Patent classifications
G02B2006/12038
FLEXIBLE OPTICAL FIBER ARRAY
Advantageously, at least one embodiment comprises a flexible pitch reducing optical fiber array (PROFA) coupler capable of maintaining all channels discretely with sufficiently low crosstalk, while providing enough flexibility to accommodate low profile packaging, and having increased stability with respect to environmental fluctuations, including temperature variations and mechanical shock and vibration, and that is combinable in multiple quantities thereof to form an optical multi-port input/output (IO) interface.
THIN FILM OPTICAL WAVEGUIDE AND PREPARATION METHOD THEREFOR
A thin film optical waveguide includes a silicon-based substrate, a cladding layer arranged on the silicon-based substrate, and an optical waveguide core layer arranged on the silicon-based substrate. The optical waveguide core layer is arranged in the cladding layer, the refractive index of the optical waveguide core layer is higher than that of the cladding layer, the optical waveguide core layer comprises a double-layer optical waveguide dielectric thin film and a thin film material interlayer arranged between the double-layer optical waveguide dielectric thin film, the thin film material interlayer has a two-dimensional lattice sub-wavelength structure, and the thin film material interlayer is a negative thermo-optical coefficient material used for performing thermo-optical coefficient compensation on the optical waveguide dielectric thin film.
THIN FILM OPTICAL WAVEGUIDE AND PREPARATION METHOD THEREFOR
A thin film optical waveguide includes a silicon-based substrate, a cladding layer arranged on the silicon-based substrate, and an optical waveguide core layer arranged on the silicon-based substrate. The optical waveguide core layer is arranged in the cladding layer, the refractive index of the optical waveguide core layer is higher than that of the cladding layer, the optical waveguide core layer includes a double-layer optical waveguide dielectric thin film and a thin film material interlayer arranged between the double-layer optical waveguide dielectric thin film, the thin film material interlayer has a two-dimensional lattice sub-wavelength structure, and the effective lattice constant and the duty cycle of the two-dimensional lattice sub-wavelength structure are approximately the same in each propagation direction, so as to make the effective refractive index of the thin film optical waveguide approximately isotropic.
METHOD AND APPARATUS FOR REALIZING TUBULAR OPTICAL WAVEGUIDES IN GLASS BY FEMTOSECOND LASER DIRECT WRITING
Apparatus and method for realizing tubular optical waveguides in glass by femtosecond laser direct writing. Irradiation in glass with focused femtosecond laser pulses leads to decrease of refractive index in the modified region. Tubular optical waveguides of variable mode areas are fabricated by forming the four sides of the modified regions with slit-shaped femtosecond laser pulses, ensuring single mode waveguide with a mode field dimension compatible with direct coupling to single-mode optical fibers.
Integrated Oxide Device
Various embodiments provide for systems and techniques for the successful fabrication of metal oxide (TMO)-on-glass layer stacks via direct deposition. The resulting samples feature epitaxial, strontium titanate (STO) or barium titanate (BTO) films on silicon dioxide (SiO.sub.2) layers, forming STO- or BTO-buffered SiO.sub.2 pseudo-substrates. As the integration of TMO films on silicon rely on an STO or BTO buffer layer, a wide variety of TMO-based integrated devices (e.g., circuits, waveguides, etc.) can be fabricated from the TMO-on-glass platform of the present technology. Moreover, the STO, or the BTO, survives the fabrication process without a corresponding degradation of crystalline quality, as evidenced by various objective measures.
ON-CHIP OPTICAL ISOLATOR
Embodiments herein relate to photonic integrated circuits with an on-chip optical isolator. A photonic transmitter chip may include a laser and an on-chip isolator optically coupled with the laser that includes an optical waveguide having a section coupled with a magneto-optic liquid phase epitaxy grown garnet film. In some embodiments, a cladding may be coupled with the garnet film, the on-chip isolator may be arranged in a Mach-Zehnder interferometer configuration, the waveguide may include one or more polarization rotators, and/or the garnet film may be formed of a material from a rare-earth garnet family. Other embodiments may be described and/or claimed.
Planar lightwave circuit active connector
An assembly of waveguide wavelength multiplexers and demultiplexers, together with continuous wave (CW) laser transmitters that interface to grating couplers on a silicon photonics chip, providing CW sources, multiplexed output and optionally multiplexed input, all using a single photonic lightwave circuit (PLC).
PHOTONIC CHIP AND METHOD OF MANUFACTURE
A silicon photonic chip is provided comprising a top silicon device layer; an insulating layer beneath the top silicon device layer; an intermediate silicon device layer beneath the insulating layer; a further insulating layer beneath the intermediate silicon device layer; a silicon substrate beneath the further insulating layer; and a first silicon waveguide, the first silicon waveguide being partially formed by a portion of the intermediate silicon device layer.
Optical Waveguide and Manufacturing Method Thereof
To manufacture an optical waveguide including a substrate, a lower cladding layer formed on the substrate, a core layer formed on the lower cladding layer, a sinking prevention layer formed to cover the core layer and the lower cladding layer, and an upper cladding layer formed on the sinking prevention layer, in which the sinking prevention layer is composed of a material having a higher melting point than that of a material composing the lower cladding layer.
Integrated grating coupler
A grating coupler having first and second ends for coupling a light beam to a waveguide of a chip includes a substrate configured to receive the light beam from the first end and transmit the light beam through the second end, the substrate having a first refractive index n1, a grating structure having curved grating lines arranged on the substrate, the grating structure having a second refractive index n1, wherein the curved grating lines have line width w and height d and are arranged by a pitch Λ, wherein the second refractive index n2 is less than first refractive index n1, and a cladding layer configured to cover the grating structure, wherein the cladding layer has a third refractive index n3.