Provided is a line beam forming device that can divide a laser beam into beam segments in a first direction (y-axis) perpendicular to the traveling direction (z-axis) of the laser beam, and arrange and emit the beam segments with regular intervals in a second direction (x-axis) perpendicular to the traveling direction of the laser beam, using a single mirror set composed of a plurality of mirrors. The line beam forming device of the present invention can be used for an excimer laser which is a multimode laser beam generator with high beam divergence, a high-power DPSS laser, or a laser diode, can obtain high-density energy by condensing beams, can obtain a beam profile having uniform intensity in both of a long axis and a short axis, and can combine a plurality of laser beams without being influenced by the properties of an incident beam.

According to an embodiment of the present invention, there is provided an aspherical mirror for focusing a laser beam in a linear pattern, the aspherical mirror including: a convex surface diffusely reflecting an irradiated laser beam; and a concave surface reflecting the laser beam such that the laser beam is focused at one point, wherein the laser beam reflected from the convex surface forms a long line beam as an angle of reflection with respect to a curvature of the convex surface changes, and the laser beam reflected from the concave surface is focused at one point on the line beam as an angle of reflection with respect to a curvature of the concave surface changes.

A laser irradiation method of irradiating, with a pulse laser beam, an irradiation object in which an impurity source film is formed on a semiconductor substrate includes: reading fluence per pulse of the pulse laser beam with which a rectangular irradiation region set on the irradiation object is irradiated and the number of irradiation pulses the irradiation region is irradiated, the fluence being equal to or larger than a threshold at or beyond which ablation potentially occurs to the impurity source film when the irradiation object is irradiated with pulses of the pulse laser beam in the irradiation pulse number and smaller than a threshold at or beyond which damage potentially occurs to the surface of the semiconductor substrate; calculating a scanning speed Vdx; and moving the irradiation object at the scanning speed Vdx relative to the irradiation region while irradiating the irradiation region with the pulse laser beam at the repetition frequency f.

A virtual image generation system comprises a planar optical waveguide having opposing first and second faces, an in-coupling (IC) element configured for optically coupling a collimated light beam from an image projection assembly into the planar optical waveguide as an in-coupled light beam, a first orthogonal pupil expansion (OPE) element associated with the first face of the planar optical waveguide for splitting the in-coupled light beam into a first set of orthogonal light beamlets, a second orthogonal pupil expansion (OPE) element associated with the second face of the planar optical waveguide for splitting the in-coupled light beam into a second set of orthogonal light beamlets, and an exit pupil expansion (EPE) element associated with the planar optical waveguide for splitting the first and second sets of orthogonal light beamlets into an array of out-coupled light beamlets that exit the planar optical waveguide.

A device for generating a laser line on a work plane includes a first laser light source configured to generate a first raw laser beam, a second laser light source configured to generate a second raw laser beam, and an optical arrangement configured to reshape the first raw laser beam to form a first illumination beam with a first caustic and a first beam profile, and reshape the second raw laser beam to form a second illumination beam with a second caustic and a second beam profile. The first illumination beam and the second illumination beam are directed with overlap on the work plane and define a joint illumination direction. The first beam profile and the second beam profile jointly form the laser line on the work plane. The optical arrangement is configured to position the first caustic and the second caustic offset from one another in the illumination direction.

A laser system (10) for generating a linear laser marking (38) on a projection surface (37), including: a laser beam source (11), which generates a laser beam (28) and emits it along a propagation direction (29), an offset device (16) having a first interface (21), at which a first deflection of the laser beam is effected, and a conical mirror (14), which is embodied as a right cone having a cone axis (15) and a reflective lateral surface (26), wherein the conical mirror (14) is arranged in the beam path of the laser beam downstream of the offset device (16). The offset device (16) is embodied as rotatable about an axis of rotation (17), wherein the axis of rotation is arranged coaxially with respect to the cone axis (15).

A transmission unit of a LIDAR device. The transmission unit includes at least one beam source for generating electromagnetic beams having a linear or rectangular cross section, and transmission optics. The transmission unit has an optical homogenizer which is arranged in a beam path of the generated beams in front of or behind the transmission optics and has at least one lens array. A LIDAR device is also described.

In the embodiments of the present disclosure, additive manufacturing devices and methods are provided. The additive manufacturing device includes a light source, a building device, and a light scattering member. The light source is configured to provide light to cure photocurable resins. The building device includes a resin tank configured to store the photocurable resins. The building device has a building surface on which the photocurable resins are cured. The light scattering member is arranged between the light source and the building surface. The light scattering member is configured to alter a light propagation direction of the light from the light source to cause an inner-pixel light intensity change on the building surface.

A lidar system includes one or more light sources configured to generate a first beam of light and a second beam of light, a scanner configured to scan the first and second beams of light across a field of regard of the lidar system, and a receiver configured to detect the first beam of light and the second beam of light scattered by one or more remote targets. The scanner includes a rotatable polygon mirror that includes multiple reflective surfaces angularly offset from one another along a periphery of the polygon mirror, the reflective surfaces configured to reflect the first and second beams of light to produce a series of scan lines as the polygon mirror rotates. The scanner also includes a pivotable scan mirror configured to (i) reflect the first and second beams of light and (ii) pivot to distribute the scan lines across the field of regard.

An apparatus includes a light source configured to produce light and a prism. The apparatus also includes freeform optics optically coupled between the light source and the prism, the freeform optics configured to direct the light towards the prism and eyepiece optics optically coupled to the prism. Additionally, the apparatus includes a spatial light modulator (SLM) optically coupled to the prism, the prism configured to direct the light towards the SLM, the SLM configured to modulate the light to produce modulated light, and the prism configured to direct the modulated light towards the eyepiece optics.