A system for detecting the concentration of metal particles of at least one first material, which includes a detector with: a semiconductor body including a cathode region, delimited by a front surface; and an anode structure made of metal material, which extends over a part of the cathode region, leaving part of the front surface exposed. The anode structure and the part of the cathode region form a first contact of a Schottky type. The exposed part of the front surface can access the metal particles.

The disclosure relates to a sensor for measuring a gas concentration of a target gas in a sample of ambient air. The sensor comprises a first gas sensitive component comprising a first gas sensitive layer being arranged between a first pair of measuring electrodes, a second gas sensitive component comprising a second gas sensitive layer being arranged between a second pair of measuring electrodes and one or more heating elements to heat the first gas sensitive layer and the second gas sensitive layer. The first gas sensitive layer and the second gas sensitive layer comprise a metal oxide semiconductor. The first gas sensitive component is configured to measure the gas concentration of the target gas in a first concentration band and the second gas sensitive component is configured to measure the gas concentration of the target gas in a second concentration band. According to an embodiment, the sensor is configured to operate for both the measuring of the first concentration band and for the measuring of the second concentration band in a respective transition regime. The transition regime is situated between a perturbation regime and a saturation regime. The transition regime is characterized by a higher sensitivity to the target gas than the perturbation regime and the saturation regime.

Further aspects of the disclosure relate to a corresponding method, a computer program product and an electronic device.

An electronic device includes a base, a multi-stage sensor, a top cover, and a side cover. The multi-stage sensor is configured to sense a sensed area. The top cover includes a top-sensed element, and the top cover is detachably connected to a top side of the base, so that the top-sensed element can be selectively in or not in the sensed area. The side cover includes a side-sensed element, and the side cover is detachably adjacent to a front side of the base, so that the side-sensed element can be selectively in or not in the sensed area. In response to that only the top-sensed element is in the sensed area, the multi-stage sensor outputs a first signal. In response to that neither the top-sensed element nor the side-sensed element is in the sensed area, the multi-stage sensor outputs a second signal.

An electronic device for sensing a target analyte in a gas, liquid or vapor sample, the device has at least two sensing elements, each sensing element having an exposed layer of a transduction material supported on a dielectric substrate. The dielectric substrate of at least one of the sensing elements is made of a different dielectric material than the dielectric substrate of at least one other of the sensing elements. The different dielectric materials providing a different sensing response according to one or more transduction modes. The plurality of sensing elements in the device yield a specific transduction pattern for a specific target analyte in a gas, liquid or vapor sample.

A method for manufacturing a gas sensor may be provided, the method comprising the steps of: preparing a porous base substrate; providing, on the porous base substarte, a source solution having graphene dispersed in a base solvent; manufacturing a graphene-impregnated base substrate by means of a driving process; and forming a first electrode and a second electrode on the graphene-impregnated base substrate.

Disclosed are a hydrogen sensor which includes a P-type silicon nanowire array and a hydrogenation catalyst formed on a surface of the nanowire array, and a method of manufacturing the same.

A gas sensor includes a first substrate, at least one first electrode, a sensing structure, at least one second electrode, and a second substrate. The at least one first electrode is located on the first substrate. The sensing structure is located on the at least one first electrode and the first substrate, and the sensing structure includes a first semiconductor layer and a second semiconductor layer. The first semiconductor layer having a first conductive type covers the first substrate and the at least one first electrode; the second semiconductor layer having a second conductive type is located on the first semiconductor layer. The at least one second electrode covers the sensing structure. The second substrate covers the at least one second electrode and the sensing structure.

A gallium nitride-based sensor having a heater structure and a method of manufacturing the same are disclosed, the method including growing an n-type or p-type GaN layer on a substrate, growing a barrier layer on the n-type or p-type GaN layer, sequentially growing a u-GaN layer and a layer selected from among an Al.sub.xGa.sub.1-xN layer, an In.sub.xAl.sub.1-xN layer and an In.sub.xAl.sub.yGa.sub.1-x-yN layer on the barrier layer, patterning the n-type or p-type GaN layer to form an electrode, forming the electrode along the pattern formed on the n-type or p-type GaN layer, and forming a sensing material layer on the layer selected from among the Al.sub.xGa.sub.1-xN layer, the In.sub.xAl.sub.1-xN layer and the In.sub.xAl.sub.yGa.sub.1-x-yN layer, wherein a HEMT sensor or a Schottky diode sensor can be heated using an n-GaN (or p-GaN) layer, thus increasing the sensitivity of the sensor and reducing the restoration time.

The MEMS type semiconductor gas detection element of the invention is a MEMS type semiconductor gas detection element 1 having a MEMS structure, for detecting hydrogen gas, comprising: a substrate 2; a gas sensitive portion 3 mainly made of a metal oxide semiconductor and provided to the substrate 2; a heating portion 4 for heating the gas sensitive portion 3; an inactive film 5 having hydrogen-permselective and formed outside the gas sensitive portion 3; a protective film 6 formed outside the inactive film 5, for suppressing deterioration of the gas sensitive portion 3.

An ion-sensitive structure includes a semiconductor structure and a layer stack disposed on the semiconductor structure having a doped intermediate layer including a doping material and a first metal oxide material. The semiconductor structure is configured to change an electric characteristic based on a contact of the ion-sensitive structure with an electrolyte including ions.