A media design for modular use in an air cleaning or HVAC systems to removes gas phase contaminants. The design allows for a control of gas contaminant removal using variable media length, path length, and contact time to ensure a contained MTZ length and low pressure drop. In one embodiment, the design includes a filter module at an angle to an airflow and an air filter mounted within the filter frame. The filter module may include channels therethrough that are oriented at the optimum angle in relation to the airflow to provide the required dwell time and pressure drop for a given application.

A media design for modular use in an air cleaning or HVAC systems to removes gas phase contaminants. The design allows for a control of gas contaminant removal using variable media length, path length, and contact time to ensure a contained MTZ length and low pressure drop. In one embodiment, the design includes a filter module at an angle to an airflow and an air filter mounted within the filter frame. The filter module may include channels therethrough that are oriented at the optimum angle in relation to the airflow to provide the required dwell time and pressure drop for a given application.

A method for determining the positions of a number of fans (V.sub.n,m) for generating an air flow in a preferably enclosed space. The fans (V.sub.n,m) have an acceleration sensor to determine their position. The fans (V.sub.n,m) are arranged in rows (R.sub.1, R.sub.2, . . . , R.sub.n) and columns (S.sub.1, S.sub.2, . . . , S.sub.m). At least the position (i, j) of one fan (V.sub.i,j) is known.

The present invention achieves a decontamination effect with a proper amount of hydrogen peroxide mist supplied to a room to be decontaminated by further refining such hydrogen peroxide mist supplied to the room for dispersion/diffusion, and reducing the duration of operations such as aeration to increase efficiency of decontamination.

The decontamination system includes a mist generation means, a mist discharge port, and a mist dispersion/diffusion means. The mist generation means converts a decontamination liquid into a mist to generate a mist for decontamination. The mist discharge port is opened at an upper portion on an internal side wall surface of the room to discharge a such mist into the inside of the room. The mist dispersion/diffusion means generates sound flows by an ultrasound in the vertical direction from a plate surface of a vibration plate provided adjacent to a lower portion of the mist discharge port on the internal side wall surface of the room or adjacent to a lower portion on a side surface in a mist discharge direction. The mist is pressed by acoustic radiation pressure backward or laterally in intermittent operation or stronger/weaker operation of the system.

A wafer inspection apparatus according to one embodiment is a wafer inspection apparatus including a plurality of inspection parts arranged in a height direction and a lateral direction, and includes a pair of air circulating means disposed at both ends in a longitudinal direction of an air circulating region including the plurality of inspection parts arranged in the lateral direction and configured to circulate air in the circulating region.

A ceiling module for the construction of a clean room cell, where the ceiling module includes at least a module support for arrangement on and connection to a support structure, a technical device including at least one filter unit, and a ceiling support which is spaced apart from the module support such that a technical space is formed between the ceiling support and the module support, wherein the technical device is arranged inside the technical space.

A ceiling module for the construction of a clean room cell, where the ceiling module includes at least a module support for arrangement on and connection to a support structure, a technical device including at least one filter unit, and a ceiling support which is spaced apart from the module support such that a technical space is formed between the ceiling support and the module support, wherein the technical device is arranged inside the technical space.

The present disclosure relates to a multi-stage dehumidification system for local area dehumidification of dry room, the system including a main dehumidification part formed to have an inside space that is sealed from outside; a main dehumidifying device for controlling that the relative humidity of the inside of the main dehumidification part is smaller than the relative humidity of the outside of the main dehumidification part; at least one local area dehumidification part that is partitioned within the main dehumidification part, and that has an inside space that is sealed from the main dehumidification part; and a local area dehumidifying device for controlling that the relative humidity of the inside of the local area dehumidification part is smaller than the relative humidity of the inside of the main dehumidification part, wherein the local area dehumidification part includes an opening for entry and exit of objects; a moisture penetration prevention part that protrudes to outside from an edge of the opening; and a first air curtain part that forms a first blocking air flow from one side of an outer opening of the moisture penetration prevention part towards the other side.

A substrate processing system for an electronic device manufacturing system can include a factory interface forming an interior volume, and a partition disposed in the factory interface. The partition can divide the interior volume into a first factory interface chamber forming a second interior volume, and a second factory interface chamber forming a third interior volume. The partition can be configured to provide a first sealed environment in the first factory interface chamber and a second sealed environment in the second factory interface chamber.

A substrate processing system for an electronic device manufacturing system can include a factory interface forming an interior volume, and a partition disposed in the factory interface. The partition can divide the interior volume into a first factory interface chamber forming a second interior volume, and a second factory interface chamber forming a third interior volume. The partition can be configured to provide a first sealed environment in the first factory interface chamber and a second sealed environment in the second factory interface chamber.