A method of examining a substrate is provided. The method may include: generating a temperature gradient along a surface of the substrate; detecting a heat radiation emitted from the substrate; and determining as to whether the substrate is damaged based on the detected heat radiation.

A method and a device for the thermal analysis of a sample, as well as a method and a device for the calibration of a temperature measuring device used in a device for the thermal analysis.

A sample holder for magnetic nanoparticle samples including a plurality of sample wells for holding a magnetic nanoparticle sample, which are distributed on a top surface of the sample holder. The sample wells are distributed such that a first distance between neighboring samples wells and/or a second distance between each peripheral sample well and a respective edge of the top surface of the sample holder and/or a third distance between a deepest point of the sample wells and a bottom of the sample holder is between 1 and 100 times greater than a thermal diffusion length of the sample holder material. The sample holder is used in a lock-in thermography system.

According to one embodiment, a semiconductor chip inspection device includes a conveyor, an image capture device, and an analysis system. The conveyor provides a transfer path on which a semiconductor chip heated during a manufacturing process is moved. The image capture device is disposed above the transfer path and is configured to generate a thermographic image by imaging the semiconductor chip including capturing a plurality of thermographic images at different focal points in a thickness direction of the semiconductor chip. The analysis system is configured to compare the plurality of thermographic images with a plurality of standard images provided in advance, and to detect a region in which a temperature differential between a thermographic image and a respective standard image exceeds a reference value.

Embodiments described herein include integrated systems used to directly monitor a substrate temperature during a plasma enhanced deposition process and methods related thereto. In one embodiment, a substrate support assembly includes a support shaft, a substrate support disposed on the support shaft, and a substrate temperature monitoring system for measuring a temperature of a substrate to be disposed on the substrate support. The substrate temperature monitoring system includes a optical fiber tube, a light guide coupled to the optical fiber tube, and a cooling assembly disposed about a junction of the optical fiber tube and the light guide. Herein, at least a portion of the light guide is disposed in an opening extending through the support shaft and into the substrate support and the cooling assembly maintains the optical fiber tube at a temperature of less than about 100 C. during substrate processing.

Apparatus (2) includes a platform (14) on which is supported, via spaced apart posts (16), a stationary rigid support disc (17). Between the platform (14) and disc (17), plaque holder (18) is rotatably mounted. The plaque holder is arranged to hold a plaque (19) for assessment. The plaque is made by injection molding from a composition comprising a polymeric material and a specific amount of reheat additive(s) and any other additives(s) to be assessed. The plaque holder is arranged to move the plaque relative to the disc (17). In an input position, the plaque holder (18) is arranged directly underneath opening (20). In a measurement position, which is 90 from the input position, there are provided first and second temperature measuring assemblies (24, 26) arranged to measure the temperature of the top and bottom surfaces of a plaque held in the plaque holder. The plaque holder can be rotated through 90 from the measurement position to a heating position, wherein the plaque is positioned directly below a heat lamp. In use, the plaque holder is rotated to the heating position, wherein the plaque is heated by the lamp for a predetermined time. Then the plaque holder is rapidly rotated back to the measurement position, wherein the temperatures of the upper and lower surfaces of the plaque are rapidly measured. These steps are repeated and data recorded to allow reheat and/or other characteristics of the plaque to be assessed over time.

We disclose a chemical sensing device for detecting a fluid. The sensing device comprises: at least one substrate region comprising at least one etched portion; a dielectric region formed on the at least one substrate region, the dielectric region comprising at least one dielectric membrane region adjacent to the at least one etched portion; an optical source for emitting an infra-red (IR) signal; an optical detector for detecting the IR signal emitted from the optical source; one or more further substrates formed on or under the dielectric region, said one or more further substrates defining an optical path for the IR signal to propagate from the optical source to the optical detector. At least one of the optical source and optical detector is formed in or on the dielectric membrane region.

A method and a device for the thermal analysis of a sample, as well as a method and a device for the calibration of a temperature measuring device used in a device for the thermal analysis.

An apparatus for on-line temperature measurement and gas sampling used in the chute area of CDQ coke oven. The oven external unit includes a temperature indicator, a gas tube, a vacuum tank, and the oven internal unit includes a temperature measuring element, a temperature indicator. The temperature measuring element pass through the oven shell and oven along the oven radical, is located in the upper channel of the high-temperature ceramic tube with double-channel, one end of the high-temperature ceramic tube with double-channel is connected with the gas tube of the vacuum tank. The apparatus solves the problem that hard to measure the temperature and sample the gas of the part where the environment is the most complicated in CDQ coke oven, and has the advantages that the structure is simple, operation is easy to handle and can achieve real-time monitoring for the inner environment of the CDQ coke oven.

A method of examining a substrate is provided. The method may include: generating a temperature gradient along a surface of the substrate; detecting a heat radiation emitted from the substrate; and determining as to whether the substrate is damaged based on the detected heat radiation.