A device for suspending an x-ray grid has a first rotating frame which can be rotated about a first axis. The x-ray grid is disposed in or on the rotating frame. Two first flexible hinge elements are connected to the first rotating frame and are aligned along the first axis. The first rotating frame is reversibly rotatable about the first axis. An x-ray arrangement has one or more such suspension devices between an x-ray emitter and an x-ray detector. The articulated flexible elements of the novel device are completely play-free and significantly more cost-effective that separate hinges.

An apparatus for movably suspending an x-ray grid. The apparatus has a carrier module, in or on which the x-ray grid is arranged, and a linkage. The linkage is configured to rotate the carrier module about an axis which is vertical to the x-ray grid and/or to translate the carrier module in the plane of the x-ray grid. An x-ray arrangement has an x-ray emitter, an x-ray detector and one or more apparatus for suspending the x-ray grid between the emitter and detector. The apparatus provides for play-free kinematics which is more cost-effective than the use of known precision drives.

The present invention relates to calibration in X-ray phase contrast imaging. In order to remove the disturbance due to individual gain factors, a calibration filter grating (10) for a slit-scanning X-ray phase contrast imaging arrangement is provided that comprises a first plurality of filter segments (11) comprising a filter material (12) and a second plurality of opening segments (13). The filter segments and the opening segments are arranged alternating as a filter pattern (15). The filter material is made from a material with structural elements (14) comprising structural parameters in the micrometer region. The filter grating is movably arranged between an X-ray source grating (54) and an analyzer grating (60) of an interferometer unit in a slit-scanning system of a phase contrast imaging arrangement. The slit-scanning system is provided with a pre-collimator (55) comprising a plurality of bars (57) and slits (59). The filter pattern is aligned with the pre-collimator pattern (61).

The present invention relates to calibration in X-ray phase contrast imaging. In order to remove the disturbance due to individual gain factors, a calibration filter grating (10) for a slit-scanning X-ray phase contrast imaging arrangement is provided that comprises a first plurality of filter segments (11) comprising a filter material (12) and a second plurality of opening segments (13). The filter segments and the opening segments are arranged alternating as a filter pattern (15). The filter material is made from a material with structural elements (14) comprising structural parameters in the micrometer region. The filter grating is movably arranged between an X-ray source grating (54) and an analyzer grating (60) of an interferometer unit in a slit-scanning system of a phase contrast imaging arrangement. The slit-scanning system is provided with a pre-collimator (55) comprising a plurality of bars (57) and slits (59). The filter pattern is aligned with the pre-collimator pattern (61).

A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

The invention discloses an X-ray zoom lens system (Transfocator) and a focus variation method. The system is characterized in that it includes a main frame, many switched arms arranged on one side of the main frame, and a driving component set at the top of the main frame, and a positioning groove set at the bottom of the main frame; For them, each switched arm is composed of successively connected a push rod, a push-push ratchet mechanism, a preload spring and a guide stick, two-dimensional flexible axis, and a CRLs holder from top to bottom; CRLs are stacked and arranged in the mentioned above CRLs holder; The push-push ratchet mechanism contains that an extension spring, a slider with ratchet guide slot, a guide baseplate, a C-shaped tie rod, in which the slider with ratchet guide slot and the guide baseplate form a linear guide motion pair by a linear groove and a guide structure. The upper end of the slider with ratchet guide slot is connected to the upper end of the guide plate by the extension spring; The lower end of the slider with ratchet guide slot is successively connected with the preload spring and guide stick, the two-dimensional flexible axis, and the CRLs holder; The upper end of the C-shaped tie rod is used to slide in the ratchet guide slot of the slider with ratchet guide slot, and its lower end is connected with the bottom end of the guide baseplate by an elastic clamping.

An illumination optical unit for EUV projection lithography includes a field facet mirror and a pupil facet mirror. A correction control device, which is used for the controlled displacement of at least some field facets that are usable as correction field facets, which are signal connected to displacement actuators, is embodied so that a correction displacement path for the correction field facets is so large that a respective correction illumination channel is cut off at the margin by the correction pupil facet so that the illumination light partial beam is not transferred in the entirety thereof from the correction pupil facet into the object field.

An x-ray transmission spectrometer system to be used with a compact x-ray source to measure x-ray absorption with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness x-ray source, an optical system with a low pass spectral filter property to focus the x-rays through an object to be examined, and a spectrometer comprising a crystal analyzer (and, in some embodiments, a mosaic crystal) to disperse the transmitted beam, and in some instances an array detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 15 degrees, and be coupled to an optical system that collects and focuses the high flux x-rays to micron-scale spots, leading to high flux density. The x-ray optical system may also act as a “low-pass” filter, allowing a predetermined bandwidth of x-rays to be observed at one time while excluding the higher harmonics.

A method for producing an optical element includes: providing a substrate (102), applying a layer system (103), wherein an optically effective surface (101) is formed and wherein the layer system has a layer (104) that is thermally deformable for manipulating the geometric shape of the optically effective surface, and applying a temperature field to the optical element while at least regionally heating the thermally deformable layer to above a specified operating temperature of the optical system. The thermally deformable layer is configured such that a deformation that is induced when the temperature field is applied is at least partially maintained after the optical element has cooled. Also disclosed is an optical element (400) that has an optically effective surface (401), a substrate (402), and a layer system (403) that has a reflection layer system (406), which includes a shape-memory alloy.