Patent classifications
G01R31/2853
SEMICONDUCTOR DEVICE INCLUDING DEFECT DETECTION CIRCUIT AND METHOD OF DETECTING DEFECTS IN THE SAME
A semiconductor device includes a semiconductor die having a peripheral region surrounding, a defect detection circuit in the peripheral region, the defect detection circuit arranged in an open conduction loop, the defect detection circuit comprising a plurality of latch circuits and a plurality of defect detection conduction paths, each defect detection conduction path of the plurality of defect detection conduction paths connecting two adjacent latch circuits of the plurality of latch circuits, and a test control circuitry configured to perform (a) a test write operation by transferring bits of an input data pattern in a forward direction of the open conduction loop to cause the plurality of latch circuits to store the bits of the input data pattern in the plurality of latch circuits, and (b) a test read operation by transferring bits stored in the plurality of latch circuits in a backward direction of the open conduction loop.
CIRCUIT STRUCTURE FOR TESTING THROUGH SILICON VIAS IN THREE- DIMENSIONAL INTEGRATED CIRCUIT
A circuit structure for testing through silicon vias (TSVs) in a 3D IC, including a TSV area with multiple TSVs formed therein, and a switch circuit with multiple column lines and row lines forming an addressable test array, wherein two ends of each TSV are connected respectively with a column line and a row line. The switch circuit applies test voltage signals through one of the row lines to the TSVs in the same row and receives current signals flowing through the TSVs in the row from the columns lines, or the switch circuit applies test voltage signals through one of the column lines to the TSVs in the same column and receives current signals flowing through the TSVs in the column from the row lines.
TEST STRUCUTRE FOR MONITORING INTERFACE DELAMINATION
Aspects of the present disclosure include a test structure that includes two or more devices. Each device includes a wire disposed within a dielectric and a first via disposed over the wire and in electrical contact with the wire. Each device includes a test pad electrically connected to the first via and a polysilicon resistor electrically connected to the wire. Each of the polysilicon resistors of the two or more devices are electrically tied together. A method for forming the interconnect structure to be used for testing is also provided.
Semiconductor chip and method for detecting disconnection of wire bonded to semiconductor chip
A semiconductor chip is provided with first and second electrode pads, a first current detector, and a third electrode pad. The first and second electrode pads are both to be wire-bonded to a first lead terminal. The first current detector is connected between the first and second electrode pads. The third electrode pad is wire-bonded to a second lead terminal. A first closed circuit is configured by the first lead terminal, the first electrode pad, the first current detector, and the second electrode pad. An induced current flows through the first closed circuit when a current generating an induced electromotive force is applied to the third electrode pad. The first current detector is configured to output different values depending on whether the induced current exceeds a threshold value or not.
TSV testing method and apparatus
An integrated circuit die includes a substrate of semiconductor material having a top surface, a bottom surface, and an opening through the substrate between the top surface and the bottom surface. A through silicon via (TSV) has a conductive body in the opening, has a top contact point coupled to the body at the top surface, and has a bottom contact point coupled to the body at the bottom surface. A scan cell has a serial input, a serial output, control inputs, a voltage reference input, a response input coupled to one of the contact points, and a stimulus output coupled to the other one of the contact points.
SHORT-RESISTANT OUTPUT PIN CIRCUITRY
An integrated circuit (IC) is disclosed herein for short-resistant output pin circuitry. In an example aspect, an integrated circuit includes a short-resistant pin and an adjacent pin. The integrated circuit also includes a short-resistant pad that is coupled to the short-resistant pin and an adjacent pad that is coupled to the adjacent pin. The integrated circuit further includes short-resistant circuitry that is coupled to the short-resistant pad and the adjacent pad. The short-resistant circuitry is implemented to detect a short-circuit condition between the short-resistant pin and the adjacent pin and to reduce an effect of the short-circuit condition on the short-resistant pin.
SHORT CIRCUIT DETECTING DEVICE OF STACKED MEMORY CHIPS AND METHOD THEREOF
Disclosed are a method and a device for detecting a short circuit between adjacent micro-bumps. The method includes setting outputs of a pull-up driver and a pull-down driver of a data output circuit connected with a micro-bump to be suitable for a test type and determining whether a short circuit is generated.
HIGH-VOLTAGE ISOLATOR TESTING
A handler for holding an electronic device during high voltage testing includes conductive lead guides for shorting leads on one side of the isolator together and connectors connecting the lead guides to conductors.
Kill die subroutine at probe for reducing parametric failing devices at package test
A method of testing semiconductor devices includes contacting bond pads coupled to integrated circuitry on a first die of a plurality of interconnected die on a substrate using a probe system having probes and probe tests including parametric tests, continuity tests, and a kill die subroutine. Probe tests using the probe program are performed. Die are binned into a first bin (Bin 1 die) for being a good die for all probe tests, or a second bin (Bin 2 die) for failing at least one of continuity tests and parametric tests. The Bin 2 die are divided into a first sub-group that failed the continuity tests and a second sub-group that do not fail the continuity tests. A kill die subroutine is triggered including applying power sufficient to selectively cause damage to the second sub-group of Bin 2 die to generate a continuity failure and thus generate kill die.
CIRCUIT FOR TESTING AND ANALYZING TSV AND METHOD OF TESTING THE SAME
Disclosed are a circuit for testing and analyzing a through-silicon via (TSV) and a method of testing the same. The circuit according to the present disclosure is capable of measuring a voltage applied to a first comparator after passing through a TSV and subsequently determining whether the TSV has a short-circuit fault, measuring the voltage applied to a second comparator after passing through the TSV and subsequently determining whether the TSV has an open-circuit fault, and determining whether the TSV is faulty based on an output from each of the first and second comparators.