A radiative cooling device and a radiative cooling method that effectively suppress ultraviolet light absorption. The radiative cooling device includes an ultraviolet reflection layer that reflects ultraviolet light UV, a light reflection layer that reflects visible light and infrared light, and an infrared radiative layer that radiates infrared light IR. Infrared light IR is radiated form a radiative surface. The ultraviolet reflection layer, the infrared radiative layer and the light reflection layer are laminated in this order as viewed from the side of the radiative surface.

The present technology relates to an imaging device, an imaging method, and an electronic device enabling to improve image quality.

Two or more imaging units capable of imaging or sensing a same subject are included, in which at least one first imaging unit among the two or more imaging units includes a first filter configured to transmit a plurality of wavelength bands, and at least another one second imaging unit other than the first imaging unit among the two or more imaging units includes a second filter capable of varying a wavelength band. The present technology can be applied to, for example, a compound-eye camera module, an imaging device including a compound-eye camera module, a device that includes an imaging device and provides virtual reality or the like.

This application relates to a pellicle for extreme ultraviolet lithography based on yttrium (Y) and used in a lithography process using extreme ultraviolet rays. In one aspect, the pellicle includes a pellicle layer including a core layer formed of an yttrium-based material expressed as Y-M (M is one of B, Si, O, or F).

The present invention relates to an optical filter including: a substrate; and a dielectric multilayer film laid on or above at least one major surface of the substrate, as an outermost layer, in which: the substrate includes a resin film containing a dye (U) having a maximum absorption wavelength in a range of 360 to 395 nm in dichloromethane, a dye (A) having a maximum absorption wavelength in a range of 600 to 800 nm in dichloromethane, and a resin; and the optical filter satisfies spectral characteristics (i-1) to (i-5).

In the present application, a sharp visible light transmission band can be obtained while efficiently and accurately blocking ultraviolet light near the short-wavelength visible light region and infrared light near the long-wavelength visible light region, and the ripple phenomenon can be minimized regardless of the incident angle. It is possible to provide an optical filter capable of obtaining high visible light transmittance while securing the above characteristics even in the case where a near-infrared absorption glass is used as a substrate.

Methods of treating mental disorders, including anxiety disorders such as obsessive-compulsive disorder, are provided. The methods comprise administering an effective amount of a glutamate modulator to an individual in need thereof. Also provided are methods of enhancing the activity of a serotonin reuptake inhibitor (SRI) comprising co-administering a glutamate modulator and a serotonin reuptake inhibitor. Pharmaceutical composition comprising a serotonin reuptake inhibitor and a glutamate modulator are also provided.

An optical filter which is used in an inactivation processing device that performs inactivation processing on a processing target microorganism. The optical filter, when discharge light from a light source in which the center wavelength of the discharge light is between 190 nm and 237 nm is incident at an incident angle 0°, transmits at least a portion of the ultraviolet ray equal to or greater than 190 nm and equal to or less than 230 nm and at least a portion of the ultraviolet ray greater than 230 nm and equal to or less than 237 nm, and attenuates the light intensity between 200 and 280 nm not including a wavelength region equal to or greater than 190 nm and equal to or less than 237 nm.

The present invention relates to a transparent ophthalmic lens comprising a substrate having a main front face and a main rear face, said main front face being coated with a multilayer interference coating, preferably an anti-reflection coating, comprising a stack of at least one layer have a refractive index greater than 1.6 and at least one layer having a refractive index less than 1.55, characterised in that: the mean reflection factor on said main front face coated with said interference coating, between 350 nm and a wavelength between 380 and 400 nm, preferably between 350 and 380 nm, weighted by the function W(I), is greater than or equal to 35% for at least one angle of incidence between 0° and 17°; the light reflection factor at 400 nm on said main front face coated with said interference coating is less than or equal to 35% for at least one angle of incidence between 0° and 17°.

To provide a near infrared cutoff filter capable of suppressing an influence to a captured image when the incidence angle of light to the near infrared cutoff filter is large. The near infrared cutoff filter comprises a substrate to transmit at least light in the visible wavelength region and, on at least one side of the substrate, an infrared reflective layer constituted by a layered film having a high refractive index film H and a low refractive index film L repeatedly laminated, or a layered film having a high refractive index film H, an intermediate refractive index film M and a low refractive index film L′ repeatedly laminated, and has light transmittance characteristics such that the difference between the maximum value and the minimum value among the decrease rates in average transmittance in region R, region G and region B, is at most 0.05.

The present disclosure provides an interference filter, a lithography system incorporating an interference filter, and a method of fabricating an interference filter. The interference filter includes a transparent substrate having a front surface and a back surface, a plurality of alternating material layers formed over the front surface of the transparent substrate that form a bandpass filter, and an anti-reflective structure formed over the back surface of the transparent substrate. The alternating material layers alternate between a relatively high refractive index material and a relatively low refractive index material.