A curable resin composition for a lens, including a coloring agent A having a maximal absorption at a wavelength of 520 to 620 nm, in which a wavelength dispersion WD of a cured product of the composition, which is calculated by the following expression (X), is 2.0×10.sup.−5 or more; a cured product formed of the curable resin composition for a lens; a diffractive optical element; and a multilayer diffractive optical element.

WD=(nC−n(1129))/(1129−656)  Expression (X)

In the expression, nC represents a refractive index at a wavelength of 656 nm and n(1129) represents a refractive index at a wavelength of 1129 nm.

Various embodiments of the present invention provide for systems and apparatus directed toward using a contact lens and deflection optics to process display information and non-display information. In one embodiment of the invention, a display panel assembly is provided, comprising: a transparent substrate that permits light to pass through substantially undistorted; a reflector disposed on the transparent substrate; and a display panel aimed toward the reflector and substantially away from a human visual system, wherein the reflector reflects light emitted from the display panel toward the human visual system. The reflector may comprise a narrow band reflector or a polarization reflector.

Provided is a fixing device for a diffraction element including an element installation portion where a diffraction element is installed, and an element fixing portion that fixes the diffraction element installed on the element installation portion, wherein the element installation portion includes an element installation surface for curving the installed diffraction element in a discretionary shape, and the element installation surface is formed in an arch-like shape such that deformation of the diffraction element due to pressure of a cooling fluid is reduced.

An EUV lighting device for metrology and inspection of an EUV mask in an EUV exposure process of a semiconductor device manufacturing process includes: an EUV light source for outputting EUV light with a wavelength ranging from 5 nm to 15 nm; and a multilayer reflection zone plate having an EUV reflection multilayer film, which is a planar substrate, and a zone plate pattern. The EUV lighting device radiates EUV light output from the EUV light source to the multilayer reflection zone plate, acquires 1.sup.st diffraction light reflected, and creates EUV illumination light.

Various embodiments and configurations of optical imaging systems are described herein that utilize a metalens for narrowband deflection of target frequencies. For example, one embodiment of a multifrequency metalens includes an in-plane spatially multiplexed array of frequency-specific nanopillars or frequency-specific rows/columns of nanopillars that are intermingled with one another. In other embodiments, transmissive metalenses and/or reflective metalenses are tuned to focus color-separated visible light into red, green, and blue (RGB) channels of a digital image sensor.

A system may comprise a selectively transparent projection device for projecting an image toward an eye of a viewer from a projection device position in space relative to the eye of the viewer, the projection device being capable of assuming a substantially transparent state when no image is projected; an occlusion mask device coupled to the projection device and configured to selectively block light traveling toward the eye from one or more positions opposite of the projection device from the eye of the viewer in an occluding pattern correlated with the image projected by the projection device; and a zone plate diffraction patterning device interposed between the eye of the viewer and the projection device and configured to cause light from the projection device to pass through a diffraction pattern having a selectable geometry as it travels to the eye.

An imaging sensor assembly to reduce flare and ghost effects and enhance sharpness in a head-mounted device (HMD) is provided. The imaging sensor assembly may include a diffractive optical element (DOE). The imaging sensor assembly may also include a sensor substrate under the diffractive optical element (DOE). In some examples, the sensor substrate may include a plurality of color filters, and a plurality of photodiodes to detect optical illumination that passes through the diffractive optical element (DOE) to create one or more images.

The present disclosure relates to an optoelectronic device for manipulating electromagnetic radiation. Drawbacks of conventional systems like material constraints, system complexity and tuning speed are overcome by the optoelectronic device comprising a substrate with at least one tuning structure arranged on the substrate, wherein the tuning structure comprises an electro-optical material. The tuning structure comprises a first and a second electrical contact. A cover layer covers the at least one tuning structure. An optical structure is arranged on the cover layer. A voltage source is electrically connected to the first and the second electrical contact and provided for generating electric fields within the at least one tuning structure.

A varifocal lens is provided. A varifocal lens includes: a transparent substrate having a plate shape; a first lens layer stacked on a first area formed on one surface of the transparent substrate; a second lens layer stacked on a second area which is spaced apart from the first area and formed on the one surface of the transparent substrate; and a power supply connected to the first lens layer and the second lens layer to, based on the second lens layer, apply a first voltage to the first lens layer. The power supply may adjust the first voltage and change a refractive index of light, which is incident on the other surface of the transparent substrate and transmitted toward the one surface of the transparent substrate, to adjust a focal length.

An optical element including a first optical layer, a second optical layer, and a transparent base material, the first optical layer being disposed between the second optical layer and the transparent base material and a diffraction grating being disposed at the interface between the first optical layer and the second optical layer, wherein the refractive index of the d-line of the second optical layer is higher than the refractive index of the d-line of the first optical layer, the Abbe number of the second optical layer is higher than the Abbe number of the first optical layer, the first optical layer is composed of a first resin and inorganic particles dispersed in the first optical layer, and the second optical layer is composed of a second resin having a modulus of elasticity of 0.1 GPa or more and 3.0 GPa or less at 22° C. or higher and 24° C. or lower.