Patent classifications
G02B19/0095
Solution for EUV power increment at wafer level
The present disclosure relates to a photolithography radiation source having an angled primary laser, and an associated method of formation. In some embodiments, the photolithography radiation source has a fuel droplet generator that provides fuel droplets to a source vessel along a first trajectory. A primary laser is configured to generate a primary laser beam along a second trajectory that intersects the first trajectory. The primary laser beam is configured to ignite a plasma from the plurality of fuel droplets that emits radiation. A collector mirror is configured to focus the radiation to an exit aperture of the source vessel. The primary laser beam does not intersect the exit aperture.
Radiation collector, radiation source and lithographic apparatus
- Erik Roelof Loopstra ,
- Olav Waldemar Vladimir FRIJNS ,
- Stig Bieling ,
- Antonius Theodorus Wilhelmus Kempen ,
- Ivo Vanderhallen ,
- Nicolaas Ten Kate ,
- Ruud Antonius Catharina Maria Beerens ,
- Richard Henricus Adrianus Van Lieshout ,
- Theodorus Petrus Maria CADEE ,
- Sjoerd Nicolaas Lambertus Donders ,
- Alexander Matthijs Struycken ,
- Marcus Petrus Scheepers
A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
Light emitting diode digital micromirror device illuminator
Described are optical systems for a digital micromirror device (DMD) illuminator. The optical systems include a LED array, a tapered non-imaging collection optic, a reflective stop and a telecentric lens system. The telecentric lens system is disposed along an optical axis defined between the tapered non-imaging collection optic and the reflective stop. The telecentric lens system is configured as a first half of a symmetric one to one imager for an object plane on the optical axis and as a second half of the symmetric one to one imager for optical energy reflected from the reflective aperture stop. The optical systems reclaim optical energy emitted by the LED array that does not initially pass through the reflective stop and provide an improved intensity distribution at the DMD. Reductions in stray light and the thermal loads on the illuminator and DMD are achieved relative to conventional illumination systems for DMDs.
Graphical user interface systems and methods for optical narrowcasting
Systems and methods for optical narrowcasting are provided for transmitting various types of content. Optical narrowcasting content indicative of the presence of additional information along with identifying information may be transmitted. The additional information (which may include meaningful amounts of advertising information, media, or any other content) may also be transmitted as optical narrowcasting content. Elements of an optical narrowcasting system may include optical transmitters and optical receivers which can be configured to be operative at distances ranging from, e.g., 400 meters to 1200 meters. Moreover, the elements can be implemented on a miniaturized scale in conjunction with small, user devices such as smartphones, thereby also realizing optical ad-hoc networking, as well as interoperability with other types of data networks. Optically narrowcast content can be used to augment a real-world experience, enhance and/or spawn new forms of social-media and media content.
Imaging apparatus and imaging method
According to one embodiment, an imaging apparatus includes a light source for illumination, a stage on which an imaging object illuminated by illumination light from the light source is to be placed, a critical illumination optical system configured to supply the illumination light to the imaging object placed on the stage, and to have a greater magnification in a first axis direction than in a second axis direction, an imaging optical system configured to form an image of the imaging object placed on the stage and illuminated using the critical illumination optical system, and a detector configured to detect the image of the imaging object formed by the imaging optical system, and to have a detection area longer in the first axis direction than in the second axis direction.
ULTRAVIOLET DEVICES AND METHODS FOR THE INACTIVATION OF A PATHOGEN IN A FLOWING WATER SAMPLE
The present disclosure relates to devices and methods for the disinfection of a flowing water sample using ultraviolet light.
High resolution, high throughput additive manufacturing
Methods, devices and systems that allow three-dimensional printing of material with high resolution are described. One example system includes a two-photon polymerization (TPP) subsystem including a first light source coupled to an optical fiber positioned to deliver a first laser light to a scanning optical device, and an optical projection subsystem comprising a second light source configured to provide a second light to a digital projection device. A dichroic mirror is positioned to receive light corresponding to the first and the second light source, and an objective lens positioned to provide illumination to a target material for 3D printing. The dichroic mirror is configured to allow light from one of the light sources to pass therethrough to the objective lens, and to allow light corresponding to the other light source to be reflected towards the objective lens to enable simultaneous illumination of the target material.
Method and apparatus for laser annealing
A layer on a substrate is laser annealed by pulses in a plurality of laser beams formed into a uniform line beam. The laser beams are partitioned into a first set of beams and a second set of beams. The second set of beams is incident onto the layer from a smaller range of angles than all of the beams combined. Pulses in the beams are synchronized such that pulses in the first set of beams are incident on the layer before pulses in the second set of beams. Pulses in the first set of beams melt the layer and pulses in the second set of beams sustain melting.
EUV LITHOGRAPHY APPARATUS
An extreme ultra violet (EUV) light source apparatus includes an excitation laser inlet port configured to receive an excitation laser, and a first mirror configured to reflect the excitation laser that passes through a zone of excitation. A metal droplet is irradiated by the excitation laser.
ENHANCED LED POLYMERIZATION DEVICE
An enhanced LED (Light Emitting Diode) UV (Ultra Violet) polymerization device (10) suitable for being used for polymerizing resins, glues or inks applied on flat surfaces of panels, sheets, or coils made from wood or other materials, such as glass, plastic, metal, composite materials, paper, and cardboard, and on shaped surfaces of non-flat pieces made from wood or other materials, comprising a plurality of LEDs (16) of the UV type and wherein said LEDs (16) are organized into arrays or strings (17, 17) arranged perpendicularly to or inclined with respect to the feeding direction of the piece to be submitted to polymerization, said arrays (17, 17) of LEDs (16) being angularly orientable with respect to a horizontal plane either synchronously or independently to modify the radiation parameters of said LEDs (16), power level, distance from the panel or piece to be submitted to polymerization, and passage speed of the pieces being processed being equal.