The present exemplary embodiments provide an optical array which reduces the collision of the birds by means of a recognizable optical structure in a situation in which flying birds quickly approaches in various directions and ensures 80% or higher of transparency of a device surface and a manufacturing method thereof.

An optical diffraction component has a periodic grating structure profile. The diffraction structure levels are arranged so that a wavelength range around two different target wavelengths diffracted by the grating structure profile has radiation components with three different phases that interfere destructively with one another. Diffraction structure levels predefine a topography of a grating period of the grating structure profile that is repeated regularly along a period running direction. These include a neutral diffraction structure level, a positive diffraction structure level raised relative thereto, and a negative diffraction structure level lowered relative thereto. The neutral diffraction structure level has an extent along the period running direction which is less than 50% of the extent of the grating period. A difference between the two target wavelengths is less than 50%. The result is an optical diffraction component whose possibilities for use can be extended, for example, to stray light suppression.

A transmissive diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises an absorbing layer. The diffraction grating is for use with radiation having a first wavelength (for example (EUV radiation). The absorbing layer is provided with a two-dimensional array of through-apertures. The absorbing layer is formed from a material which has a refractive index for the radiation having the first wavelength in the range 0.% to 1.04.

The invention relates to a method of manufacturing a structured grating, a corresponding structured grating component (1) and an imaging system. The method comprising the steps of: providing (110, 120, 130) a catalyst (30) on a substrate (20), the catalyst (20) having a grating pattern; growing (140) nanostructures (50) on the catalyst (30) so as to form walls (52) and trenches (54) based on the grating pattern; and filling (160) the trenches (54) between the walls (52) of nanostructures (50) using an X-ray absorbing material (70). The invention provides an improved method for manufacturing a structured grating and such structured grating component (1), which is particularly suitable for dark-field X-ray imaging or phase-contrast imaging.

A diffractive optical element includes a substrate, a first resin layer formed on the substrate and having a diffraction grating shape including a plurality of wall surfaces and a plurality of slopes, a second resin layer formed in close contact with the first resin layer, a high refractive-index portion formed on the plurality of wall surfaces of the first resin layer and having a higher refractive index than the first and the second resin layers, and a close contact portion discontinuous with the high refractive-index portion, wherein the close contact portion is formed on the plurality of slopes of the first resin layer, and wherein a thickness of the close contact portion is smaller than a height of the plurality of wall surfaces.

Disclosed is a wavefront sensor for measuring a tilt of a wavefront at an array of locations across a beam of radiation, wherein said wavefront sensor comprises a film, for example of Zirconium, having an indent array comprising an indent at each of said array of locations, such that each indent of the indent array is operable to perform focusing of said radiation. Also disclosed is a radiation source and inspection apparatus comprising such a wavefront sensor.

A method for forming a multi-layered, stacked grid structure includes aligning a first grid structure with a second grid structure, wherein both the first grid structure and the second grid structure each include a substrate in which a plurality of trenches are formed and a cured carrier fluid disposed within the plurality of trenches, and wherein a plurality of nano-particles are suspended within the cured carrier fluid. The method also includes, upon aligning the first grid structure and the second grid structure so that their respective plurality of trenches are aligned in the same orientation, joining the first grid structure and the second grid structure together to form the multi-layered, stacked grid structure.

Elements of photonic devices with high aspect ratio patterns are fabricated. A stabilizing catalyst that forms a stable metal-semiconductor alloy allows to etch a substrate in vertical direction even at very low oxidant concentration without external bias or magnetic field. A metal layer on the substrate reacts with the oxidant contained in air and catalyzes the semiconductor etching by the etchant. Air in continuous flow at the metal layer allows to maintain constant the oxidant concentration in proximity of the metal layer. The process can continue for a long time in order to form very high aspect ratio structures in the order of 10,000:1. Once the etched semiconductor structure is formed, the continuous air flow supports the reactant species diffusing through the etched semiconductor structure to maintain a uniform etching rate. The continuous air flow supports the diffusion of reaction by-products to avoid poisoning of the etching reaction.

An embodiment of a display device includes a substrate, a first light-emitting element, and a light control layer. The substrate includes a display area and a peripheral area adjacent to the display area, and the display area includes a light-emitting area and a light-blocking area. The first light-emitting element is disposed in the light-emitting area on the substrate and emits a first light having a first wavelength range. The light control layer is disposed on the first light-emitting element, and defines an opening exposing a portion of the light-emitting area. The light control layer includes a photochromic material such that in operation a second light having a second wavelength range different from the first wavelength range applied to the light control layer discolors the light control layer.

Disclosed is a wavefront sensor for measuring a tilt of a wavefront at an array of locations across a beam of radiation, wherein said wavefront sensor comprises a film, for example of Zirconium, having an indent array comprising an indent at each of said array of locations, such that each indent of the indent array is operable to perform focusing of said radiation. Also disclosed is a radiation source and inspection apparatus comprising such a wavefront sensor.