicrobial agent, which is selected from the group consisting of biocides containing halogen atoms and/or containing phenolic moieties, formic acid, chlorine dioxide, chlorine dioxide generating compounds, dialdehydes; components containing an antimicrobial metal such as antimicrobial silver, and b) a polyamine, especially a polyethylenimine. The polyamine is effective as a booster for the antimicrobial agent.

A synergistic microbicidal composition having two components. The first component is a nonionic surfactant with structure: R.sup.2O(CH.sub.2CH(CH.sub.3)O).sub.3(CH.sub.2CH.sub.2O).sub.7H, where R.sup.2 is a mixture of C.sub.8-C.sub.14 linear alkyl groups. The second component is tris(hydroxymethyl)nitromethane. The weight ratio of the nonionic surfactant to tris(hydroxymethyl)nitromethane is from 1:0.16 to 1:1.8286.

A synergistic microbicidal composition having two components. The first component is a nonionic surfactant with structure: R.sup.2O(CH.sub.2CH(CH.sub.3)O).sub.3(CH.sub.2CH.sub.2O).sub.7H, where R.sup.2 is a mixture of C.sub.8-C.sub.14 linear alkyl groups. The second component is tris(hydroxymethyl)nitromethane. The weight ratio of the nonionic surfactant to tris(hydroxymethyl)nitromethane is from 1:0.16 to 1:1.8286.

A synergistic microbicidal composition having two components. The first component is a nonionic surfactant with structure: R.sup.2O(CH.sub.2CH(CH.sub.3)O).sub.3(CH.sub.2CH.sub.2O).sub.7H, where R.sup.2 is a mixture of C.sub.8-C.sub.14 linear alkyl groups. The second component is tris(hydroxymethyl)nitromethane. The weight ratio of the nonionic surfactant to tris(hydroxymethyl)nitromethane is from 1:0.16 to 1:1.8286.

Disclosed are compositions comprising a) an antimicrobial agent, which is selected from the group consisting of biocides containing halogen atoms and/or containing phenolic moieties, formic acid, chlorine dioxide, chlorine dioxide generating compounds, dialdehydes; components containing an antimicrobial metal such as antimicrobial silver, and b) a polyamine, especially a polyethylenimine. The polyamine is effective as a booster for the antimicrobial agent.

Disclosed are compositions comprising a) an antimicrobial agent, which is selected from the group consisting of biocides containing halogen atoms and/or containing phenolic moieties, formic acid, chlorine dioxide, chlorine dioxide generating compounds, dialdehydes; components containing an antimicrobial metal such as antimicrobial silver, and b) a polyamine, especially a polyethylenimine. The polyamine is effective as a booster for the antimicrobial agent.

Pesticidal mixtures comprising as active compounds 1) 1-[(1RS)-1,2-dimethylpropyl]-N-ethyl-5-methyl-N-pyridazin-4-yl-1H-pyrazole-4-carboxamide and 2) at least one further compound B selected from B.1) Succinate dehydrogenase inhibitors as defined in the specification; B.2) Inhibitors of oxysterol binding protein as defined in the specification; B.3) Inhibitors of complex III at Qi site selected from: a) florylpicoxamid, and b) fenpicox-amid; B.4) Strobilurins as defined in the specification; B.5) Inhibitors of C14-demethylase in sterol biosynthesis as defined in the specification; B.6) Inhibitors of cell division and cytoskeleton as defined in the specification, B.7) Other compounds of unknown mode of action as defined in the specification; and B.8) N-[[2-fluoro-4-[(2S,3S)-2-hydroxy-3-(3,4,5-trichlorophenyl)-3-(trifluoromethyl)pyrrolidin-1-yl]phenyl]methyl]cyclopropanecarboxamide; wherein component 1) and component 2) are present in a weight ratio of from 1000:1 to 1:1000; methods and use of these mixtures for combating invertebrate pests such as insects, arachnids, nematodes and/or harmful fungi in and on plants, and for protecting such plants being infested with pests and/or harmful fungi.

Pesticidal mixtures comprising as active compounds 1) 1-[(1RS)-1,2-dimethylpropyl]-N-ethyl-5-methyl-N-pyridazin-4-yl-1H-pyrazole-4-carboxamide and 2) at least one further compound B selected from B.1) Succinate dehydrogenase inhibitors as defined in the specification; B.2) Inhibitors of oxysterol binding protein as defined in the specification; B.3) Inhibitors of complex III at Qi site selected from: a) florylpicoxamid, and b) fenpicox-amid; B.4) Strobilurins as defined in the specification; B.5) Inhibitors of C14-demethylase in sterol biosynthesis as defined in the specification; B.6) Inhibitors of cell division and cytoskeleton as defined in the specification, B.7) Other compounds of unknown mode of action as defined in the specification; and B.8) N-[[2-fluoro-4-[(2S,3S)-2-hydroxy-3-(3,4,5-trichlorophenyl)-3-(trifluoromethyl)pyrrolidin-1-yl]phenyl]methyl]cyclopropanecarboxamide; wherein component 1) and component 2) are present in a weight ratio of from 1000:1 to 1:1000; methods and use of these mixtures for combating invertebrate pests such as insects, arachnids, nematodes and/or harmful fungi in and on plants, and for protecting such plants being infested with pests and/or harmful fungi.

A CMP slurry composition for polishing a tungsten pattern wafer and a method of polishing a tungsten pattern wafer, the CMP slurry composition including a solvent, the solvent being a polar solvent or a non-polar solvent; an abrasive agent; and a biocide, wherein the abrasive agent includes silica modified with a silane containing two nitrogen atoms or silica modified with a silane containing three nitrogen atoms, the biocide includes a compound of Formula 3:

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