An artifact mitigation system includes a projector assembly and a set of imaging optics optically coupled to the projector assembly. The artifact mitigation system also includes an eyepiece optically coupled to the set of imaging optics. The eyepiece includes a diffractive incoupling interface. The artifact mitigation system further includes an artifact prevention element disposed between the set of imaging optics and the eyepiece. The artifact prevention element includes a linear polarizer, a first quarter waveplate disposed adjacent the linear polarizer, and a color select component disposed adjacent the first quarter waveplate.

A device includes a waveguide. The device also includes a plurality of grating sets coupled with the waveguide and configured to, during a plurality of time periods, couple a plurality of input image lights into the waveguide and couple the input image lights out of the waveguide as a plurality of output image lights. The plurality of input image lights have a substantially same input field of view (“FOV”) with a substantially same symmetry axis. A combined output FOV of the output image lights is larger than the input FOV.

The cost and power consumption of an imaging apparatus are reduced by facilitating detection of an incident angle of a light beam transmitted through a grating substrate. An image sensor converts an optical image captured by pixels arranged on an imaging surface and outputs the converted image signal. A modulator is configured to modulate intensity of light; and an image processing circuit performs image processing of the output image signal. The modulator has a grating substrate, a grating pattern formed on a back surface side of the grating substrate arranged in proximity to the light receiving surface of the image sensor; and a grating pattern formed on a front surface facing the back surface. Each of the grating patterns is constituted of a plurality of concentric circles. The modulator performs intensity modulation on the light transmitted through the grating pattern and outputs the modulated light to the image sensor.

The invention concerns a multi-pupil lightguide element, a diffractive personal display, multi-pupil projector, a method for displaying an image and a use. The element comprises lightguide means, diffractive in-coupling means for coupling an image directed to the in-coupling means into the lightguide means, and diffractive out-coupling means for coupling said image out of the lightguide means. According to the invention, the diffractive in-coupling means comprise at least two in-coupling gratings laterally displaced from each other on said lightguide means for receiving segments of said image, and the diffractive out-coupling means is optically associated with said at least two in-coupling gratings for reproducing said image from said image segments. The invention allows for expanding the field-of-view of near-to-eye displays, for example.

A measurement apparatus (10) for interferometrically determining a surface shape of a test object (14). A radiation source provides an input wave (42), a multiply-encoded diffractive optical element (60), which is configured to produce by diffraction from the input wave a test wave (66) that is directed at the test object and has a wavefront in the form of a free-form surface and at least one calibration wave (70), and a capture device (46). The calibration wave has a wavefront with a non-rotationally symmetric shape (68f), wherein cross sections through the wavefront of the calibration wave along cross-sectional surfaces each aligned transversely to one another have a curved shape. The curved shapes in the different cross-sectional surfaces differ in terms of an opening parameter. The capture device (46) captures a calibration interferogram formed by superimposing a reference wave (40) with the calibration wave after interaction with a calibration object (74).

A method and system for generating a physical layout for a grating coupler integrated in a photonically-enabled circuit are disclosed herein. In some embodiments, the method receives a parametrized wavelength, a parametrized first refractive index, a parametrized second refractive index, a parametrized taper length, a parametrized width, a parametrized grating length, and a parametrized incident angle of the optical beam incident onto the grating coupler and generates a physical layout for the grating coupler based on the received parametrized inputs, the generating of the physical layout is according to a predefined model, and outputs the physical layout of the grating coupler for manufacturing under a semiconductor fabrication process.

Disclosed is an improved diffraction structure for 3D display systems. The improved diffraction structure includes an intermediate layer that resides between a waveguide substrate and a top grating surface. The top grating surface comprises a first material that corresponds to a first refractive index value, the underlayer comprises a second material that corresponds to a second refractive index value, and the substrate comprises a third material that corresponds to a third refractive index value. According to additional embodiments, improved approaches are provided to implement deposition of imprint materials onto a substrate, which allow for very precise distribution and deposition of different imprint patterns onto any number of substrate surfaces.

An optical element includes first and second transmission gratings positioned in mutual proximity and in a mutually-parallel orientation and having respective first and second phase modulation profiles with a common period and different, respective first and second numbers of modulation peaks and troughs in each period.

A transparent displaying base plate and a transparent displaying device. The transparent displaying base plate includes a displaying layer (2) and a liquid-crystal grating layer (3) provided on one side of the displaying layer (2), the displaying layer (2) includes black matrixes (15) and displaying regions (A) defined by the black matrixes (15), the liquid-crystal grating layer (3) is provided with a backlight unit on one side that is further away from the displaying layer (2), and the backlight unit includes a backlight layer for exiting backlight light rays to the displaying layer (2), and at least a light focusing layer for focusing the backlight light rays directly facing the positions of the displaying regions (A) to the black matrixes (15).

Techniques of generating a wavefront modulating element (WME) for imaging an object over a large image field include (i) designing a WME by breaking a large image into smaller sub-images and then applying an inverse imaging operation to find a segment of a plurality of segments (324-1 to -334-n) of a WME (in the from of DOE) producing a sub-image, and (ii) specifying an optical system to illuminate the WME resulting from each of the plurality of segments in such a way that the large image is reproduced as closely as possible. Along these lines, given a large target image in the far-field, a WME generation system decomposes the target image into sub-images. From this decomposition, the WME generation system then produces WME segments corresponding to the sub-images. The WME segments are then arranged in an optical system such that abeam of electromagnetic radiation (316) is reproduced into sub-beams that are normally incident on the WME segments (for example by gratings 332 diffracting light towards a DOE and back into a lightguide 320).