Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels spatially by at least a grey tone group and a full tone group of spatial light modulator pixels. When divided by the controller, the grey tone group of spatial light modulator pixels is operable to project a first number of the multiplicity of shots to the plurality of full tone exposure polygons and the plurality of grey tone exposure polygons, and the full tone group of spatial light modulator pixels is operable to project a second number of the multiplicity of shots to the plurality of full tone exposure polygons.

Stereolithography using solid thermoplastic photopolymer plates/sheets/films provides a new technique to make 3D printed objects. In this new additive manufacturing process, objects are built layer-wise using thermoplastic photopolymers and actinic radiation. The thermoplastic photopolymer compositions consist of a thermoplastic photopolymer layer sandwiched between a transparent flexible base without an anchoring layer and a release film. Un-crosslinked portions of the 3D printed object are removed by heat. Preferred method of radiation exposure is digital light processing (DLP)

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the bow-tie and C-aperture are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.

A light irradiating device includes a processing chamber in which a substrate is accommodated; a beam source chamber in which a beam source of an energy beam is accommodated; a partition wall configured to partition the processing chamber and the beam source chamber; multiple window members provided at the partition wall to transmit the energy beam outputted from the beam source toward the substrate within the processing chamber; and multiple gas discharge units respectively disposed around the multiple window members within the processing chamber, and configured to discharge an inert gas along surfaces of the multiple window members.

A digital masking system includes a supporting structure for supporting a material, and a pattern imaging apparatus. The pattern imaging apparatus includes a light source device, multiple imaging devices that convert light from the light source device into a plurality of light beams each representing an image, and a combiner that combines the light beams into a single light beam which is projected toward a material.

An image exposure device includes an image display device having pixels, a photosensitive recording medium support portion that supports a photosensitive recording medium for recording an image of the image display device in a state in which an exposure surface of the photosensitive recording medium faces the image display device, a louver film that is provided between the image display device and the photosensitive recording medium support portion, and in which light transmitting portions that transmit light and light shielding portions that block light are alternately arranged in a first direction, and light transmitting portions that transmit light and light shielding portions that block light are alternately arranged in a second direction, and a protective layer that is provided on the louver film on a side of the photosensitive recording medium support portion.

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the bow-tie and C-aperture are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.

A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.

Disclosed is an LM guide assembling method using half division, and a computer readable recording medium having a program for executing the same. The method includes: disposing an LM rail on a base; fastening a first hole and a (2.sup.n+1)-th hole; installing an angle measuring device; fastening a (2.sup.n-1+1)-th hole at step S130; respectively disposing the LM blocks on the first hole and the (2.sup.n-1+1)-th hole; disposing the auxiliary shelf on the LM blocks; setting an angle of the auxiliary shelf to a zero angle; moving the two LM blocks to be on a (2.sup.n-1+1)-th hole and a (2.sup.n+1)-th hole, and measuring an angle of the auxiliary shelf; calculating a straightness correction amount; and moving a position of the (2.sup.n-1+1)-th hole by the straightness correction amount, and fastening the hole, wherein, the steps are repeated until n becomes 1.

The present invention discloses a digital photolithography method for a fiber optic device (FOD) based on a DMD combination. In this method, reflected light modulated by two DMDs is simultaneously projected onto a same position on an optical fiber end surface through one reduction projection lens. The two DMDs form a primary and secondary digital mask for joint control of an exposure dose distribution formed when patterns are shrunk and projected onto the optical fiber end surface. After the optical fiber end surface coated with photoresist is subject to this dose of exposure, developing, fixing, and etching are conducted, to form a micro-optic device on the optical fiber end surface. In the present invention, distribution of the exposure dose jointly modulated by a digital mask combination formed by the primary and secondary DMD exceeds an order of modulation of an exposure dose by a single DMD.