Various embodiments comprise apparatuses having a number of memory cells including drive circuitry to provide signal pulses of a selected time duration and/or amplitude, and an array of resistance change memory cells electrically coupled to the drive circuitry. The resistance change memory cells may be programmed for a range of retention time periods and operating speeds based on the received signal pulse. Additional apparatuses and methods are described.

In one embodiment, a method of operating a resistive switching device includes applying a signal comprising a pulse on a first terminal of a two terminal resistive switching device having the first terminal and a second terminal. The resistive switching device has a first state and a second state. The pulse includes a first ramp from a first voltage to a second voltage over a first time period. The first time period is at least 0.1 times a total time period of the pulse.

Systems and methods for improving performance of a non-volatile memory that utilizes a Vacancy Modulated Conductive Oxide (VMCO) structure are described. The VMCO structure may include a layer of amorphous silicon (e.g., a Si barrier layer) and a layer titanium oxide (e.g., a TiO2 switching layer). In some cases, the VMCO structure or VMCO stack may use bulk switching or switching O-ion movements across an area of the VMCO structure, as opposed to switching locally in a constriction of vacancy formed filamentary path. A VMCO structure may be partially or fully embedded within a word line layer of a memory array.

Various embodiments of the present disclosure are directed towards a memory device including a data storage structure overlying a substrate. A bottom electrode overlies the substrate and a top electrode overlies the bottom electrode. The data storage structure is disposed between the bottom electrode and the top electrode. The data storage structure comprises a dielectric material doped with a first dopant and a second dopant, where the first dopant is different from the second dopant.

A method for manufacturing a semiconductor memory device includes depositing a bottom metal line layer on a dielectric layer, and patterning the bottom metal line layer into a plurality of bottom metal lines spaced apart from each other. In the method, a plurality of switching element dielectric portions are formed on respective ones of the plurality of bottom metal lines, and a top metal line layer is deposited on the plurality of switching element dielectric portions. The method further includes patterning the top metal line layer into a plurality of top metal lines spaced apart from each other. The plurality of top metal lines are oriented perpendicular to the plurality of bottom metal lines.

In a compact three-dimensional memory (3D-M.sub.C), a memory array and an above-substrate decoding stage thereof are formed on a same memory level. For the memory devices in the memory array, the overlap portion and the non-overlap portions of the x-line are both highly-conductive; for the decoding device in the above-substrate decoding stage, while the non-overlap portions are still highly-conductive, the overlap portion is semi-conductive.

The above-substrate decoding stage of a compact three-dimensional memory (3D-M.sub.c) could be an intra-level decoding stage, an inter-level decoding stage, or a combination thereof. For the intra-level decoding stage, contact vias can be shared by address-lines in the same memory level; for the inter-level decoding stage, contact vias can be shared by address-lines from different memory levels.

Some embodiments include apparatus and methods having a memory cell with a first electrode, a second electrode, and a dielectric located between the first and second electrodes. The dielectric may be configured to allow the memory cell to form a conductive path in the dielectric from a portion of a material of the first electrode to represent a first value of information stored in the memory cell. The dielectric may also be configured to allow the memory cell to break the conductive path to represent a second value of information stored in the memory cell.

A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive word line layers located over a substrate, and a plurality of vertical memory strings. Each vertical memory string includes a series connection of a memory stack structure and a selector element. Each of the memory stack structures extends through the alternating stack and includes a respective memory film and a respective vertical semiconductor channel. Each of the selector elements includes a two terminal device that is configured to provide at least two different resistivity states.

Methods and systems for copying weight values between weight arrays includes reading outputs from a first array and reading outputs from a second array. Differences between respective outputs of the first array and the second array are determined. Values of the second array are adjusted in accordance with the determined differences.