A gas analysis system and method with a spectrometer, such as a Fourier transform infrared spectrometer, utilizing a reactor, such as a catalytic reactor, for providing reference spectra.

Examples described herein provide a method for characterizing a catalyst in a chemisorption unit. The method includes treating a catalyst sample with gas blend comprising ammonia in an inert gas and performing a first temperature programmed desorption (TPD) to desorb the ammonia from the catalyst sample. A temperature programmed reduction (TPR) of the catalyst sample is performed with hydrogen. The catalyst sample is treated after the TPR with a gas blend comprising ammonia in an inert gas. A second temperature programmed desorption is performed to desorb the ammonia from the catalyst sample.

An apparatus for semiconductor manufacturing includes an input port to receive a carrier, wherein the carrier includes a carrier body, a housing installed onto the carrier body, and a filter installed between the carrier body and the housing. The apparatus further includes a first robotic arm to uninstall the housing from the carrier and to reinstall the housing into the carrier; one or more second robotic arms to remove the filter from the carrier and to install a new filter into the carrier; and an output port to release the carrier to production.

Systems and method for automatically determining offset correction values in a differential measurement system, and for correcting measurement offsets between two measurement devices in the differential measurement system. A method for determining real-time offset corrections in a gas analysis system having first and second gas analyzers includes for each of a plurality of gas concentrations within a range of gas concentrations: a) supplying the concentration of gas to the first and second gas analyzers through first and second gas flow lines, respectively; b) measuring a first gas concentration value using the first gas analyzer; and c) measuring a second gas concentration value using the second gas analyzer. The method may also include determining an offset value between each corresponding first and second gas concentration value, and determining a functional relationship between the offset values and gas concentration measurements of the first gas analyzer.

A gas analyzer includes an oxidation device and a subsequent photometer, wherein the oxidation device has a reaction chamber located in an exhaust gas path and a heating chamber downstream thereof, where an ultraviolet light source generates ozone from residual oxygen content of the exhaust gas within the reaction chamber to convert nitrogen monoxide into nitrogen dioxide in the exhaust gas, nitrogen oxides and excess ozone are broken down into nitrogen dioxide and oxygen in the heating chamber, the photometer outputs the measured nitrogen dioxide concentration as nitrogen oxide concentration of the untreated exhaust gas, and where an additional photometer is located in the exhaust gas path between the reaction chamber and the heating chamber which, via light absorption, measures the ozone concentration in the partially treated exhaust gas and outputs the same as oxygen concentration of the untreated exhaust gas.

A method includes receiving a carrier with a plurality of wafers inside; supplying a purge gas to an inlet of the carrier; extracting an exhaust gas from an outlet of the carrier; and generating a health indicator of the carrier while performing the supplying of the purge gas and the extracting of the exhaust gas.

A method for calculating an amount of ammonia present in a gas sample is provided. The method includes receiving a first gas sample by a hydrogen analyzer. The first gas sample contains ammonia. The method also includes receiving a second gas sample by the hydrogen analyzer. The second gas sample is formed by eliminating ammonia from the gas sample. The method further includes measuring, by the hydrogen analyzer, an output signal for each of the first and second gas samples. The method includes calculating the amount of ammonia present in the gas sample based on the measured output signal for each of the first and second gas samples and a hydrogen error correction value.

The invention relates to an electrochemical gas sensing apparatus for sensing one or more analytes, such as NO.sub.2 and/or O.sub.3, in a sample gas and a method of using same. The apparatus uses Mn.sub.2O.sub.3 as a filter for ozone. The Mn.sub.2O.sub.3 may take the form of a powder which may be unmixed, mixed with various PTFE particles sizes, formed into a solid layer deposited onto a membrane and/or pretreated with NO.sub.2.

A sensor for detecting and measuring a gas in a gaseous environment where the gaseous environment contains an interferent such as a related gas. A vertical chemiresistor with a top gate includes a semiconductor layer that has a bulk resistivity that changes in the presence of the gas and/or the interferent. The electrodes (103, 107) of the vertical chemiresistor have a work function that changes when the gas is absorbed onto the electrode. This absorption changes the work function of the electrode and thereby the contact resistance of the electrode in the vertical chemiresistor. By detecting changes in the contact resistance and the bulk resistivity of the semiconducting layer (105) the presence and the concentration of the gas may be determined and distinguished from the interferent.

A gas sensor system is made up of a first gas sensor that is sensitive to both a target gas (200) and a secondary gas and a second sensor (300) that is only sensitive to the target gas. The response of the two gas sensors is processed to detect a presence of or a concentration of the target gas. The first sensor includes a semiconductor material that is sensitive to the presence of both the target and the secondary gas and electrodes that are sensitive to the presence of the target gas. The second sensor includes a semiconductor material that is sensitive to the presence of both the target and the secondary gas, but also includes a blocking layer on a surface of at least one of the electrodes that prevents the second gas interacting with the electrodes.