A method for manufacturing a multilayer film-deposited substrate includes stacking a plurality of lamination units on the substrate while rotating the substrate around a rotational axis perpendicular to a substrate surface. Each of the lamination units has a plurality of layers formed by a dry deposition process. When a plurality of the multilayer film-deposited substrates are manufactured by the dry deposition process, a deposition is performed in a condition satisfying at least one of the following requirements (1) and (2), with estimating a change with time in a deposition rate: [T.sub.depo-unit/T.sub.r<(m0.02) or (m+0.02)<T.sub.depo-unit/T.sub.r] (1), and [(n0.02)T.sub.i/T.sub.r(n+0.02)] (2). m and n are independently any integer. T.sub.i is a time interval between the depositions among each layer of the plurality of layers. T.sub.depo-unit is a deposition unit time required for depositing the one lamination unit. T.sub.r is a rotation period of the substrate.

A radio frequency identification (RFID) enabled mirror includes a mirror comprising a reflective layer. The reflective layer comprises at least one layer of a metallic material. At least one portion of the reflective layer is removed to form a booster antenna from a remaining portion of the reflective layer. A dielectric coating is applied to the mirror where the reflective layer was removed. The RFID-enabled mirror further includes an RFID chip coupled to the booster antenna.

Provided are a light emitting element capable of maintaining high fluorescent intensity over a long period, and a fluorescent light source device. The light emitting element according to the present invention includes: a substrate; a reflection layer formed of a material containing Ag or Al, formed on the upper layer of the substrate; a diffusion prevention layer formed of a layer at least part of which being crystallized, the diffusion prevention layer being formed in contact with a surface of the reflection layer on a side opposite to the substrate; an enhanced reflection layer formed in contact with a surface of the diffusion prevention layer on a side opposite to the substrate; and a fluorescent body layer formed on the upper layer of the enhanced reflection layer.

A mirror for extreme ultraviolet light includes: a substrate (41); a multilayer film (42) provided on the substrate and configured to reflect extreme ultraviolet light; and a capping layer (53) provided on the multilayer film, and the capping layer includes a first layer (61) containing a compound of a metal having lower electronegativity than Ti and a non-metal and having a lower density than TiO.sub.2, and a second layer (62) arranged between the first layer and the multilayer film and having a higher density than the first layer.

An electrically variable reflectance mirror reflective element includes front and rear glass substrates with an electrochromic medium disposed therebetween and bounded by a perimeter seal. A perimeter layer is disposed at a second surface of the front substrate proximate a perimeter edge of the front substrate. The perimeter layer conceals the perimeter seal from view by a driver of a vehicle. No part of the rear substrate extends beyond any part of the front substrate. At least a portion of the mirror reflector disposed at at least a portion of the third surface of the rear substrate extends from under the perimeter seal outward towards at least a portion of the perimeter edge of the rear substrate. The mirror reflector includes a stack of thin films that includes at least a first metal thin film and a second metal thin film.

An image forming device comprises: an exposer having a plurality of light emitting devices, a light emitting device among the plurality of light emitting devices to transmit light toward a photosensitive drum; and a developer to develop an electrostatic latent image formed on a surface of the photosensitive drum by the light, wherein the light emitting device among the plurality of light emitting devices includes: a light emitting layer to generate the light; and a reflective layer to reflect at least a portion of the generated light. The reflective layer can include a plurality of sub-reflective layers, in which a thickness of a sub-reflective layer among the plurality of sub-reflective layers is different from a thickness of another sub-reflective layer among the plurality of sub-reflective layers, and/or a refractive index of a sub-reflective layer among the plurality of sub-reflective layers is different from a refractive index of another sub-reflective layer among the plurality of sub-reflective layers.

Provided are a light emitting element capable of maintaining high fluorescent intensity over a long period, and a fluorescent light source device. The light emitting element according to the present invention includes: a substrate; a reflection layer formed of a material containing Ag or Al, formed on the upper layer of the substrate; a diffusion prevention layer formed of a layer at least part of which being crystallized, the diffusion prevention layer being formed in contact with a surface of the reflection layer on a side opposite to the substrate; an enhanced reflection layer formed in contact with a surface of the diffusion prevention layer on a side opposite to the substrate; and a fluorescent body layer formed on the upper layer of the enhanced reflection layer.

A radio frequency identification (RFID) enabled mirror includes a mirror comprising a reflective layer. The reflective layer comprises at least one layer of a metallic material. At least one portion of the reflective layer is removed to form a booster antenna from a remaining portion of the reflective layer. A dielectric coating is applied to the mirror where the reflective layer was removed. The RFID-enabled mirror further includes an RFID chip coupled to the booster antenna.

A support for optical elements is described. The support includes a base substrate with high specific stiffness and a finishing layer. The base substrate is a non-oxide ceramic material, preferably a carbide, such as boron carbide or silicon carbide. The finishing layer is preferably Ge or an alloy of Al and Si. The finishing layer is or is capable of being processed to provide a surface with low finish. Low finish is achieved by diamond turning or polishing the finishing material. The finishing layer has a coefficient of thermal expansion similar to the coefficient of thermal expansion of the base substrate. The optical element optionally includes a reflective stack on the finishing layer.

A method for coating substrates is provided. The method includes diamond turning a substrate to a surface roughness of between about 60 and about 100 RMS, wherein the substrate is one of a metal and a metal alloy. The method further includes polishing the diamond turned surface of the substrate to a surface roughness of between about 10 and about 25 to form a polished substrate, heating the polished substrate, and ion bombarding the substrate with an inert gas. The method includes depositing a coating including at least one metallic layer on the ion bombarded surface of the substrate using low pressure magnetron sputtering, and polishing the coating to form a finished surface having a surface roughness of less than about 25 RMS using a glycol based colloidal solution.