A semiconductor device includes: M*1st conductors in a first layer of metallization (M*1st layer) and being aligned correspondingly along different corresponding ones of alpha tracks and representing corresponding inputs of a cell region in the semiconductor device; and M*2nd conductors in a second layer of metallization (M*2nd layer) aligned correspondingly along beta tracks, and the M*2nd conductors including at least one power grid (PG) segment and one or more of an output pin or a routing segment; and each of first and second ones of the input pins having a length sufficient to accommodate at most two access points; each of the access points of the first and second input pins being aligned to a corresponding different one of first to fourth beta tracks; and the PG segment being aligned with one of the first to fourth beta tracks.

A method is disclosed including: generating, based on design information for an integrated circuit, a circuit design that includes an initial power delivery network (PDN) for the integrated circuit; performing a pre-layout simulation to the circuit design that includes the initial power delivery network, to determine whether the circuit design meets a predetermined specification; generating a circuit layout of the integrated circuit when the circuit design meets the predetermined specification; and adding at least one additional conductive pillar or at least one additional power rail in the initial power delivery network according to a relationship of a pillar density of the initial power delivery network and a maximum pillar density when the circuit design does not meet the predetermined specification.

A method is disclosed including: generating, based on design information for an integrated circuit, a circuit design that includes an initial power delivery network (PDN) for the integrated circuit; performing a pre-layout simulation to the circuit design that includes the initial power delivery network, to determine whether the circuit design meets a predetermined specification; generating a circuit layout of the integrated circuit when the circuit design meets the predetermined specification; and adding at least one additional conductive pillar or at least one additional power rail in the initial power delivery network according to a relationship of a pillar density of the initial power delivery network and a maximum pillar density when the circuit design does not meet the predetermined specification.

A method is disclosed for storing and reusing the PC description of layout cells. A database stores predefined cells and PC descriptions that were previously calculated by a 3D field solver. Regarding a candidate cell from the layout diagram, the database is searched for a substantial match amongst the predefined cells. If there is a match, then the stored PC description of the matching predefined cell is assigned to the candidate cell in the layout diagram, which avoids having to make a discrete calculation for the PC description. If there is no match, then the 3D field solver is applied to the candidate cell in order to calculate the PC description of the candidate cell. To facilitate reusing the newly calculated PC description, the candidate cell and the newly calculated PC description are stored in the database as a new predefined cell and its corresponding PC description.

An electronic design flow generates an electronic architectural design layout for analog circuitry from a schematic diagram. The electronic design flow assigns analog circuits of the schematic diagram to various categories of analog circuits. The electronic design flow places various analog standard cells corresponding to these categories of analog circuits into analog placement sites assigned to the analog circuits. These analog standard cells have a uniform cell height which allows these analog standard cells to be readily connected or merged to digital standard cells which decreases the area of the electronic architectural design layout. This uniformity in height between these analog standard cells additionally provides a more reliable yield when compared to non-uniform analog standard cells.

A method for making an electromagnetic band gap structure includes performing a single full wave simulation for the structure using a computer to perform the simulation, extracting a multiple port scattering matrix based on the single full wave simulation using a computer, and measuring or estimating a transmission of waves across the body between a first port and a second port of the body. The body has multiple ports between the first port and the second port that are defined by scattering elements using the computer. The matrix may be reduced to a two by two matrix recursively one dimension at a time using the computer.

A method is provided and includes several operations: forming a first group of macros in a first region, wherein the first group of macros are aligned with a first boundary of a channel that is coupled thereto through pins of the first group of macros; forming a second group of macros in the first region to align with a second boundary of the channel that is coupled thereto through pins of the second group of macros, wherein the first and second groups of macros are coupled to a first register; and forming a third group of macros in a second region different from the first region. A first macro and a second macro that are in the third group of macros are aligned with the first and second boundaries respectively. The third group of macros are coupled to a second register different from the first register.

A method is provided and includes several operations: forming a first group of macros in a first region, wherein the first group of macros are aligned with a first boundary of a channel that is coupled thereto through pins of the first group of macros; forming a second group of macros in the first region to align with a second boundary of the channel that is coupled thereto through pins of the second group of macros, wherein the first and second groups of macros are coupled to a first register; and forming a third group of macros in a second region different from the first region. A first macro and a second macro that are in the third group of macros are aligned with the first and second boundaries respectively. The third group of macros are coupled to a second register different from the first register.

A logic network for an integrated circuit is synthesized as follows. The logic network is mapped to a network of lookup tables (LUTs). The LUT mapping is based at least in part on estimated areas of the LUTs. The individual LUTs in the network are improved (LUT optimization), for example using various Boolean optimization techniques. The network of improved LUTs is then reduced to a gate-level netlist of standard cells.

A logic network for an integrated circuit is synthesized as follows. The logic network is mapped to a network of lookup tables (LUTs). The LUT mapping is based at least in part on estimated areas of the LUTs. The individual LUTs in the network are improved (LUT optimization), for example using various Boolean optimization techniques. The network of improved LUTs is then reduced to a gate-level netlist of standard cells.