An optical component includes a substrate and a piezoelectric film formed on the substrate and configured to deform in response to an actuation voltage applied thereto into a pattern of peaks and troughs configured to deflect optical radiation that is incident thereon. The pattern has an amplitude determined by the actuation voltage.

A light guide device includes a plurality of reflection units that reflect incident light so as to guide it to irradiate on an object. The plurality of the reflection units are lined up along a traveling direction of the incident light. Each of the plurality of the reflection units includes a first light guide member that reflects the incident light. Each of the plurality of the reflection units is switched between a reflecting state in which the first light guide member reflects the incident light and a passing state in which the incident light passes through, by rotation of the first light guide member. Timing of being in the reflecting state differs among the plurality of the reflection units. In the reflecting state, the reflected light due to reflection of the incident light is deflected as the first light guide member rotates. The reflected light is led to an irradiated point included in a scanning area in which the reflection unit scans the object to be irradiated. The scanning areas of the plurality of the reflection units are lined up in parallel with the traveling direction of the incident light.

A method for optimizing parameters of a physical light propagation model includes providing a physical model of a light propagation in an optical system, radiating an input light distribution using an illumination unit into an excitation path of the optical system, traversing the input light distribution through a scattering body, wherein the scattering body is arranged in the excitation path of the optical system and modifies the input light distribution to form a transmission light distribution to form a reflection light distribution, recording the transmission light distribution or the reflection light distribution, transferring the recorded transmission light distribution or the recorded reflection light distribution to the physical model, and computing transmission distortion parameters of the physical model based on the recorded transmission light distribution or the recorded reflection light distribution. The transmission distortion parameters characterize the scattering body.

An opto-electronic system includes a laser operable to produce a laser beam; an optical element including two or more beam-shaping portions, each of the two or more beam-shaping portions having a different optical property; a beam deflector arranged to sweep the laser beam across the optical element to produce output light; and electronics communicatively coupled with the laser, the beam deflector, or both the laser and the beam deflector. The electronics are configured to cause selective impingement of the laser beam onto a proper subset of the two or more beam-shaping portions of the optical element to modify one or more optical parameters of the output light.

A laser projector includes a laser assembly, a beam combination mirror group and a phase delaying component. The laser assembly includes a red laser light emitting region, a blue laser light emitting region and a green laser light emitting region. Red laser light is polarized in a first direction, green laser light is polarized in a second direction, and blue laser light is polarized in a third direction. The beam combination mirror group combines the red laser light, the blue laser light and the green laser light. The phase delaying component is on a light emitting path of at least one of the red laser light, the blue laser light the green laser light, and changes a polarization direction of the at least one of the red laser light, the blue laser light or the green laser light before being output by the beam combination mirror group.

Provided is an illumination system for providing an illumination beam. The illumination system includes at least one light source, a movable reflective element, a lens element, and a light uniformizing element. The light source is configured to emit at least one beam. The beam is reflected by the movable reflective element, and then passes through the lens element and the light uniformizing element to form an illumination beam. An optical effective area of the beam on the lens element is configured to be larger than that of the beam on the movable reflective element by motion of the movable reflective element. The optical effective area is an area of a union of each beam that irradiates the lens element or the movable reflective element at different times. A projection device is also provided. The illumination system and projection device provide a uniformized illumination beam and improve the projection effect.

A laser beam shaping device includes a multi-zone structure lens and a focusing lens. The multi-zone structure lens includes a lens body and a refractive structure. The lens body has an incident plane and an emission plane, and one of the incident plane and the emission plane is furnished with the refractive structure. The light source passing through the refractive structure deviates and leaves the lens body via the emission plane. The light source passing through the lens body is divided into N sets of light beams. After the N sets of light beams penetrate through the focusing lens, N set of incident beams are formed to project the interface of the first material and the second material in an oblique inward manner with respect to the optical axis of the focusing lens. In additional, a laser processing system and a laser interlocking welding structure respectively are also provided.

An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. A deformable mirror is disposed in a path of the excitation laser. A controller is configured to adjust parameters of the excitation laser by controlling the deformable mirror based on a feedback parameter.

Optical apparatus (20) includes a laser (22), which is configured to emit a beam of coherent optical radiation at a specified wavelength along a beam axis. A deflector (24) is configured to intercept and selectably deflect the beam over a range of angles relative to the beam axis. A plurality of diffractive optical elements (DOEs—32, 34, 36, 64, 66, 68) are positioned to receive the deflected beam at different, respective deflection angles within the range and to output respective diffracted beams. Beam-combining optics (42, 74) are configured to receive and deflect the diffracted beams from the DOEs so that all of the diffracted beams are directed along a common output axis toward a target (48).

A laser radiation system according to a viewpoint of the present disclosure includes a first optical system configured to convert a first laser flux into a second laser flux, a multimirror device including mirrors, configured to be capable of controlling the angle of the attitude of each of the mirrors, and configured to divide the second laser flux into laser fluxes and reflect the laser fluxes in directions to produce the divided laser fluxes, a Fourier transform optical system configured to focus the divided laser fluxes, and a control section configured to control the angle of the attitude of each of the mirrors in such a way that the Fourier transform optical system superimposes the laser fluxes, which are divided by the mirrors separate from each other by at least a spatial coherence length of the second laser flux, on one another.