A method for measuring the thickness of coatings on a substrate of an aerospace component comprises illuminating a sample comprising the substrate of the aerospace component and a coating with light waves of varying wavelengths from a light source, receiving the light waves reflected by the sample at a light collector, diffracting the light waves into a plurality of component wavelengths with a grating, detecting the light intensities of the plurality of component wavelengths at a detector array, generating a reflectance spectral curve using the detected light intensities for each of the plurality of component wavelengths, calculating the thickness of the coating from the reflectance spectral curves of the component wavelengths.

In thickness/depth measurement of a wafer in etching, variation occurs in detected light quantity due to fluctuation of light quantity of a light source or fluctuation of air in a region through which light passes, and measurement accuracy of thickness/depth is reduced, and thus the total light quantity or average light quantity of an arbitrary wavelength is calculated from an optical spectrum measured at each time instant during etching, estimated total light quantity or estimated average light quantity at the present time, which is estimated using total light quantity or average light quantity measured prior to the present time, is calculated, a change rate, as a ratio of the total light quantity at the present time to the estimated total light quantity or a ratio of the average light quantity to the estimated average light quantity, is calculated, the calculated change rate is used to correct light quantity of each wavelength at the present time, and the corrected light quantity of each wavelength is used to perform thickness/depth measurement.

A method for measuring a thickness of a coating includes illuminating a substrate of an appliance with light waves of varying wavelengths from a light source. The method further includes receiving the light waves reflected by a top surface and a bottom surface of the coating at a light collector. The method may further include diffracting the light waves into a plurality of component wavelengths with a grating, and detecting light intensities of the plurality of component wavelengths at a detector array. The method may further include calculating a thickness of the coating from the detected light intensities.

A growth rate detection apparatus has a reflectometer to measure reflectivity of a thin film by receiving reflected light of light irradiated with the thin film, a growth rate candidate calculator to calculate a first growth rate and a second growth rate which are candidates for a growth rate of the thin film based on a temporal variation period of the reflectivity and a refractive index of the thin film in a case where the reflectometer irradiates the thin film with light of a first wavelength and to calculate a third growth rate and a fourth growth rate which are candidates for the growth rate of the thin film based on the temporal variation period and the refractive index in a case where the reflectometer irradiates the thin film with light of a second wavelength, and a growth rate selector to select a common growth rate.

A thickness measuring device includes a laser emitting a laser beam to an object in a semiconductor processing chamber, a quartz glass inside the chamber reflecting part of the laser beam and to transmit a remainder of the laser beam, a first light receiving sensor detecting an intensity of first reflected light reflected from the quartz glass, a second light receiving sensor detecting an intensity of second reflected light transmitted through the quartz glass and reflected from the object, and a controller configured to calculate input intensity of the laser beam based on the intensity of the first reflected light, to calculate reflectivity of the object by comparing the input intensity of the laser beam with the intensity of the second reflected light, and to measure a thickness of the object by comparing the calculated reflectivity with predetermined reflectivity values for a plurality of thicknesses.

Method for measuring thickness of coatings includes illuminating an automobile sample comprising a substrate and at least one coating with light waves of varying wavelengths from a light source. It further includes receiving the light waves reflected by a top surface and a bottom surface of the coating on the sample at the light collector. It also includes diffracting the light waves into a plurality of component wavelengths with a grating, detecting light intensities of the plurality of component wavelengths at a detector array, generating a combined reflected interference pattern spectral curve using the detected light intensities for each of the received light waves for each of the plurality of component wavelengths, and calculating a thickness of the at least one coating from a frequency of the combined reflected interference pattern spectral curve of the component wavelengths.

An example method that includes receiving a first geometry of a component in an uncoated state and a second geometry of the component in a coated state; determining a first difference between the second geometry and a first simulated geometry based on the first geometry and a first spray law comprising a plurality of first spray law parameters; iteratively adjusting at least one first spray law parameter to determine a respective subsequent spray law; iteratively determining a respective subsequent difference between the second geometry and a subsequent simulated geometry based on the first geometry and the subsequent respective spray law; selecting a subsequent spray law from the respective subsequent spray laws based on the respective subsequent differences; and controlling a coating process based on the selected subsequent spray law.

An example method that includes receiving a geometry of a component that includes a plurality of locations on a surface of the component; determining a first target trajectory including a first plurality of target trajectory points and a second target trajectory including a second plurality of target trajectory points, the first and second trajectories offset in a first direction, and the first and second plurality of trajectory points offset in a second direction; determining a respective target coating thickness of the coating based on a target coated component geometry and the geometry; and determining a respective motion vector of a coating device based on the first and second target trajectories to deposit the respective target coating thickness.

An example method that includes receiving a geometry of an uncoated component and a measured coating thickness of a coated test; determining a simulated coating thickness based on the geometry and a first spray law including a plurality of first spray law parameters; determining a difference between the simulated coating thicknesses and the measured coating thickness; iteratively adjusting at least one first spray law parameter to determine a respective subsequent spray law and determining a respective subsequent difference between the measured coating thickness and a subsequent simulated coating thickness based on the geometry and the respective subsequent spray law; selecting a subsequent spray law from the plurality of respective subsequent spray laws based on the respective subsequent differences; and controlling a coating process based on the selected subsequent spray law to compensate for the difference.

A device for determining a layer thickness in a multilayer film includes a radiation source configured to generate an electromagnetic primary radiation, a detector configured to detect an electromagnetic secondary radiation emitted by the multilayer film, the secondary radiation being induced by an interaction of the primary radiation with the multilayer film, and a first contact block transparent to the electromagnetic primary radiation and having a first contact surface for creating contact with the multilayer film. The radiation source is arranged on the first contact block in such a way that the electromagnetic primary radiation is guided from the first contact block onto the multilayer film.