A device for measuring an angular inclination and angular inclination fluctuations of an electromagnetic radiation beam is adapted to detect the incidence angular inclination and the relative fluctuations with respect to a nominal axis of propagation of the beam, in a desired detection plane including the nominal propagation axis. A system and a method for measuring an angular inclination and angular inclination fluctuations of an electromagnetic radiation beam uses the device for measuring an angular inclination and angular inclination fluctuations of an electromagnetic radiation beam. A method measures a spatial shift of a focused laser beam, at the focusing point, with respect to a reference optical axis.

A device for measuring an angular inclination and angular inclination fluctuations of an electromagnetic radiation beam is adapted to detect the incidence angular inclination and the relative fluctuations with respect to a nominal axis of propagation of the beam, in a desired detection plane including the nominal propagation axis. A system and a method for measuring an angular inclination and angular inclination fluctuations of an electromagnetic radiation beam uses the device for measuring an angular inclination and angular inclination fluctuations of an electromagnetic radiation beam. A method measures a spatial shift of a focused laser beam, at the focusing point, with respect to a reference optical axis.

A method of polishing a target surface of a waveguide to achieve perpendicularity relative to a reference surface is disclosed. The method includes i) providing a polishing apparatus having a polishing plate with a flat surface defining a reference plane, and an adjustable mounting apparatus configured to hold the waveguide during polishing at a plurality of angular orientations; ii) positioning an optical alignment sensor and a light reflecting apparatus such that a first collimated light beam is reflected off of a surface parallel to the reference plane, and a second perpendicular collimated light beam is reflected off of the reference surface; iii) aligning the waveguide within the polishing apparatus such that the reflections received by the optical alignment sensor align within the optical alignment sensor, thereby being indicative of perpendicularity between the reference plane and the reference surface; and iv) polishing the target surface of the aligned waveguide.

A method of polishing a target surface of a waveguide to achieve perpendicularity relative to a reference surface is disclosed. The method includes i) providing a polishing apparatus having a polishing plate with a flat surface defining a reference plane, and an adjustable mounting apparatus configured to hold the waveguide during polishing at a plurality of angular orientations; ii) positioning an optical alignment sensor and a light reflecting apparatus such that a first collimated light beam is reflected off of a surface parallel to the reference plane, and a second perpendicular collimated light beam is reflected off of the reference surface; iii) aligning the waveguide within the polishing apparatus such that the reflections received by the optical alignment sensor align within the optical alignment sensor, thereby being indicative of perpendicularity between the reference plane and the reference surface; and iv) polishing the target surface of the aligned waveguide.

A metrology system may include an imaging sub-system to image a metrology target buried in a sample, where the sample is formed from bonded first and second substrates with a metrology target at the interface. The metrology system may further include an illumination sub-system with an illumination field stop and an illumination pupil, where the illumination field stop includes an aperture to provide that a projected size of the field-stop aperture on a measurement plane corresponding to the metrology target matches a field of view of the detector at the measurement plane, and where the illumination pupil includes a central obscuration to provide oblique illumination of the metrology target with angles greater than a cutoff angle selected to prevent illumination from the illumination source from reflecting off of the bottom surface of the sample and through the field of view of the detector at the measurement plane.

An inspection apparatus includes a light source unit, cameras, a keyboard, and a controller that determines a wavelength of the excitation light, based on the information on the emission color received by the keyboard, and that controls the light source unit so that the light source unit generates excitation light with the determined wavelength. The controller determines a wavelength longer than an absorption edge wavelength of the substrate of the sample and shorter than a peak wavelength of an emission spectrum of the light-emitting element, the peak wavelength being specified from the information on the emission color, to be the wavelength of the excitation light.

An apparatus including a focused light beam receptor apparatus configured to be positioned proximate a first end of a vehicle, a focused light beam generator; and wherein the focused light beam receptor apparatus includes a focused light beam receiving surface for receiving a focused light beam from the focused light beam generator to provide alignment of the focused light beam receptor relative to a centerline of the vehicle. A method of aligning a focused light beam receptor, focused light beam generator and a movable alignment stand relative to a centerline of a vehicle is also provided.

A laser alignment system for adjusting a mounting bracket of a lamp is disclosed. The laser alignment system includes an alignment bracket including a body portion defining one or more target features and a plurality of index features. The one or more target features include a target that is configured to align with a laser beam and the plurality of index features that are configured to position the alignment bracket along a surface. The laser alignment system also includes a laser alignment tool including a base, a mount, and a laser device. The mount holds the laser device in place and the laser device is configured to emit the laser beam, and the base of the laser alignment tool is shaped to fit within the mounting bracket for the lamp and the laser device directs the laser beam towards a corresponding one of target features of the alignment bracket.

A laser alignment system for adjusting a mounting bracket of a lamp is disclosed. The laser alignment system includes an alignment bracket including a body portion defining one or more target features and a plurality of index features. The one or more target features include a target that is configured to align with a laser beam and the plurality of index features that are configured to position the alignment bracket along a surface. The laser alignment system also includes a laser alignment tool including a base, a mount, and a laser device. The mount holds the laser device in place and the laser device is configured to emit the laser beam, and the base of the laser alignment tool is shaped to fit within the mounting bracket for the lamp and the laser device directs the laser beam towards a corresponding one of target features of the alignment bracket.

A method for quantifying sensitivity of metrology to process variation including performing metrology, by a metrology tool, on at least one metrology target located at at least one site on a semiconductor wafer, thereby generating a metrology landscape, and calculating a sensitivity metric directly based on the metrology landscape, the sensitivity metric quantifying a sensitivity of the metrology landscape to process variation involved in manufacture of the semiconductor wafer.