Provided are meta illuminators. The meta illuminators according to embodiments include a first light emitter configured to emit pattern light, and a second light emitter configured to emit non-patterned light, wherein the first and second light emitters forms a single body. The first and second light emitters respectively include meta-surfaces that are different from each other, and the different meta-surfaces may be formed on a single material layer. The first light emitter includes a pattern region that transmits a portion of incident light, and the second light emitter does not include the pattern region. A mask may be arranged between the light source and the transparent substrate.

There are provided a lens having excellent mechanical strength, as well as an optical component employing the lens. The lens is a lens having a circular shape when viewed in a plan view, the lens having a thickness of not less than 1 mm and not more than 11 mm at a lens center, the lens having a lens diameter of not less than 2 mm and not more than 50 mm, the lens having a curvature of not less than −0.5 mm.sup.−1 and not more than 0.5 mm.sup.−1 at the lens center.

A shielding object identifying unit identifies a partial point cloud representing a shielding object existing in a Fresnel zone on a basis of point cloud data indicating a position of the shielding object in the Fresnel zone between two wireless stations. A criterion decision unit decides an evaluation criterion of propagation loss by the shielding object on a basis of distribution of the partial point cloud. A determination unit makes determination related to communication between the two wireless stations on a basis of the evaluation criterion.

Slanted surface relief gratings for use in an optical display system in an HMD device are replicated in a manufacturing process that utilizes non-contact optical proximity recording into a specialized photo-sensitive resin that is disposed over a waveguide substrate. The recording process comprises selective resin exposure to ultraviolet light through a mask to spatially record grating structures by interferential exposure and polymerization. Subsequent resin development evacuates unexposed resin down to the waveguide substrate to remove flat surfaces, referred to as a bias layer, that remain in the grating trenches after exposure. The resin development reduces Fresnel reflections that could otherwise be induced at the media interface between the bias layer and the waveguide substrate. Fresnel reflections may cause a loss of diffraction efficiency and thereby reduce the field of view that may be guided by the SRGs in the optical display system.

An interframe difference processor 206 generates a difference image between frames of a sensor image, and an image processor 208 generates distance information indicating a distance to a photographic subject on the basis of calculation of a difference image and a developing pattern 1101. Thus, since a video display apparatus 101 generates the difference image between the frames of the sensor image, it is possible to realize a distance measuring apparatus capable of reducing an influence of a background and generating distance information with high accuracy.

A head mounted display system can include a camera, at least one waveguide, at least one coupling optical element that is configured such that light is coupled into said waveguide and guided therein, and at least one out-coupling element. The at least one out-coupling element can be configured to couple light that is guided within said waveguide out of said waveguide and direct said light to said camera. The at least one coupling element may comprise a diffractive optical element having optical power.

An EUV lighting device for metrology and inspection of an EUV mask in an EUV exposure process of a semiconductor device manufacturing process includes: an EUV light source for outputting EUV light with a wavelength ranging from 5 nm to 15 nm; and a multilayer reflection zone plate having an EUV reflection multilayer film, which is a planar substrate, and a zone plate pattern. The EUV lighting device radiates EUV light output from the EUV light source to the multilayer reflection zone plate, acquires 1.sup.st diffraction light reflected, and creates EUV illumination light.

A multifocal IOL including at least one diffractive surface including a plurality of discrete, adjacent, diffractive, concentric rings, having a radial phase profile cross-section with a near-symmetrical diffractive surface topography, and an odd number, greater than three, of diffractive orders and an asymmetrical distribution of energy flux over the diffractive orders.

An optical apparatus includes an active optical element including an active material encased between a first substrate and a second substrate. Means for selectively controlling the active material in a central portion and a plurality of sectors of the active optical element is employed. The central portion and the plurality of sectors are arranged around an optical axis of the active optical element, wherein the plurality of sectors surround the central portion. A processor of the optical apparatus is configured to generate a drive signal to drive said means to selectively control the active material in at least one of: the central portion, at least one of the plurality of sectors to produce a given optical power thereat.

An optical element, e.g. based on a diffractive Fresnel lens, having suppressed or reduced chromatic aberration under non-monochromatic light and/or enhanced directional homogenisation in its angular irradiation characteristics, comprises a plurality of optical zones (10, 20), wherein each zone comprises at least one homogenising noise-introducing feature. In embodiments the at least one homogenising noise-introducing feature comprises one or more zonal displacement features, e.g. ripples (20′, 20″) and/or one or more zonal modulation features, e.g. one or more patterning features (30).