A method for optical transmission of a structure into a recording medium which can be transformed locally from a first undefined state into a second defined state by irradiating with photons from a photon source. The two states of the recording medium are manifested in different physical and/or chemical properties of the recording medium. At least one photon source having a photon flux of less than 10.sup.4 photons per second is selected for the irradiation with the photons. It was recognized that with such a low photon flux especially fine structures can advantageously be transmitted into the recording medium without the irradiation having to be partially blocked by a mask. In this manner, for a given wavelength (energy) of the photons, structures can be transmitted that are considerably smaller than the width, defined by the diffraction limit, of the probability distribution for the locations at which the emitted photons are incident.

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask in a projection exposure apparatus includes using an anamorphic projection lens

Apparatus and method for exposing a printing plate having a photosensitive polymer to curing radiation. A plurality of light-emitting diodes (LEDs) are arranged in an array of columns and rows, including at least two, and more preferably at least three, different species, each species having a different center emission wavelength, preferably in the UV spectrum. The LEDs species are disposed adjacent one another in a repeating sequence. A controller connected to the array is configured to activate the array and to independently control each of the species to cause them to emit radiation towards the printing plate simultaneously with emissions patterns of adjacent members overlapping one another on the plate. A linear or planar source may comprise a plurality of independently controllable arrays.

A multi-chemistry structure includes: a plurality of interconnected polymer struts arranged in a lattice; a first layer of the lattice including a first array of first unit cells; a second layer of the lattice including a second array of second unit cells; at least one region of the lattice being formed of a first polymer; and at least one region of the lattice being formed of a second polymer different from the first polymer.

A source of actinic radiation for curing printing plates. The source includes a base with a heat sink and has a length greater than its width. One or more circuit boards mounted on the base provide a plurality of light emitting diodes (LEDs) distributed over the length of the base. A transparent or translucent cover together with the base defines an enclosure for the plurality of LEDs. The source provides the radiation at an emission angle greater than the emission angles of a single LED in a plane perpendicular to the axis of the base, in a plane containing the axis of the base or parallel to the axis of the base and perpendicular to the target illumination plane, or a combination thereof. The source may be configured to replace a fluorescent bulb. Methods and systems for bank exposure of printing plates using such sources are also described.

Methods of fabricating large-scale optical devices having sub-micron dimensions are provided. A method is provided that includes projecting a beam to a mask, the mask corresponding to a section of an optical device pattern, the optical device pattern divided into four or more equal portions, each portion corresponding to a section of a substrate. The method further includes scanning the mask over a first section of the substrate to pattern a first portion of the optical device pattern, the substrate is positioned at a first rotation angle relative to the mask. The method further includes rotating the substrate to a second rotation angle, the second rotation angle corresponding to 360° divided by a total number of portions of the optical device pattern, scanning the mask over a second section of the substrate from the initial position to the final position to pattern a second portion of the optical device pattern.

Apparatus, method, and system for exposing a photosensitive printing plate to radiation, including a plurality of LED point sources configured to emit UV light. The plurality of LED point sources in at least one of a front side set or back side set are controllable in subsets smaller than an entirety of the collective irradiation field corresponding to the respective set. A holder receives the printing plate in a stationary position to receive incident radiation and a controller is configured to control the plurality of LED source subsets. A first LED point source subset is configured to be controlled at a first intensity differing by a factor relative to a second intensity of a second LED point source subset to give the radiation emitted by the respective set an intended degree of homogeneity.

A method of making a relief image printing element from a photosensitive printing blank is provided. A photosensitive printing blank with a laser ablatable layer disposed on at least one photocurable layer is ablated with a laser to create an in situ mask. The printing blank is then exposed to at least one source of actinic radiation through the in situ mask to selectively cross link and cure portions of the photocurable layer. Diffusion of air into the at least one photocurable layer is limited during the exposing step and preferably at least one of the type, power and incident angle of illumination of the at least one source of actinic radiation is altered during the exposure step. The resulting relief image comprises a plurality of dots and a dot shape of the plurality of dots that provide optimal print performance on various substrates, including corrugated board.

A method includes measuring properties of a three-dimensional topography of a lithographic patterning device, the patterning device including a pattern and being constructed and arranged to produce a pattern in a cross section of a projection beam of radiation in a lithographic projection system, calculating wavefront phase effects resulting from the measured properties, incorporating the calculated wavefront phase effects into a lithographic model of the lithographic projection system, and determining, based on the lithographic model incorporating the calculated wavefront phase effects, parameters for use in an imaging operation using the lithographic projection system.

A method of flood exposing a photocurable printing blank to actinic radiation from a UV LED light source, wherein a high intensity UV LED light source is modulated to a lower intensity. The method includes the steps of: (a) positioning the photocurable printing blank in an exposure unit, wherein the exposure unit comprises one or more high intensity UV LED light sources; (b) modulating intensity of the one or more high intensity UV LED light sources to a lower intensity; and (c) flood exposing the photocurable printing blank through the photographic negative or the digitally imaged mask layer to actinic radiation from the one or more modulated UV LED light sources.