A beam exposure device includes a light-emitting unit for emitting light beams from a plurality of light-emitting positions, a scan unit, an optical condensing system for condensing a spot of the light beams onto a surface to be exposed, and a micro-deflection unit for micro-deflecting the plurality of light beams to expose the space between the beams in the plurality of light beams. The optical condensing system includes a first microlens array arranged between the light-emitting unit and the micro-deflection unit and provided with a plurality of microlenses corresponding to the light-emitting positions; and a second microlens array arranged between the micro-deflection unit and the surface to be exposed and provided with a plurality of microlenses each microlens corresponding to the light-emitting unit.

Embodiments described herein relate to a system, software, and a method of using the system to edit a design to be printed by a lithography system. The system and methods utilize a server of a maskless lithography device. The server includes a memory. The memory includes a virtual mask file. The virtual mask file includes cells and the cells include sub-cells that form one or more polygons. The server further includes a controller coupled to the memory. The controller is configured to receive a replacement table. The replacement table includes instructions to replace the cells of the virtual mask file. The controller is further configured to replace the cells with replacement cells according to the replacement table to create an edited virtual mask file.

An apparatus comprises: (a) a rotatable drum configured to have a UV-curable printing plate with an ablatable layer thereon, placed thereon; (b) at least one laser beam to image the plate on the drum by ablating some of the ablatable layer according to image data to form an imaged plate; (c) an unloading area onto which a plate is movable when unloaded; and (d) a plurality of UV LEDs configured to apply UV radiation to the back of the UV-curable plate or to both the front and back of the UV-curable plate during or after the unloading of the imaged plate.

A system for preparing a photopolymer printing plate includes exposure unit comprising a plurality of UV light emitting diodes (UV LEDs), a holder comprising a UV translucent material configured to receive the printing plate, and a controller configured to activate the plurality of UV LEDs. The UV LEDs include a plurality of stationary back UV LEDs configured to emit UV radiation toward the non-printing back side of the printing plate through the holder with the printing plate disposed in a stationary position on the holder, the plurality of stationary back UV LED sources together defining at least one back array having a collective irradiation field covering an area at least coextensive with the lateral length and lateral width of the plate.

A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.

The invention teaches a system and method for catalyzing on a substrate. The system includes a light source and a digital light patterning device which is controlled by a controller coupled to a computer. The digital patterning device includes an array of liquid crystals, each of which being electronically controlled by the computer through the controller. When a liquid crystal is on, the light from the light source passes through the liquid crystal. When it is off, the light is blocked. According to the visual image pattern presented in the computer's interface, the array, wherein some crystals are on and some are off, shows a light pattern which is consistent with the visual image pattern on the computer screen. Accordingly, the patterned light is shed onto a substrate where the light catalyzes a chemical reaction proximate a substrate.

A beam exposure device includes a light-emitting unit for emitting light beams from a plurality of light-emitting positions, a scan unit, an optical condensing system for condensing a spot of the light beams onto a surface to be exposed, and a micro-deflection unit for micro-deflecting the plurality of light beams to expose the space between the beams in the plurality of light beams. The optical condensing system includes a first microlens array arranged between the light-emitting unit and the micro-deflection unit and provided with a plurality of microlenses corresponding to the light-emitting positions; and a second microlens array arranged between the micro-deflection unit and the surface to be exposed and provided with a plurality of microlenses each microlens corresponding to the light-emitting unit.

The present disclosure provides a method for producing an image on a substrate. The method includes providing a single beam of light to a multiple DMD assembly, splitting the single beam of light into an s-polarization beam and a p-polarization beam, and reflecting the s-polarization beam and the p-polarization beam through the multiple DMD assembly such that the multiple DMD assembly produces a plurality of superimposed images on the substrate.

A system for preparing a photopolymer printing plate includes exposure unit with a plurality of UV sources, a holder comprising a UV translucent material configured to receive the printing plate, and a controller configured to activate the plurality of UV sources. The UV sources include at least one back array of stationary back UV sources configured to emit UV radiation toward the non-printing back side of the printing plate through the holder and at least one front array of front UV sources configured to emit UV radiation toward the printing front side of the printing plate with the printing plate disposed in a stationary position on the holder. The back array defines a collective irradiation field covering an area at least coextensive with the lateral length and width of the plate. At least one of the front array, back array, or both, include light emitting diodes (UV LEDs).

Embodiments of the systems, methods, and software provided herein patterns substrates using digital lithography patterning controlled by field programmable gate arrays (FPGA). Stage position data is provided to the FPGA from the lithography environment and the data is loaded into a memory from the FPGA. The graphics processing unit, reads the data from the memory and calculates instructions based on the data. At least a portion of a substrate disposed on the stage is processed using instructions provided by the FPGA.