For alignment of rotational shafts, two devices for attachment to circular faces of two shaft segments. Each of the two devices has a laser photoelectric device for ascertaining a dimension of displacement of the two shafts from a desired axis of rotation relative to each other. Each of the two devices having a base surface with two linear contact edges designed to engage with a circumferential surface of a shaft and to ensure alignment between the device and an axis of rotation of the shaft to within a tolerance compatible with alignment tolerances of the shaft. Each of the two linear contact edges includes at least two terminal end regions and a center region together defining a line contact at linear intersection of two surfaces meeting at a non-zero angle linear contact edges designed to affix and release from the shaft surface, and to ensure parallel alignment between the device and an axis of rotation of the shaft to a precision allowing measurements to within tolerances required by machinery driven by the shaft. The base surface of at least one of the devices has been modified from its commercially-delivered condition to provide raised rails designed to improve tactile feedback of to a user of the alignment between the base and an axis of rotation of the shaft, and has affixed thereto two rails designed to improve tactile feedback of to a user of the alignment between the base and an axis of rotation of the shaft. Each base has a magnet and a switch to vary magnetic flux for affixation and release from the shaft surface. Each device has brackets designed to securely and reproducibly position laser photoelectric devices relative to the base and axis of rotation of the shaft. The attaching includes a human placing at least one of the devices slightly askew relative to the axis of rotation of the shaft, and the human gently twisting the device to allow the liner contact edges to seat on the circumferential surface of the shaft, to provide tactile feedback to the human to confirm parallel alignment between the at least one device's laser photoelectronic device and the axis of rotation of the shaft.

The present invention is a new multipurpose speed square that is easily utilized by any workman who typically requires a means for measuring, aligning, leveling, etc. The speed square is multi-functional, of simple construction, lightweight and portable. The speed square can be easily carried as an all-in-one tool and thus eliminates the need for additional tools, or the like. The speed square that can be manufactured from substantially any suitable material of engineering choice, is cost effective to produce, manufacture, easily marketed and easily sold.

The present invention is a new multipurpose speed square that is easily utilized by any workman who typically requires a means for measuring, aligning, leveling, etc. The speed square is multi-functional, of simple construction, lightweight and portable. The speed square can be easily carried as an all-in-one tool and thus eliminates the need for additional tools, or the like. The speed square that can be manufactured from substantially any suitable material of engineering choice, is cost effective to produce, manufacture, easily marketed and easily sold.

A display system includes a first die configured to emit light of a first color, a second die configured to emit light of a second color and a third die configured to emit light of a third color. The display system also includes a lens system and an optical waveguide system. The optical waveguide system includes a first grating portion configured to couple in an incident light to the optical waveguide and a second grating portion configured to couple out a transmitting light from the optical waveguide. The first die, the second die and the third die are contained in one package. The lens system is arranged between the package and the optical waveguide system, and is configured to collimate the light of the first color, the light of the second color and the light of the third color onto the first grating portion of the optical waveguide system.

A display system includes a first die configured to emit light of a first color, a second die configured to emit light of a second color and a third die configured to emit light of a third color. The display system also includes a lens system and an optical waveguide system. The optical waveguide system includes a first grating portion configured to couple in an incident light to the optical waveguide and a second grating portion configured to couple out a transmitting light from the optical waveguide. The first die, the second die and the third die are contained in one package. The lens system is arranged between the package and the optical waveguide system, and is configured to collimate the light of the first color, the light of the second color and the light of the third color onto the first grating portion of the optical waveguide system.

A device and method for aligning a robot coordinate system, being a coordinate system of a robot for moving an operating point three-dimensionally, and a measuring instrument coordinate system, being a coordinate system of a three-dimensional measuring instrument which is capable of executing a light sectioning method and of which a position and attitude with respect to the operating point are unchanging, characterized by including the steps of: determining a relationship between the coordinate systems; radiating sheet-like slit light from the three-dimensional measuring instrument onto a reference object in the shape of a rectangular cuboid which is fixed; finding the attitude of the three-dimensional measuring instrument relative to the reference object; and moving the three-dimensional measuring instrument such that the attitude of the three-dimensional measuring instrument falls within a predetermined standard attitude range.

The present invention relates to a monitor wafer measuring method and measuring apparatus. The monitor wafer measuring method comprises the following steps: fixing a product wafer, the product wafer having several alignment marks and product measuring sites corresponding respectively to the alignment marks; determining the product measuring sites according to the alignment marks; and placing a monitor wafer, a projection of the monitor wafer in a vertical direction being aligned with and coinciding with the product wafer. The present application can reduce or even eliminate positional errors of the monitor wafer during a measurement process, such that product-level measuring position accuracy can be achieved for the monitor wafer and further, the measuring machine itself and process changes can be monitored in a better way.

The present invention relates to a monitor wafer measuring method and measuring apparatus. The monitor wafer measuring method comprises the following steps: fixing a product wafer, the product wafer having several alignment marks and product measuring sites corresponding respectively to the alignment marks; determining the product measuring sites according to the alignment marks; and placing a monitor wafer, a projection of the monitor wafer in a vertical direction being aligned with and coinciding with the product wafer. The present application can reduce or even eliminate positional errors of the monitor wafer during a measurement process, such that product-level measuring position accuracy can be achieved for the monitor wafer and further, the measuring machine itself and process changes can be monitored in a better way.

Examples disclosed herein are directed to a method and apparatus for determining a position of a ring within a process kit. In one example, a sensor assembly for a substrate processing chamber is provided. The sensor assembly includes a housing having a top surface, a bottom surface opposite the top surface, and a plurality of sidewalls connecting the top surface to the bottom surface. The housing also has a recess in the top surface, the recess forming an interior volume within the housing. The sensory assembly includes a bias member, and a contact member disposed on the bias member. The bias member and contact member are disposed within the recess. A sensor is configured to detect a displacement of the contact member. The displacement of the contact member corresponds to a relative position of an edge ring.

An overlay metrology tool may include an illumination source to generate a first illumination beam distribution with a first linear polarization and a second illumination beam distribution with a second linear polarization orthogonal to the first linear polarization, an illumination sub-system to sequentially illuminate two or more cell pairs of an overlay target on a sample having orthogonally oriented grating-over-grating structures, a collection sub-system with two collection channels to capture collected light from an illuminated cell pair and filtering optics to direct light from different cells in an illuminated cell pair to different collection channels for detection. The tool may further include a controller to generate separate overlay measurements for orthogonally-oriented grating-over-grating structures in the two or more cell pairs.