Patent classifications
G02B5/283
VEHICULAR CAMERA MODULE WITH MICRO-LENS ARRAY AT IMAGER
A vehicular camera includes an imaging array sensor that includes one million photosensors arranged in rows and columns and a microlens array. The microlens array includes a plurality of microlenses disposed at the imaging array sensor. Each individual microlens of the plurality of microlenses includes a respective plurality of refractive indices. The microlens array is disposed at the imaging array sensor so that light incident at the vehicular camera passes through the microlens array to be incident at the imaging array sensor. Light incident at and passing through each individual microlens of the microlens array is incident at a respective sub-array of the photosensors of the imaging array sensor. The vehicular camera is configured to be disposed at a vehicle equipped with a vehicular vision system.
Metal-dielectric optical filter, sensor device, and fabrication method
An optical filter, a sensor device including the optical filter, and a method of fabricating the optical filter are provided. The optical filter includes one or more dielectric layers and one or more metal layers stacked in alternation. The metal layers are intrinsically protected by the dielectric layers. In particular, the metal layers have tapered edges that are protectively covered by one or more of the dielectric layers.
OPTICAL INTERFERENCE FILTER
An optical interference filter includes a substrate and one or more sets of layers that are disposed on the substrate. Each set of layers includes a first layer that comprises at least scandium, aluminum, and nitrogen, and a second layer that comprises at least silicon and oxygen. The first layer may comprise at least one of a scandium aluminum nitride (ScAlN) material or a scandium aluminum nitrogen oxide (ScAlNO) material. The second layer may comprise a hydrogenated silicon (Si:H) material. An absolute value of a net stress of the one or more sets of layers may be less than or equal to 50 megapascals.
Spectral sensor system using optical filter subarrays
An optical sensor system includes a plurality of sets of optical sensors implemented on a substrate, with a plurality of sets of optical filters, wherein a set of optical filters of the plurality of sets of optical filters is associated with a set of optical sensors and a set of optical filters of the plurality of sets of optical filters includes a plurality of optical filters that are arranged in a pattern, with each optical filter of the plurality of optical filters configured to pass light in a different wavelength range of a predefined spectral range. Each set of optical filters operates to provide a bandpass response corresponding to the predefined spectral range and a set of optical filters is located atop an associated set of optical sensors, where at least two sets of optical filters of the plurality of sets of optical filters are configured to provide different bandpass responses. An optical element is associated with a corresponding set of optical sensors, with each rejection filter configured to pass light wavelengths in a predefined spectral range.
METAL-DIELECTRIC OPTICAL FILTER, SENSOR DEVICE, AND FABRICATION METHOD
An optical filter, a sensor device including the optical filter, and a method of fabricating the optical filter are provided. The optical filter includes one or more dielectric layers and one or more metal layers stacked in alternation. The metal layers are intrinsically protected by the dielectric layers. In particular, the metal layers have tapered edges that are protectively covered by one or more of the dielectric layers.
Image sensor comprising an array of interference filters
A pixelated filter intended to rest on a support and including, in a stacking direction: first filter pixels each including a first interference filter covered with a first dielectric block; and second filter pixels each including a second dielectric block, having a thickness greater than or equal to the thickness of the first interference filter, covered with a second interference filter, having a thickness smaller than or equal to the thickness of the first dielectric block, wherein, for at least one of the second filter pixels, the second dielectric block of the second filter pixel is interposed between the first interference filters of two first filter pixels and the second interference filter of the second filter pixel is interposed between the first dielectric blocks of the first two filter pixels.
Microbe inactivation processing method and cell activation processing method
Disclosed are a microbe inactivation processing method that can perform inactivation processing of microbes, while damage to human body cells is prevented or inhibited, with an efficient use of light emitted from a light source and the obtainment of a large effective irradiation area. Also provided are a cell activation processing method that can reliably activate target cells with high efficiency. The microbe inactivation processing method includes: a step of applying light emitted from a light source through an optical filter, with the light source configured to emit light having a wavelength within a wavelength range of 190 nm to 237 nm, in order to perform inactivation processing of a target microbe. When the light emitted from the light source is incident at an incident angle of 0°, the optical filter transmits at least a part of ultraviolet light having a wavelength within a range of not lower than 190 nm and not more than 230 nm, and transmits at least a part of ultraviolet light having a wavelength within a range of more than 230 nm and not more than 237 nm, and the optical filter blocks transmission of ultraviolet light having a wavelength out of a wavelength range of not lower than 190 nm and not more than 237 nm.
WAVELENGTH SELECTIVE FILTER AND METHOD FOR FABRICATING WAVELENGTH SELECTIVE FILTER
A wavelength selective filter comprises a multi-layered structure alternately having a low refractive index layer and a high refractive index layer, a periodic structure layer facing the low refractive index layer of the multi-layered structure, the low refractive index layer having a refractive index between 1.30 and 1.60 and a thickness between 100 nm and 800 nm, the high refractive index layer having a refractive index between 1.70 and 2.20 and a thickness between 30 nm and 100 nm, and in a plane perpendicular to a thickness direction of the periodic structure layer, the multi-layered structure layer having a periodic structure made of metal or semiconductor.
CURVED SURFACE FILMS AND METHODS OF MANUFACTURING THE SAME
An optical element including an optically transparent lens which defines a curved surface having a steepness given by an R/# of from about 0.5 to about 1.0. A film is positioned on the curved surface. The film includes an index layer. A composite layer is positioned on the curved surface having a refractive index greater than the index layer. The composite layer includes HfO.sub.2 and Al.sub.2O.sub.3. The composite layer has a mole fraction X of HfO.sub.2, wherein X is from about 0.05 to about 0.95 and a mole fraction of Al.sub.2O.sub.3 in the composite layer is 1−X.
All silicon broadband ultra-violet metasurfaces
A device has a substrate transparent to ultraviolet (UV) light, and at least one metalens formed of a material having large permittivity of UV light on the substrate. A device has a UV reflector, a UV transparent film on the reflector, and at least one metalens formed of a material having large permittivity of UV light on the film.