G01N33/204

Scanning electron microscope

A scanning electron microscope includes a spin detector configured to measure secondary electron spin polarization of secondary electrons emitted from the sample, and an analysis device configured to analyze secondary electron spin polarization data measured by the spin detector. The analysis device evaluates the strain in the sample by calculating a difference in the secondary electron spin polarization data of adjacent pixels.

Surface property inspection method, surface property inspection apparatus, and surface property inspection system
11442033 · 2022-09-13 · ·

A surface property evaluation method includes a measurement step for acquiring the distribution of impedance in the depth direction of a test piece, and an evaluation step for evaluating the surface treatment state in the depth direction and wherein the evaluation step includes: a step for creating a reference measurement value group by preparing untreated sample, good sample, and sample to be evaluated, and calculating an impedance ratio γ1 at each frequency for the untreated sample and good sample impedances; a step for creating an evaluation measurement value group by calculating an impedance ratio γ2 for the impedances of untreated sample at each frequency relative to the sample to be evaluated impedances; and a step for evaluating the surface treatment state of a sample to be evaluated by comparing a reference measurement value group with the evaluation measurement value group.

Surface property inspection method, surface property inspection apparatus, and surface property inspection system
11442033 · 2022-09-13 · ·

A surface property evaluation method includes a measurement step for acquiring the distribution of impedance in the depth direction of a test piece, and an evaluation step for evaluating the surface treatment state in the depth direction and wherein the evaluation step includes: a step for creating a reference measurement value group by preparing untreated sample, good sample, and sample to be evaluated, and calculating an impedance ratio γ1 at each frequency for the untreated sample and good sample impedances; a step for creating an evaluation measurement value group by calculating an impedance ratio γ2 for the impedances of untreated sample at each frequency relative to the sample to be evaluated impedances; and a step for evaluating the surface treatment state of a sample to be evaluated by comparing a reference measurement value group with the evaluation measurement value group.

DEVICE AND METHOD FOR THE CONTACTLESS DETERMINATION OF AT LEAST ONE PROPERTY OF A METAL PRODUCT

A device for the contactless determination of at least one property of a metal product during the metallurgical production of the metal product comprises a housing and at least one measuring device comprising a transmitting unit and a receiving unit. An electromagnetic field is generated by the transmitting unit and directed onto the metal product, thereby inducing a physical interaction in the material of the metal product, and a remaining and/or resulting part of this physical interaction is subsequently received by the receiving unit. At least one component of the measuring device comprising the transmitting unit and/or the receiving unit can be moved relative to the housing or the metal product moving therein, in order to thereby set or selectively change a predetermined distance to the metal product for the transmitting unit and/or the receiving unit.

DEVICE AND METHOD FOR THE CONTACTLESS DETERMINATION OF AT LEAST ONE PROPERTY OF A METAL PRODUCT

A device for the contactless determination of at least one property of a metal product during the metallurgical production of the metal product comprises a housing and at least one measuring device comprising a transmitting unit and a receiving unit. An electromagnetic field is generated by the transmitting unit and directed onto the metal product, thereby inducing a physical interaction in the material of the metal product, and a remaining and/or resulting part of this physical interaction is subsequently received by the receiving unit. At least one component of the measuring device comprising the transmitting unit and/or the receiving unit can be moved relative to the housing or the metal product moving therein, in order to thereby set or selectively change a predetermined distance to the metal product for the transmitting unit and/or the receiving unit.

SCANNING ELECTRON MICROSCOPE
20220246393 · 2022-08-04 ·

A scanning electron microscope includes a spin detector configured to measure secondary electron spin polarization of secondary electrons emitted from the sample, and an analysis device configured to analyze secondary electron spin polarization data measured by the spin detector. The analysis device evaluates the strain in the sample by calculating a difference in the secondary electron spin polarization data of adjacent pixels.

METHOD FOR STATISTICAL DISTRIBUTION CHARACTERIZATION OF DENDRITIC STRUCTURES IN ORIGINAL POSITION OF SINGLE CRYSTAL SUPERALLOY

The present application relates to a method for statistical distribution characterization of dendritic structures in original position of single crystal superalloy, and relates to the technical field of analysis of metal material composition and microstructure, comprising the following steps: step 1, processing a to-be-tested sample and determining a calibration coefficient; step 2, obtaining a two-dimensional element content distribution map of the to-be-tested sample; and step 3, determining the number and average spacing of primary dendrites. A composition distribution region analyzed in the present application is larger than the area of a distribution region of the traditional microscopic analysis method, and the sample preparation is simple. The distribution, number and average spacing of the primary dendrites can be obtained without metallographic corrosion sampling. Therefore, the present invention has the advantages of large statistical field of view, high efficiency and complete information, and the statistical data is more accurate and reliable.

METHOD FOR STATISTICAL DISTRIBUTION CHARACTERIZATION OF DENDRITIC STRUCTURES IN ORIGINAL POSITION OF SINGLE CRYSTAL SUPERALLOY

The present application relates to a method for statistical distribution characterization of dendritic structures in original position of single crystal superalloy, and relates to the technical field of analysis of metal material composition and microstructure, comprising the following steps: step 1, processing a to-be-tested sample and determining a calibration coefficient; step 2, obtaining a two-dimensional element content distribution map of the to-be-tested sample; and step 3, determining the number and average spacing of primary dendrites. A composition distribution region analyzed in the present application is larger than the area of a distribution region of the traditional microscopic analysis method, and the sample preparation is simple. The distribution, number and average spacing of the primary dendrites can be obtained without metallographic corrosion sampling. Therefore, the present invention has the advantages of large statistical field of view, high efficiency and complete information, and the statistical data is more accurate and reliable.

SYSTEM AND METHOD OF MEASURING GRAIN ORIENTATIONS

A system and a method of measuring grain orientations of a metal component. The method includes defining a series of measurement locations on the metal component at which to take a series of measurements indicative of grain orientations at corresponding measurement locations. The method further includes defining a nominal grain orientation at each measurement location. The method further includes loading the measurement locations into a computer-controllable fixture suitable for positioning the metal component. The method further includes locating the metal component in the computer-controllable fixture. The method further includes taking the series of measurements at the series of measurement locations. The method further includes analysing the measurement at each measurement location relative to the nominal grain orientation at the corresponding measurement location.

DETECTING STRESS-STRAIN IN METAL COMPONENTS

A system for detecting and quantifying changes in the stress-strain state of a ferrous structure includes an exciter coil system is positioned to generate an AC magnetic field that couples into the ferrous structure. A detector apparatus is positioned relative to the excited to detect an eddy current magnetic field resulting from the AC magnetic field generated by the exciter coil system. An analyzer compares the eddy current magnetic field parameters detected by the detector apparatus with the direct AC magnetic field transmitted by the exciter coil system and correlates changes in the parameters of the eddy current magnetic field with the stress-strain on the ferrous structure.