Patent classifications
G02B5/201
Semiconductor device, display imaging apparatus, photoelectric conversion apparatus, electronic device, illumination apparatus, and moving body
A semiconductor device includes a first substrate, a semiconductor device includes a first substrate, a color filter layer over the first substrate in an effective pixel region, a second substrate over the color filter layer, a joint member joining the first and second substrates, and a pattern layer over the first substrate outside the effective pixel region. The color filter layer has a color filter material and the pattern layer has the color filter material. In a planar view with respect to a surface of the first substrate on which the joint member is disposed, the pattern layer is disposed between two portions of the joint member, the two portions being separate from and adjacent to each other. In the planar view, the joint member is not disposed between the pattern layer and an end of the first substrate closest to the pattern layer among ends of the first substrate.
Composition, film, near infrared cut filter, laminate, pattern forming method, solid image pickup element, image display device, infrared sensor, and color filter
A composition includes two or more near infrared absorbing compounds having an absorption maximum in a wavelength range of 650 to 1000 nm and having a solubility of 0.1 mass % or lower in water at 23° C., in which the two or more near infrared absorbing compounds include a first near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm, and a second near infrared absorbing compound having an absorption maximum in a wavelength range of 650 to 1000 nm which is shorter than the absorption maximum of the first near infrared absorbing compound, and a difference between the absorption maximum of the first near infrared absorbing compound and the absorption maximum of the second near infrared absorbing compound is 1 to 150 nm.
Coloring pattern structure and method of manufacturing the same
Provided is a coloring pattern structure. The coloring pattern structure includes: a substrate; a light-transmitting dielectric layer formed on at least one surface of the substrate; and a composite material layer disposed on an upper surface of the light-transmitting dielectric layer and formed of a metal and a first material not having a thermodynamic solid solubility in the metal, wherein the metal included in the composite material layer has a pattern coated only on portions of the upper surface of the light-transmitting dielectric layer, and the first material is coated on the remaining area where the metal is not coated.
IMAGING APPARATUS AND METHOD
Provided are an imaging apparatus and a method capable of capturing a high-quality multi spectral image. The imaging apparatus includes: an optical system that has three or more aperture regions at a pupil position or near the pupil position, each of the aperture regions being provided with a different combination of a polarizing filter and a bandpass filter such that the aperture region transmits light having a combination of a different polarization angle and a different wavelength range; an image sensor in which three or more types of pixels that receive light having different polarization angles are arranged two-dimensionally; and a processor that performs interference removal processing on a signal output from the image sensor and generates an image signal for each of the aperture regions. In a case where the optical system has three or more types of the polarizing filters and the polarizing filters are arranged in an order of the polarization angles, at least one of differences in the polarization angles of the adjacent polarizing filters is different from the others.
SYSTEM AND METHOD FOR A MULTI-PRIMARY WIDE GAMUT COLOR SYSTEM
The present invention includes systems and methods for a multi-primary color system for display. A multi-primary color system increases the number of primary colors available in a color system and color system equipment. Increasing the number of primary colors reduces metameric errors from viewer to viewer. One embodiment of the multi-primary color system includes Red, Green, Blue, Cyan, Yellow, and Magenta primaries. The systems of the present invention maintain compatibility with existing color systems and equipment and provide systems for backwards compatibility with older color systems.
DISPLAY SUBSTRATE, FINE METAL MASK SET AND MANUFACTURING METHOD THEREOF
A display substrate, a fine metal mask set and a manufacturing method thereof are provided. The display substrate includes a plurality of repeat units. Each of the plurality of repeat units includes one first-color sub-pixel, one second-color sub-pixel pair and one third-color sub-pixel which are arranged in a first direction, the second-color sub-pixel pair includes two second-color sub-pixels arranging in a second direction. Light-emitting layers of adjacent sub-pixels of two different colors in the first direction are connected with each other; light-emitting layers of the third-color sub-pixel and the second-color sub-pixel which are adjacent to each other in the second direction are connected with each other; and a spacing is disposed between the light-emitting layer of the first-color sub-pixel and the light-emitting layer of at least one of the second-color sub-pixel and the third-color sub-pixel which are adjacent to the first-color sub-pixel in the second direction.
Electro-optic displays including redox compounds
An electro-optic display having a viewing surface through which a user views the display, a bistable, electrophoretic medium, and at least one electrode arranged to apply an electric field to the electrophoretic medium, the display further comprising at least 10 micromoles per square meter of the viewing surface of at least one compound having an oxidation potential more negative that about 150 mV with respect to a standard hydrogen electrode, as measured at pH 8, where the compound is a sulfite salt or a salt of titanium (III), vanadium (II), iron (II), cobalt (II) or copper (I), a hydroquinone, a catechol, a dihydropyridine or a metallocene.
Composition, film, near infrared cut filter, solid-state imaging element, image display device, and infrared sensor
A composition includes a near infrared absorbing pigment and a solvent, in which the near infrared absorbing pigment is at least one selected from a colorant compound which has a cation and an anion in the same molecule, a colorant compound which is a salt of a cationic chromophore and a counter anion, and a colorant compound which is a salt of an anionic chromophore and a counter cation, a D50 particle size in which a cumulative volume in a particle size distribution of particle sizes of the near infrared absorbing pigment is 50% is 100 nm or lower, and d values of Hansen solubility parameters of the near infrared absorbing pigment and the solvent satisfy a predetermined expression.
Color filter and manufacturing method thereof, and display device
A color filter and a manufacturing method thereof, and a display device are provided. The color filter includes a color filter substrate, a plurality of sub-pixel regions, wherein each of the sub-pixel regions includes a first signal region, a second signal region, and a laser path disposed between the first signal region and the second signal region, a first light-shielding sheet disposed on the first signal region and covered with a first indium tin oxide layer, and a second light-shielding sheet disposed on the second signal region and covered with a second indium tin oxide layer. Wherein, the first signal region receives signals through the first indium tin oxide layer, and the second signal region receives signals through the second indium tin oxide layer, therefore improving the problem of signal transmission delay caused by the regional signal impedance difference of the indium tin oxide layer.
Manufacturing method of color film substrate and color film substrate
The present invention provides a manufacturing method of a color film substrate and the color film substrate. The manufacturing method includes providing a substrate; forming a first photoresist layer on a first sub-pixel region; forming a quantum dot layer on the substrate, wherein light emission colors of at least two types of quantum dots are respectively different from a light emission color of the first photoresist layer; forming a second photoresist layer and a third photoresist layer on the quantum dot layer in order; and quenching the quantum dot layer to invalidate unshielded quantum dots of the quantum dot layer.