Apparatus and techniques presented combine the features and benefits of amplitude modulated (AM) atomic force microscopy (AFM), sometimes called AC mode AFM, with frequency modulated (FM) AFM. In AM-FM imaging, the topographic feedback from the first resonant drive frequency operates in AM mode while the phase feedback from second resonant drive frequency operates in FM mode. In particular the first or second frequency may be used to measure the loss tangent, a dimensionless parameter which measures the ratio of energy dissipated to energy stored in a cycle of deformation.

The present document describes a device for measuring and/or modifying surface features and/or sub-surface features on or below a surface of a sample. The system comprises a sample carrier, one or more heads, and a support structure. The support structure comprises a reference surface for providing a positioning reference. The heads are separate from the sample carrier and the support structure, and the device further comprises a pick and place manipulator arranged for positioning the heads at respective working positions. The manipulator comprises a gripper and an actuator for moving the gripper, wherein the actuator is arranged for providing a motion in a direction transverse to the reference surface. The gripper is arranged for engaging and releasing the respective heads from the transverse motion. The document also describes a method of measuring and/or modifying surface features on a surface of a sample.

The present document describes a device for measuring and/or modifying surface features and/or sub-surface features on or below a surface of a sample. The system comprises a sample carrier, one or more heads, and a support structure. The support structure comprises a reference surface for providing a positioning reference. The heads are separate from the sample carrier and the support structure, and the device further comprises a pick and place manipulator arranged for positioning the heads at respective working positions. The manipulator comprises a gripper and an actuator for moving the gripper, wherein the actuator is arranged for providing a motion in a direction transverse to the reference surface. The gripper is arranged for engaging and releasing the respective heads from the transverse motion. The document also describes a method of measuring and/or modifying surface features on a surface of a sample.

A scanning probe microscope (SPM) system and associated method. The SPM system having a probe adapted to interact with nanoscale features of a sample and scan within a target region to produce a three-dimensional image of that target region, the system maintaining location information for a plurality of features of interest of the sample according to a sample-specific coordinate system, wherein the SPM system is configured to adjust positioning of the probe relative to the sample according to a SPM coordinate system, the SPM system further configured to manage a dynamic relationship between the sample-specific coordinate system and the SPM coordinate system by determining a set of alignment errors between the sample-specific coordinate system and the SPM coordinate system and apply corrections to the SPM coordinate system to offset the determined alignment errors.

A scanning probe microscope (SPM) system and associated method. The SPM system having a probe adapted to interact with nanoscale features of a sample and scan within a target region to produce a three-dimensional image of that target region, the system maintaining location information for a plurality of features of interest of the sample according to a sample-specific coordinate system, wherein the SPM system is configured to adjust positioning of the probe relative to the sample according to a SPM coordinate system, the SPM system further configured to manage a dynamic relationship between the sample-specific coordinate system and the SPM coordinate system by determining a set of alignment errors between the sample-specific coordinate system and the SPM coordinate system and apply corrections to the SPM coordinate system to offset the determined alignment errors.

An imaging device for an additive manufacturing system is provided. The additive manufacturing system includes a material. The imaging device includes a high resolution imaging bar including at least one detector array, and an imaging element positioned between the at least one detector array and the material. The high resolution imaging bar is displaced from the material along a first direction and extends along a second direction. The high resolution imaging bar is configured to generate an image of a build layer within the material.

An information acquiring method in an atomic force microscope includes, during causing the microscope to raster scan a cantilever and a sample relatively while causing a mechanical interaction between the sample and a probe provided at a free end of the cantilever, causing a first interaction having first strength between the probe and sample, acquiring first information on the sample when the first interaction is generated, causing a second interaction having second strength between the probe and sample, and acquiring second information on the sample when the second interaction is generated. The first strength and second strength are different. The causing the first interaction, the acquiring the first information, the causing the second interaction, and the acquiring the second information are performed in a same scanning region.

An information acquiring method in an atomic force microscope includes, during causing the microscope to raster scan a cantilever and a sample relatively while causing a mechanical interaction between the sample and a probe provided at a free end of the cantilever, causing a first interaction having first strength between the probe and sample, acquiring first information on the sample when the first interaction is generated, causing a second interaction having second strength between the probe and sample, and acquiring second information on the sample when the second interaction is generated. The first strength and second strength are different. The causing the first interaction, the acquiring the first information, the causing the second interaction, and the acquiring the second information are performed in a same scanning region.

A nano-positioning system for fine and coarse nano-positioning including at least one actuator, wherein the at least one actuator includes a high Curie temperature material and wherein the nano-positioning system is configured to apply a voltage to the at least one actuator to generate fine and/or coarse motion by the at least one actuator. The nano-positioning system being a stand-alone system, a scanning probe microscope, or an attachment to an existing microscope configured to perform a method of creepless nano-positioning that includes positioning a probe relative to a first area of a substrate using coarse stepping and interacting with the first area of the substrate using fine motion after less than 60 seconds of the positioning the probe. The movement of the scanning probe microscope is actuated by a high Curie temperature piezoelectric material that limits and/or eliminates creep, hysteresis and aging.

A nano-positioning system for fine and coarse nano-positioning including at least one actuator, wherein the at least one actuator includes a high Curie temperature material and wherein the nano-positioning system is configured to apply a voltage to the at least one actuator to generate fine and/or coarse motion by the at least one actuator. The nano-positioning system being a stand-alone system, a scanning probe microscope, or an attachment to an existing microscope configured to perform a method of creepless nano-positioning that includes positioning a probe relative to a first area of a substrate using coarse stepping and interacting with the first area of the substrate using fine motion after less than 60 seconds of the positioning the probe. The movement of the scanning probe microscope is actuated by a high Curie temperature piezoelectric material that limits and/or eliminates creep, hysteresis and aging.