Provided is a spectral filter including a first unit filter having a first center wavelength in a first wavelength range, and a second unit filter having a second center wavelength in a second wavelength range, wherein the first unit filter includes two first metal reflective layers provided spaced apart from each other and including a first metal, and a first cavity provided between the two first metal reflective layers, and wherein the second unit filter includes two second metal reflective layers provided spaced apart from each other and including a second metal different from the first metal, and a second cavity provided between the two second metal reflective layers.

An optical sensor system includes a plurality of sets of optical sensors implemented on a substrate, with a plurality of sets of optical filters, wherein a set of optical filters of the plurality of sets of optical filters is associated with a set of optical sensors and a set of optical filters of the plurality of sets of optical filters includes a plurality of optical filters that are arranged in a pattern, with each optical filter of the plurality of optical filters configured to pass light in a different wavelength range of a predefined spectral range. Each set of optical filters operates to provide a bandpass response corresponding to the predefined spectral range and a set of optical filters is located atop an associated set of optical sensors, where at least two sets of optical filters of the plurality of sets of optical filters are configured to provide different bandpass responses. An optical element is associated with a corresponding set of optical sensors, with each rejection filter configured to pass light wavelengths in a predefined spectral range.

A system for imaging a scene, includes a plurality of optical sensors arranged on an integrated circuit and a plurality of sets of interference filters, where each set of interference filters of the plurality of sets of interference filters includes a plurality of interference filters that are arranged in a pattern and each interference filter of the plurality of filters is configured to pass light in a different wavelength range, where each set of interference filters of the plurality of interference filters is associated with a spatial area of the scene. The system includes a plurality of rejection filters arranged in a pattern under each set of interference filters, where each rejection filter of the plurality of rejection filters is configured to substantially reject light of predetermined wavelengths. The system further includes one or more processors adapted to provide a spectral response for a spatial area of the scene associated with the set of interference filters.

An optical filter may include a set of optical filter layers disposed onto a substrate. The set of optical filter layers may include a first subset of optical filter layers comprising a first material with a first refractive index. The first material may comprise at least silicon and hydrogen. The set of optical filter layers may include a second subset of optical filter layers comprising a second material with a second refractive index. The second material is different from the first material and the second refractive index is less than the first refractive index. The set of optical filter layers may include a third subset of optical filter layers comprising a third material different from the first material and the second material.

Provided is a polarization spectral filter, including: a first reflector and a second reflector disposed to face each other in a first direction; and a grating layer disposed between the first reflector and the second reflector. The grating layer includes a plurality of first grating elements and a plurality of second grating elements, the plurality of first grating elements and the plurality of second grating elements being alternately arranged in a second direction perpendicular to the first direction. The plurality of first grating elements include a first dielectric material having a first refractive index. The plurality of second grating elements include a second dielectric material having a second refractive index different from the first refractive index.

The present disclosure relates to an infrared band pass filter, which comprises a first multilayer film. The first multilayer film including a plurality of Si:NH layers and a low refraction index layer. The plurality of low refraction index layers are stacked with Si:NH layers alternatively; wherein the difference between the refraction index of Si:NH layer and the refraction index of the low refraction index layer is greater than 0.5. The infrared band pass filter has a pass band in a wavelength range of 800 nm and 1100 nm, and when the incident angle is changed from 0 degrees to 30 degrees, the center wavelength of the pass band is shifted less than 12 nm, and the infrared band pass filter of the present disclosure can be used to enhance the 3D image resolution when applied to a 3D imaging system.

Provided is a meta-optical device including a meta-lens including a plurality of nano-structures, a band pass filter configured to transmit light of predetermined wavelengths within an operation wavelength band of the meta-lens, and a spacer layer provided between the meta-lens and the band pass filter to support the plurality of nano-structures and to form a separation distance between the meta-lens and the band pass filter.

An optical filter may include an interference filter that passes at least two channels associated with at least two transmission peaks; and a plurality of blockers, wherein each blocker, of the plurality of blockers, passes a respective channel associated with a respective transmission peak of the at least two transmission peaks and blocks one or more channels other than the respective channel associated with the respective transmission peak.

An optical interference filter includes a substrate and one or more sets of layers that are disposed on the substrate. Each set of layers includes a first layer that comprises at least scandium, aluminum, and nitrogen, and a second layer that comprises at least silicon and oxygen. The first layer may comprise at least one of a scandium aluminum nitride (ScAlN) material or a scandium aluminum nitrogen oxide (ScAlNO) material. The second layer may comprise a hydrogenated silicon (Si:H) material. An absolute value of a net stress of the one or more sets of layers may be less than or equal to 50 megapascals.

A stretchable reflective color-shifting film comprises a stretchable transparent polymer layer; a semi-transmissive metal layer; a transparent spacer layer; a reflective metal layer; an adhesive layer; and a stretchable base film layer. When the film body is stretched by 25%, the peak total reflectance stretched is at 80% of the peak total reflectance when the film body is unstretched according to the Total Reflectivity Test.